One aspect relates to a process for the preparation of a quartz glass body, including provision of a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate and making a quartz glass body from at least part of the glass melt. The provision includes making a silicon dioxide powder with at least two particles prepared from a silicon-chlorine compound, bringing the silicon dioxide powder into contact with ammonia to obtain a treated silicon dioxide powder, and granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate. The chlorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. One aspect relates further to a quartz glass body which is obtainable by this process. One aspect also relates to a process for the preparation of a silicon dioxide granulate.

One aspect relates to a process for the preparation of a quartz glass grain, including providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, making a quartz glass body out of at least part of the glass melt and reducing the size of the quartz glass body to obtain the quartz glass grain. One aspect further relates to a quartz glass grain which is obtainable by this process. One aspect further relates to opaque quartz glass bodies, which are obtainable by further processing of the quartz glass grain.

A perforated quartz glass tube includes a jacket tube containing a quartz glass material, a plurality of cylindrical glass tubes which are inserted into a pore region of the jacket tube along an axial direction of the jacket tube, and contain a quartz glass material having a softening point higher than a softening point of the jacket tube, and a gap member which is inserted into a gap between the cylindrical glass tubes and a gap between the jacket tube and the cylindrical glass tube, and contains a quartz glass material having a softening point lower than a softening point of the cylindrical glass tube.

An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.110.sup.16 to 1.010.sup.18 molecules/cm.sup.3, an SiH group content of less than 210.sup.17 molecules/cm.sup.3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070 C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 510.sup.9 pulses with a pulse width of 125 ns and a respective energy density of 500 J/cm.sup.2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M.sub.193 nm when measured using the applied wavelength of 193 nm and a second measured value M.sub.633 nm when measured using a measured wavelength of 633 nm. The ratio M.sub.193 nm/M.sub.633 nm is less than 1.7.

The aim of the invention is to improve a generally known method for producing quartz glass doped with fluorine, wherein SiO.sub.2 particles are formed in the presence of fluorine by means of a plasma deposition process, deposited in layers on an outer envelope of a cylindrical quartz glass substrate body rotating about its longitudinal axis, and vitrified to form a layer of quartz glass with a fluorine content of at least 1.5 wt. %, in such a way that a quartz glass semifinished product with a high fluorine content, characterised by a high basic transmission in the UV wavelength range, is obtained. To this end, the substrate body has at least one reservoir layer of quartz glass at least in the region of the outer envelope thereof, having a minimum hydroxyl group content of 200 wt. ppm and/or a minimum hydrogen content of 110.sup.17 molecules/cm.sup.3, and the substrate body is either fully or partially removed following the deposition of the quartz glass layer doped with fluorine.

A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K.sup.2 at 20 C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.

The Ti.sup.3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti.sup.3+ ions in favor of Ti.sup.4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO.sub.2SiO.sub.2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti.sup.3+/Ti.sup.4+510.sup.4.

Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (T.sub.f), and low expansivity slope.

A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO.sub.2SiO.sub.2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO.sub.2SiO.sub.2 soot body to form a fluorine-doped TiO.sub.2SiO.sub.2 soot body, (c) treating the fluorine-doped TiO.sub.2SiO.sub.2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3.sup.+ and Ti.sup.4+.

A process of forming a titania-silica glass body, the process including exposing a titania-doped silica soot body to a constant steam pressure step during which the partial steam pressure is at a first partial pressure of steam P1 that is from about 0 Torr to about 760 Torr and exposing the soot body to a ramp-up steam pressure step during which the partial steam pressure increases from the first partial pressure of steam P1 to a second partial pressure of steam P2, the second partial pressure of steam P2 being from about 50 Torr to about 760 Torr. The second partial pressure of steam P2 being greater than the first partial pressure of steam P1. The process further including heating the soot body during the constant steam pressure step and during the ramp-up steam pressure step and increasing the temperature during at least one of the constant steam pressure step and the ramp-up steam pressure step.