Silica aerogels with improved properties are disclosed together with methods for synthesizing such aerogels. The improved properties include lower thermal conductivity (better insulating capacity), lower acoustic velocity, lower dielectric constant and improved ductility. Greater tunability of the refractive index can also be achieved. The silica aerogels are prepared by a sol-gel processing method that provides better control of the formation or aerogel structures. Generally speaking, the improvements arise from control of the synthesis to create a morphology of primary clusters and diverse-sized secondary clusters of dense silica aerogels separated by less densely packed regions. By providing a broader range of secondary clusters and/or pore sizes and loose connectivity between clusters, reductions can be achieved in thermal conductivity and flexural modulus.

The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions have excellent heat aging and shelf stability in the form of concentrates comprising a mixture of a compound containing two quaternary ammonium groups, such as hexabutyl C.sub.1-C.sub.8 alkanediammonium dihydroxides or salts thereof, preferably N,N,N,N′,N′,N′-hexabutyl-1,4-butanediammonium dihydroxide (HBBAH), and aminosilane group containing silica particles in the amount of from 1 to 30 wt. % or, preferably, from 15 to 22 wt. %, as solids based on the total weight of the composition, the composition having a pH ranging from 3 to 5 or, preferably, from 3.5 to 4.5 wherein the composition is stable against visible precipitation or sedimentation at a 15 wt. % solids content after heat aging at a temperature of 45° C. for at least 6 days.

The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions have excellent heat aging and shelf stability in the form of concentrates comprising a mixture of a compound containing two quaternary ammonium groups, such as hexabutyl C.sub.1-C.sub.8 alkanediammonium dihydroxides or salts thereof, preferably N,N,N,N′,N′,N′-hexabutyl-1,4-butanediammonium dihydroxide (HBBAH), and aminosilane group containing silica particles in the amount of from 1 to 30 wt. % or, preferably, from 15 to 22 wt. %, as solids based on the total weight of the composition, the composition having a pH ranging from 3 to 5 or, preferably, from 3.5 to 4.5 wherein the composition is stable against visible precipitation or sedimentation at a 15 wt. % solids content after heat aging at a temperature of 45° C. for at least 6 days.

The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions having a pH ranging from 2.5 to 5.3 and comprising a mixture of spherical colloidal silica particles and from 30 to 99 wt. %, based on the total weight of silica solids in the aqueous CMP polishing composition, of elongated, bent or nodular silica particles wherein the colloidal and elongated, bent or nodular silica particles differ from each other in weight average particle size (CPS) less than 20 nm, wherein at least one of the spherical colloidal silica particles and the elongated, bent or nodular silica particles contains one or more cationic nitrogen atoms. The present invention further provides methods of using the compositions in high downforce CMP polishing applications.

The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions having a pH ranging from 2.5 to 5.3 and comprising a mixture of spherical colloidal silica particles and from 30 to 99 wt. %, based on the total weight of silica solids in the aqueous CMP polishing composition, of elongated, bent or nodular silica particles wherein the colloidal and elongated, bent or nodular silica particles differ from each other in weight average particle size (CPS) less than 20 nm, wherein at least one of the spherical colloidal silica particles and the elongated, bent or nodular silica particles contains one or more cationic nitrogen atoms. The present invention further provides methods of using the compositions in high downforce CMP polishing applications.

The present invention refers to a stable sodium and iron silicate solution that has a weight ratio of SiO.sub.2 to Na.sub.2O from 1.5 to 2.5 and a total percentage of solids, expressed by the sum of SiO.sub.2 and Na.sub.2O, from 20% to 55%. Said solution also has a soluble iron content, expressed by Fe, from 0.1% to 7%, and a water content from 38% to 79.9%. The present invention also refers to the process for preparing said stable solution of sodium and iron silicate, which comprises the steps of: (a) providing a siliceous material containing iron; (b) submitting said siliceous material containing iron to a hydrothermal treatment with caustic soda under high temperature and controlled pressure; and (c) filtering said reacted solution to separate the reacted portion of the hydrothermal treatment from the unreacted portion. Additionally, the present invention refers to the uses of said stable sodium and iron silicate solution.

A coating for spark plugs and engine parts is resistant to fouling. The coating may be applied to the spark plug or engine part by dipping the part in a sol gel solution, ensuring it wets the part, and extracting it at a slow, controlled rate. As the part is allowed to dry, the sol gel reacts with moisture in the air to form a thin oxide film. Unlike conventional sol gel applications, which apply the oxide directly to the part, the present invention may form an oxide coating, in situ, while drying in place on the part.

A coating for spark plugs and engine parts is resistant to fouling. The coating may be applied to the spark plug or engine part by dipping the part in a sol gel solution, ensuring it wets the part, and extracting it at a slow, controlled rate. As the part is allowed to dry, the sol gel reacts with moisture in the air to form a thin oxide film. Unlike conventional sol gel applications, which apply the oxide directly to the part, the present invention may form an oxide coating, in situ, while drying in place on the part.

There is provided a method of producing silica capsules, the method comprising: adding a silica precursor to emulsified droplets in the presence of salt and alcohol to enhance silica growth around the emulsified droplets by an ion association effect, thereby forming silica capsules. Also provided are silica capsules producible by such a method.

There is provided a method of producing silica capsules, the method comprising: adding a silica precursor to emulsified droplets in the presence of salt and alcohol to enhance silica growth around the emulsified droplets by an ion association effect, thereby forming silica capsules. Also provided are silica capsules producible by such a method.