C03C2218/154

MULTILAYERED-REFLECTIVE-FILM-PROVIDED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
20210096456 · 2021-04-01 · ·

A multilayered-reflective-film-provided substrate includes: a substrate; a multilayered reflective film provided on the substrate; and a protective film provided on the multilayered reflective film, in which the protective film includes ruthenium (Ru) and at least one additive material selected from aluminum (Al), yttrium (Y), zirconium (Zr), rhodium (Rh), and hafnium (Hf), and a content of the additive material is 5% or more by atom and less than 50% by atom.

Articles with patterned coatings

Embodiments of a article including include a substrate and a patterned coating are provided. In one or more embodiments, when a strain is applied to the article, the article exhibits a failure strain of 0.5% or greater. Patterned coating may include a particulate coating or may include a discontinuous coating. The patterned coating of some embodiments may cover about 20% to about 75% of the surface area of the substrate. Methods for forming such articles are also provided.

Electrostatic doping of a layer of a conductive or non-conductive material

The invention relates to a process for permanently electrostatically doping a layer of a conductive or non-conductive material that is deposited on a solid substrate, to the doped material obtained according to this process, and to the use of such a material.

GLASS, GLASS-CERAMIC AND CERAMIC ARTICLES WITH DURABLE LUBRICIOUS ANTI-FINGERPRINT COATINGS OVER OPTICAL AND SCRATCH-RESISTANT COATINGS AND METHODS OF MAKING THE SAME

An article is described herein that includes: a glass, glass-ceramic or ceramic substrate comprising a primary surface; at least one of an optical film and a scratch-resistant film disposed over the primary surface; and an easy-to-clean (ETC) coating comprising a fluorinated material that is disposed over an outer surface of the at least one of an optical film and a scratch-resistant film. The at least one of an optical film and a scratch-resistant film comprises an average hardness of 10 GPa or more. Further, the outer surface of the at least one of an optical film and a scratch-resistant film comprises a surface roughness (R.sub.q) of less than 1.0 nm.

Metallic lustrous member with radio wave transmissibility, article using same, and production method therefor

A metallic lustrous member with radio wave transmissibility is provided, which is capable of being easily produced, while ensuring a structure in which not only chromium or indium but also any of some other metals such as aluminum is formed as a metal layer on a continuous surface of any of various materials, and also an article using the member is provided. A production method for a metallic lustrous member with radio wave transmissibility, which is capable of easily forming, as a metal layer, not only chromium or indium but also any of some other metals such as aluminum, on a continuous surface of any of various materials. The metallic lustrous member comprises a substrate having radio wave transmissibility, and an aluminum layer formed directly on a continuous surface of the substrate. The aluminum layer has a discontinuous region including a plurality of separated segments which are mutually discontinuous.

THROUGH-SUBSTRATE LASER PATTERNING AND ISOLATING OF THIN CONDUCTIVE FILMS
20210070653 · 2021-03-11 ·

An invention disclosure discloses a composite structure. The composite structure includes a substrate layer (120), a conductive layer (140) and an overlayer (160). The substrate has a first face (124) and a second face (122). The conductive layer has a first face (148) and a second face (149). The first face of the conductive layer is disposed on the at least a part of the second face of the substrate layer. A portion (144) of the conductive layer has a resistivity at least about ten times higher than an adjacent region (146) on the conductive layer. The overlayer may have a first face (162) and a second face (166). The first face of the overlayer is disposed on at least a part of the second face of the conductive layer such that the conductive layer is disposed between the overlayer and the substrate layer. The substrate layer comprises a material that is optically transparent over at least a part of the electromagnetic spectrum from about 180 nm to about 20 m. The conductive layer comprises a layer having a thickness of about 10 nm or greater and having a resistivity of about 10 Ohm-cm or less. The conductive layer comprises a material that may be optically translucent or opaque over at least a part of the electromagnetic spectrum from about 180 nm to about 20 m.

DEPOSITION METHODS FOR HIGH QUALITY REFLECTANCE COATINGS
20210032159 · 2021-02-04 ·

Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

ANTIREFLECTIVE MEMBER AND METHOD OF MANUFACTURE THEREFOR

Provided is an antireflective member that has a water- and oil-repellent layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellent properties, and durability. The surface of the multi-layered antireflective layer on a base material has a root-mean-square surface roughness of 0.8 nm to 2.0 nm. The water- and oil-repellent layer has a thickness of 1 to 30 nm and is a cured product of water- and oil-repellents having as principal components a fluorooxyalkylene group-containing polymer modified organosilicon compound with the numerical average molecular weight of 4,500 to 10,000 of a fluoropolymer part and/or partial hydrolysis condensate thereof.

Particle reduction during sputtering deposition

Described herein are apparatuses and methods for holding a substrate in a position that minimizes particle contamination of the substrate when the substrate is being coated. Along with the apparatus, processes for reducing particle reduction on substrates are provided. The articles and processes described herein are useful in making coated glass substrates, such as used in electrochromic, photochromic, or photovoltaic technologies.

COATED ARTICLE INCLUDING ULTRA-FAST LASER TREATED SILVER-INCLUSIVE LAYER IN LOW-EMISSIVITY THIN FILM COATING, AND/OR METHOD OF MAKING THE SAME

Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers. The low-E coating is exposed to laser pulses having a duration of no more than 10.sup.12 seconds, a wavelength of 355-500 nm, and an energy density of more than 30 kW/cm.sup.2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C. while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form.