A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor which is at a temperature of from about −20° C. to about 400° C.; introducing into the reactor at least one silicon-containing compound having at least one acetoxy group to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon oxide coating has a low k and excellent mechanical properties.

A technique for obtaining anhydrous hydrogen fluoride (AHF) from an aqueous solution of hexafluorosilicic acid (HSA). A method for obtaining hydrogen fluoride from an aqueous solution of hexafluorosilicic acid can include mixing a solution of hexafluorosilicic acid with a sulfuric acid solution, desorbing the hydrogen fluoride from the resultant solution of sulfuric acid, treating it with sulfuric acid and condensing the anhydrous hydrogen fluoride from unabsorbed gasses. The generated gaseous products are then burned in a fire of hydrogen-containing fuel and an oxygen-containing oxidant, yielding a solid silicon dioxide. The remaining products are cooled and yield condensed anhydrous hydrogen fluoride.

This invention relates to anti-microbial active particles, compositions and uses thereof for inhibiting bacterial growth on surfaces or devices. This invention further discloses methods of making such anti-microbial active particles.

A composite has a solid-state structure, silicate, lithium ions, and at least one paramagnetic or diamagnetic element, which is different from lithium silicon, and oxygen. The solid-state structure has two areas in which the solid-state structure forms an identical crystal orientation. The areas are arranged at a distance of at least one millimeter from each other. A method has a quenching step in which a solid-state structure of a composite is produced, which differs from an ambient temperature solid-state structure. The composite produced by the method has silicate, lithium ions, and an element that is different from lithium, silicon, and oxygen. The method produces at least one gram of the phase pure composite in the quenching step.

A method for destructing and valorizing an asbestos waste including the steps of: determining the asbestos mineralogical group contained in the waste, performing a treatment on the waste which includes of: an acid treatment when the waste comprises only a chrysotile, a base treatment when the waste comprises only an amphibole, the acid treatment followed by the base treatment when the asbestos waste includes a mixture of a chrysotile and an amphibole, and valorizing at least one of the products obtained on completion of the performing of the treatment. An embodiment also concerns a treatment of a chrysotile waste through an acid treatment followed by a thermal treatment.

Silica-including microcapsule resin particles including an outer shell constituted of a crosslinked polymer and a cavity partitioned with the outer shell, in which the silica-including microcapsule resin particles contain inside the cavity a porous structure in which silica particles are mutually connected, and have a volume average particle diameter of 0.5 to 100 μm.

Products derived from and methods of micelle templating that allow for orthogonal control over structural features.

A 1,1,1-tris(organoamino)disilane compound and a method of preparing the 1,1,1-tris(organoamino)disilane compound are disclosed. The method comprises aminating a 1,1,1-trihalodisilane with an aminating agent comprising an organoamine compound to give a reaction product comprising the 1,1,1-tris(organoamino)disilane compound, thereby preparing the 1,1,1-tris(organoamino)disilane compound. A film-forming composition is also disclosed. The film-forming composition comprises the 1,1,1-tris(organoamino)disilane compound. A film formed with the film-forming composition, and a method of forming the film, are also disclosed. The method of forming the film comprises subjecting the film-forming composition comprising the 1,1,1-tris(organoamino)disilane compound to a deposition condition in the presence of a substrate, thereby forming the film on the substrate.

A durable, hydrophobic and anti-scratching nano-coating for coating on a glass substrate or surface having a water contact angle of about 90° or more, a reduced coefficient of friction by 50% or more, and a reduced surface roughness compared to those of the glass substrate or surface without the nano-coating is provided, which includes a layer of fluorinated silica derived from sol-gel hydrolysis between one or more tetraalkoxysilanes having at least three alkoxy groups and one or more polyfluorinated silanes having at least a trialkoxysilane and from 15 to 17 fluorine atoms in the presence of a catalyst to a reaction mixture of the sol-gel hydrolysis between the one or more tetraalkoxysilanes and the one or more polyfluorinated silanes, and a solvent. A related method of fabricating the nano-coating via atomization of acid-containing or alkali-containing solution and sol-gel precursor solution onto the glass surface is also provided.

The present invention relates to a device and a method of preparing a SiOx, and a SiOx anode material, and more particularly, to a device and a method of preparing a SiOx, in which a SiOx is prepared by reacting liquid silicon and solid silicon dioxide in one or more crucibles, and a metal raw material is simultaneously supplied during SiOx preparing to continuously prepare a metal-SiOx in a single process, and a SiOx anode material.