A discharge lamp includes a discharge vessel. A xenon gas is sealed within the discharge vessel so as to serve as a light emitting gas, the discharge vessel is made from quartz glass, a pair of electrodes are arranged so as to face each other in the discharge vessel, and the discharge vessel has a chip portion. The chip portion is made from a glass member that has a composition different from that of the discharge vessel, and the glass member has a transmittance of 50% or more over a wavelength range from 170 nm to 300 nm.

One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt out of silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The silicon dioxide granulate is obtained by providing and processing a silicon dioxide powder. One aspect also relates to silicon dioxide granulate, which is obtained by providing a silicon dioxide powder and processing it. One aspect further relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

One aspect is an oven including a melting crucible with a crucible wall, a solids feed with an outlet, a gas inlet and a gas outlet, wherein in the melting crucible the gas inlet is arranged below the solids feed outlet and the gas outlet is arranged at the same height as or above the solids feed outlet. One aspect further relates to a process for making a quartz glass body, including providing and introducing a bulk material selected from silicon dioxide granulate and quartz glass grain into the oven and providing a gas, making a glass melt from the bulk material, and making a quartz glass body from at least a part of the glass melt. One aspect relates to a quartz glass body obtainable by this process and a light guide, an illuminant and a formed body which are each obtainable by processing the quartz glass body further.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt from the silicon dioxide granulate in an oven, and iii.) Making a quartz glass body from at least a part of the glass melt, wherein the oven comprises a hanging sinter crucible. The invention also relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body which are each obtainable by further processing the quartz glass body.

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, and making a quartz glass body out of at least part of the glass melt. The size of the quartz glass body is reduced to obtain a quartz glass grain. The quartz glass body is processed to make a preform and an opaque quartz glass body is made from the preform. One aspect further relates to an opaque quartz glass body which is obtainable by this process. One aspect further relates to a reactor and an arrangement, which are each obtainable by further processing of the opaque quartz glass body.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing silicon dioxide particles, ii.) Making a glass melt out of the silicon dioxide particles in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0 C. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

A process of forming a titania-silica glass body, the process including exposing a titania-doped silica soot body to a first thermal treatment by heating the body to a first temperature T1 between about 800? C. and about 1100? C. for a first time duration t1 calculated using the equation:

[00001]$t1>\frac{L_c^2}{4?},$

wherein L.sub.c is the characteristic length (cm) of the body and ? is the thermal diffusivity (cm.sup.2/sec) of the body. The process further including exposing the body to a second thermal treatment by heating the body to a second temperature T2 between about 1050? C. and about 1250? C. wherein, after the second thermal treatment, a peak-to-valley difference of hydroxyl concentration amongst a plurality of segments of the body is about 70 ppm or less.

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate, making a glass melt out of the silicon dioxide granulate, and making a quartz glass body out of at least a part of the glass melt. In one aspect, providing a silicon dioxide granulate includes providing of a silicon dioxide powder and processing of the powder to obtain a silicon dioxide granulate including the spray drying of a silicon dioxide slurry using a nozzle. The nozzle has a contact surface to the slurry made of glass, plastic or a combination thereof. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to the preparation of a silicon dioxide granulate. One aspect also relates to a light guide, an illuminant, and a formed body, made from processing of the quartz glass body.

The invention relates to a process for preparing a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt from the silicon dioxide granulate in a melting crucible, and iii.) Making a quartz glass body from at least a part of the glass melt, wherein the melting crucible is comprised in an oven and is made of at least one material comprising tungsten or molybdenum or a combination thereof. The invention further relates to a quartz glass body which can be obtained by this process. Further, the invention relates to a light guide, an illuminant and a formed body, each of which can be obtained by processing the quartz glass body further.

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO.sub.2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm.sup.3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 m.