There is provided a method for producing a low-loss alkali metal-doped silica core optical fiber having excellent hydrogen resistance. The method for producing the optical fiber according to the present invention includes a drawing step of drawing an optical fiber preform in a drawing furnace to produce a silica glass-based optical fiber including a core region containing an alkali metal with an average concentration of 0.5 atomic ppm or more and a cladding region that surrounds the core region and a heating step of heating the optical fiber in a heating furnace through which the optical fiber drawn from the drawing furnace passes.

Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (T.sub.f), and low expansivity slope.

A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO.sub.2SiO.sub.2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO.sub.2SiO.sub.2 soot body to form a fluorine-doped TiO.sub.2SiO.sub.2 soot body, (c) treating the fluorine-doped TiO.sub.2SiO.sub.2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3.sup.+ and Ti.sup.4+.

Provided is a titanium-containing quartz glass having excellent UV absorption. The quartz glass absorbs ultraviolet rays having a wavelength of 250 nm or less, ozone generation-related adverse effects on the human body, are prevented, a decrease in transmittance of the quartz glass in the range from near-ultraviolet to visible light due to being colored when irradiated with ultraviolet rays does not occur, absorption build-up or lamp burst-inducing deformation build-up, which is caused by a structural change in the quartz glass that occurs in the range of 200-300 nm when irradiated with ultraviolet rays, is suppressed, and a decrease in transmittance at intended wavelength ranges does not occur even when exposed to ultraviolet rays. The titanium-containing quartz glass having excellent UV absorption is colorless, wherein the average concentration of titanium is 10-500 ppm, the concentration of OH group is 10-350 ppm.