A transparent article is described herein that includes: a glass-ceramic substrate comprising first and second primary surfaces opposing one another and a crystallinity of at least 40% by weight; and an optical film structure disposed on the first primary surface. The optical film structure comprises a plurality of alternating high refractive index (RI) and low RI layers and a scratch-resistant layer. The article also exhibits an average photopic transmittance of greater than 80% and a maximum hardness of greater than 10 GPa, as measured by a Berkovich Hardness Test over an indentation depth range from about 100 nm to about 500 nm. The glass-ceramic substrate comprises an elastic modulus of greater than 85 GPa and a fracture toughness of greater than 0.8 MPa.Math.√m. Further, the optical film structure exhibits a residual compressive stress of ≥700 MPa and an elastic modulus of ≥140 GPa.

An anti-reflective film-attached transparent substrate includes: a transparent substrate including two main surfaces; and a diffusion layer and an anti-reflective film on one main surface of the transparent substrate, which are provided in this order. The anti-reflective film-attached transparent substrate satisfies (A) a luminous transmittance is 20% to 90%, (B) a transmission color b* value under a D65 light source is 5 or less, (C) a luminous reflectance (SCI Y) of an outermost layer of the anti-reflective film is 0.4% or less, (D) a sheet resistance of the anti-reflective film is 10.sup.4 Ω/square or more, (E) the anti-reflective film has a laminated structure in which at least two dielectric layers having different refractive indices are laminated, and (F) a Diffusion value is 0.2 or more and a diffused light brightness (SCE L*) is 4 or less.

An anti-reflective film-attached transparent substrate includes a transparent substrate having two main surfaces and, on at least one of the main surfaces, a multilayer film in which at least two layers having different refractive indices are laminated. At least one silicon oxide layer among the layers in the multilayer film has a moisture permeability of 300 g/m.sup.2/day or less.

A preparation method for a high-refractive index hydrogenated silicon film, a high-refractive index hydrogenated silicon film, a light filtering lamination and a light filtering piece. The method includes: (a) by magnetic controlled Si target sputtering, Si deposits on a base body, forming a silicon film, which (b) forms an oxygenic hydrogenated silicon film in environment of active hydrogen and active oxygen, the amount of active oxygen accounts for 4%-99% of the total amount of active hydrogen and active oxygen, or, a nitric hydrogenated silicon film in environment of active hydrogen and active nitrogen, the amount of active nitrogen accounts for 5%-20% of the total amount of active hydrogen and active nitrogen. Sputtering and reactions are separately conducted, Si first deposits on the base body by magnetic controlled Si target sputtering, and then plasmas of active hydrogen and active oxygen/nitrogen react with silicon for oxygenic or nitric SiH.

Provided is a chalcogenide glass material having excellent weather resistance and being suitable as an optical element for an infrared sensor. The chalcogenide glass material contains, in terms of % by mole, 20 to 99% Te and has an antireflection film formed thereon.

The present invention provides a method of increasing the strength of a glass substrate for optical filters and a tempered-glass optical filter using a tempered glass substrate manufactured using the same, in which the glass substrate for optical filters is subjected to chemical tempering so that a compressive stress (CS) and a depth of layer (DOL) of the glass substrate are adjusted to increase the bending strength thereof.

The present disclosure relates to products and methods for modifying the reflection of a light source in a fireplace and other products.

A plate including functional material to be deposited onto a target surface using monochromatic radiation having a wavelength is described. The plate further includes a substrate with a first surface directed towards the target surface and with a second surface to receive the monochromatic radiation. The first surface is patterned with recessed areas that have a dielectric coating and that are filled with the functional material. The dielectric coating includes a sequence of dielectric coating layers alternating in refractive index. The dielectric coating therewith has a relatively high reflectivity for said monochromatic radiation incident perpendicular to the dielectric coating in comparison to a reflectivity for said monochromatic radiation incident at an angle of 45 degrees to the dielectric coating. As such shear forces are mitigated without requiring a high alignment accuracy. The present application further describes a deposition device including the plate and a method involving the plate.

A Head up display system includes a projection light source, laminated glass, and a transparent nano film. The transparent nano film includes at least one laminated structure consisting of a high refractive-index layer and a low refractive-index layer, where the high refractive-index layer and the low refractive-index layer is deposited sequentially outwards from the surface of the inner glass pane. The projection light source is configured to generate P-polarized light. A ratio of near-red light reflectivity R1 at wavelengths ranging from 580 nm to 680 nm of the laminated glass with the transparent nano film to near-blue light reflectivity R2 at wavelengths ranging from 420 nm to 470 nm of the laminated glass with the transparent nano film is R1/R2=1.0˜2.0.

A method for manufacturing a formed glass includes using a heating apparatus. The heating apparatus includes a heating element and a heat reservoir having a transmittance of 50% or more in a wavelength of 0.5 um to 2.5 um. The heat reservoir is arranged between the heating element and a glass substrate as an object to be heated. The glass substrate is heated with the heating element, and the glass substrate is formed into a desired shape.