Provided is an optical film (composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing an optical film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, characterized in that the optical film comprises cesium, tungsten, and oxygen, and a refractive index n and an extinction coefficient k of the optical film at each of wavelengths [300 nm, 350 nm, 400 nm, 450 nm, . . . , 1700 nm] specified at 50 nm intervals in a wavelength region from 300 nm to 1700 nm are set respectively within specified numerical ranges.

Provided is a Low-E glass plate protection method capable of preventing or inhibiting alteration and erosion of Low-E layers. The protection method includes a step of applying a protective sheet to a surface of a Low-E glass plate having a Low-E layer comprising a tin component. Here, the Low-E layer comprises a tin component. The protective sheet has a PSA layer. The PSA layer comprises a phosphorus compound having a P—OR group. Here, R is a hydrogen atom or an organic group.

An antireflection structure comprising a transparent substrate having a plurality of holes with U-shaped or V-shaped cross-sectional shapes perpendicular to a flat surface portion and a metal oxide film disposed on the surface portion of the transparent substrate and in the space portions formed in an upward direction from the bottom portions of holes in the transparent substrate, wherein the average diameter of the openings of the holes is 50 nm to 300 nm, the average distance between the center points of openings of the adjacent holes is 100 nm to 400 nm, and the depth of each hole from the surface portion of the substrate is 80 nm to 250 nm; and the thickness of the metal oxide film disposed in each of the space portions increases as the depth of each of the holes becomes larger, thereby reducing the difference in depth between the holes from the uppermost surface portion of the metal oxide film disposed on the surface portion to the surface portions of the metal oxide films in the space portions.

An anti-reflective film-attached transparent substrate includes a transparent substrate having two main surfaces and, on at least one of the main surfaces, a multilayer film in which at least two layers having different refractive indices are laminated. At least one silicon oxide layer among the layers in the multilayer film has a moisture permeability of 300 g/m.sup.2/day or less.

A preparation method for a high-refractive index hydrogenated silicon film, a high-refractive index hydrogenated silicon film, a light filtering lamination and a light filtering piece. The method includes: (a) by magnetic controlled Si target sputtering, Si deposits on a base body, forming a silicon film, which (b) forms an oxygenic hydrogenated silicon film in environment of active hydrogen and active oxygen, the amount of active oxygen accounts for 4%-99% of the total amount of active hydrogen and active oxygen, or, a nitric hydrogenated silicon film in environment of active hydrogen and active nitrogen, the amount of active nitrogen accounts for 5%-20% of the total amount of active hydrogen and active nitrogen. Sputtering and reactions are separately conducted, Si first deposits on the base body by magnetic controlled Si target sputtering, and then plasmas of active hydrogen and active oxygen/nitrogen react with silicon for oxygenic or nitric SiH.

A window has an ion exchange substrate with a top surface. To improve robustness, the top surface has a polycrystalline aluminum oxide film formed from a plurality of crystals. At least 95% of the plurality of crystals in the aluminum oxide film has a largest dimension of no greater than about 10 nanometers. In addition, both the ion exchange substrate and aluminum oxide film are transparent or translucent.

The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.

A low-E (low emissivity) coating includes a multilayer overcoat designed for reducing fingerprints. The multilayer overcoat includes a layer comprising an oxide of zirconium (e.g., ZrO.sub.2) sandwiched between and contacting first and second layers of or including silicon nitride (e.g., Si.sub.3N.sub.4, SiO.sub.xN.sub.y, SiZrO.sub.xN.sub.y, or the like). The uppermost layer comprising silicon nitride modifies the surface energy of the layer comprising the oxide of zirconium so as to make the uppermost surface of the coating more hydrophilic, thereby reducing or minimizing interaction between zirconium oxide and finger oil to reduce fingerprints on the uppermost surface of the coating.

A method of UV photobleaching a glass sample having UV-induced colorization is disclosed. The processed includes first irradiating the glass sample with colorizing UV radiation having a colorizing wavelength of λ.sub.C<300 nm to form the colorized glass, which has a pink hue. The method then includes irradiating the colorized glass with bleaching UV radiation having a bleaching wavelength of λ.sub.B, wherein 248 nm≦λ.sub.B≦365 nm, to substantially remove the pink hue.

Certain example embodiments relate to vending machines with large area transparent touch electrode (LATTE) technology, and/or associated methods. By using the low-E Ag-based coatings described herein, it is possible to create new vending machine user interfaces that are more interesting and interactive than conventional interfaces. Touch-based user interfaces may be useful in vending, attract, and game-playing modes into which example vending machines may be placed and under which they may be operated.