A filter configured to photocatalytically oxidize target compounds in an air stream includes a support structure having an air permeability greater than approximately 155 CFM/ft.sup.2 and a photocatalyst supported by the support medium.

A reactor that operates with ultraviolet light emitting diodes (UV-LEDs) to attain UV photoreactions or UV photo-initiated reaction in a fluid flow for various applications, including water purification. The UV-LED reactor is comprised of a conduit means for passing fluid flow, an ultraviolet light emitting diode (UV-LED), and a radiation-focusing element to focus the UV-LED radiation to the fluid in the longitudinal direction of the conduit. The UV-LED reactor may include photocatalysts or chemical oxidants, which are activated by UV emitted by UV-LEDs for photocatalytic and photo-initiated reactions.

A portable water treatment system comprising a water processing unit that automatically determines whether the system is connected to a pressurized water source or not. If an unpressurized source is detected, the system activates a pump to ensure that the water flows through the system at a pressure level to remove particulates and ensure the ultraviolet (UV) light is effective at neutralizing viruses and bacteria. If the water source is pressurized, the pump is deactivated and the water flows through the system under the pressure of the pressurized source. The system uses a failsafe mechanism to 1) ensure that water cannot flow through the water treatment unit if the UV light chamber is not powered and 2) ensure the user can know that the UV light is in fact functioning through the use of an indicator.

A discrimination system that forms a fluid column and interrogates objects within the fluid column with an excitation source. An optical arrangement collects output electromagnetic radiation emanating from the excited objects disposed within the fluid column and directs the output electromagnetic radiation to a detector. An analyzer reduces the positional dependency of the detected intensity by normalizing the value based on the position of each object.

A UV disinfectant system may include a chamber having a wall that is transparent to a disinfecting radiation. Liquid may be flowed through the chamber for treatment by exposure to the radiation. The chamber may include a static mixer having vanes to impede laminar flow of the liquid during treatment. The vanes extend into the flow path of the liquid through the chamber. A gap is defined between the vanes and the transparent wall. A cabinet may house the chamber and radiation emitting bulbs. Blowers may be operably coupled to a temperature sensor and flow meter and positioned at a lower end and upper end of the cabinet to urge air out of the cabinet. The temperature sensor may include a thermocouple. The blowers may be variable speed blowers. The system may include a controller to control system operations. The controller may be remotely accessible to monitor or control operations.

The embodiments disclose a method including processing and treating at least one water source supply for mixing with humic acid and fulvic acid, chopping and pulverizing at least one humate source, mixing the chopped and pulverized at least one humate source with the processed and treated at least one water source supply, processing the chopped and pulverized at least one humate source and the processed and treated at least one water source supply for separating, segregating, and suspending fulvic acid and humic acid molecules from the at least one humate source, storing the fulvic acid and humic acid molecules in a fresh quantity of the treated water source supply, adjusting the pH level of the stored fulvic acid and humic acid, and creating at least one or more beverage product for human consumption using the fulvic acid and humic acid molecule ingredients and other ingredients including vitamins, flavorings and additives.

A system for cleaning wastewater, includes: an absorption-biodegradation-denitrification (ABN) reactor, a sequential adsorption reactor, a disinfection reactor, and a sludge anaerobic fermentation reactor. The ABN reactor is an integrated reactor including: a biosorption tank, an intermediate sedimentation tank, a biologically-enhanced degradation tank, a denitrification biofilter, and a secondary sedimentation tank. The pretreated wastewater is introduced into the ABN reactor for removal of chemical oxygen demand, nitrogen and phosphorus; the ABN reactor effluent is introduced into the sequential adsorption reactor for the removal of high-risk pollutants; the sequential adsorption reactor effluent is introduced into the disinfection reactor for the elimination of viruses and other pathogenic microorganisms; the sludge produced by the ABN reactor is introduced into the anaerobic sludge fermentation reactor for alkaline fermentation. The system is effective for removing high-risk pollutants and reducing effluent toxicity, which can be used for the upgrading and reconstruction of the wastewater treatment system.

Provided herein are approaches for in-situ plasma cleaning of ion beam optics. In one approach, a system includes a component (e.g., a beam-line component) of an ion implanter processing chamber. The system further includes a power supply for supplying a first voltage and first current to the component during a processing mode and a second voltage and second current to the component during a cleaning mode. The second voltage and current are applied to one or more conductive beam optics of the component, individually, to selectively generate plasma around one or more of the one or more conductive beam optics. The system may further include a flow controller for adjusting an injection rate of an etchant gas supplied to the beam-line component, and a vacuum pump for adjusting pressure of an environment of the beam-line component.

There is disclosed a method and UV reactor for improving the efficiency of treating fluids applied to a UV reactor (2) comprising a longitudinal flow chamber (4) having a longitudinal center axis (22), an input (6) for entry of fluid in the flow chamber (4), and an output (8) for fluid to exit the flow chamber (4), where at least the input (6) of the flow chamber (4) comprises an inlet pipe (10) followed by an inlet cone (12) which as a part of the flow chamber (4) increases the cross section of the channel from the inlet pipe (10) to a cross section of the longitudinal flow chamber (4) of UV reactor (2), said UV reactor (2) having at least one longitudinal UV-lamp (20) parallel to but not coinciding with the longitudinal center axis (22), and where the UV-lamp (20) is arranged such that fluid can flow along a flow path from the input (6) to the output (8) via the flow chamber (4), and so that fluid flowing along the flow path can be exposed to UV radiation as it flows from the input (6) to the output (8) to receive a UV dose, which is characterized in, that the fluid applied to the UV reactor (2) via the input (6) of the flow chamber (4), when passing the inlet cone (12), is applied a uniform helical flow path in an extent that all the fluid applied to the UV reactor (2), within the operation range of the current UV reactor (2), at least passes at least one UV lamp (20) at a distance to receive at least a prescribed UV dose related to the current UV reactor (2), during passing of the fluid inside the UV reactor.

A sterilizing module includes a main body and a light source. The main body includes an inner surface, an outer surface and an internal space to treat a target substance in a fluid and connected an inlet and a outlet. The light source is configured to emit light toward the internal space to sterilize the target substance in the fluid. The light source includes a substrate and a plurality of light emitting structures disposed on the substrate. The plurality of light emitting structures is disposed to be spaced apart each other. A first distance between two light emitting structures is adjacent to each other varies depending on a second distance from each light emitting structure to the inner surface of the main body. The second distance has a maximum value and a minimum value of illuminance and a difference between the maximum and the minimum value thereof is about more than 75%.