A low-E coating supported by a glass substrate, the coating from the glass substrate outwardly including at least the following layers: a dielectric layer of or including silicon nitride; a high index layer having a refractive index of at least 2.1; another dielectric layer of or including silicon nitride; a layer comprising zinc oxide; an infrared (IR) reflecting layer, wherein the coating includes only one IR reflecting layer; and an overcoat including (i) a layer comprising tin oxide and (ii) a layer comprising silicon nitride located over and contacting the layer comprising tin oxide. An IG unit including the coating may have a visible transmission of at least 70%.

A glass laminate includes a glass substrate; and an anti-reflection layer laminated on the glass substrate and a minimum of absorbances of the glass laminate in wavelengths of 380 to 780 nm is 0.01 or more.

Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers. The low-E coating is exposed to laser pulses having a duration of no more than 10.sup.−12 seconds, a wavelength of 355-500 nm, and an energy density of more than 30 kW/cm.sup.2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C. while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form.

There are provided coated articles that include two or more infrared (IR) reflecting layers (e.g., of or including NbZr, Nb, NiCr, NiCrMo, and/or a nitride thereof) sandwiched between at least dielectric layers, and/or a method of making the same. The coating may be designed so that the coated articles realize green glass side reflective coloration in combination with a low solar factor (SF) and/or a low solar heat gain coefficient (SHGC). Such coated articles may be used in the context of monolithic windows, insulating glass (IG) window units, laminated windows, and/or other suitable applications, and may optionally be heat treated (e.g., thermally tempered) in certain instances.

Insulated glazing units comprising first and second sheets of glazing material with a low pressure space there between are described. The major surface of the second sheet of glazing material not facing the low pressure space has a low emissivity coating comprising at least one layer of fluorine doped tin oxide thereon. There is a first anti-iridescence coating between the low emissivity coating and the second sheet of glazing material. Also described are insulated glazing units comprising three (first, second and third) sheets of glazing material with a low pressure space between first and second sheets of glazing material, and a second space between the first and third sheets of glazing material. There is a low emissivity coating on one or both major surfaces facing the low pressure space. The third sheet of glazing material has a low emissivity coating on both opposed major surfaces thereof.

A production method for a glass roll includes a start preparation step (S1) of feeding-out a first lead film (LF1) coupled to a starting end portion (GFa) of a first glass film (GF1) from an unwinding device (3) and allowing a winding device (8) to wind the first lead film (LF1 after passing of the first lead film (LF1) through a thermal film-forming device (4),). The start preparation step (S1) includes a temperature increasing step of causing the thermal film-forming device (4) to be increased in temperature to a film-forming temperature. The first glass film (GF1) reaches the thermal film-forming device (4) before the thermal film-forming device (4) is increased in temperature to the film-forming temperature.

A process in which both an optical coating, for example, an AR coating, and an ETC coating are deposited on a glass substrate article, in sequential steps, with the optical coating being deposited first and the ETC coating being deposited second, using the same apparatus and without exposing the article to the atmosphere at any time during the application of the optical coating and ETC coating.

A method for manufacturing a glass article includes a heating step that heats a heating object made of glass. The heating step includes heating the heating object by converting, by a converter arranged between the heating object and a radiant heat source that radiates infrared light, a spectrum of the infrared light radiated from the radiant heat source and causing the heating object to absorb the infrared light radiated from the converter. The converter includes: an infrared light absorber that generates heat by absorbing the infrared light radiated from the radiant heat source; and an infrared light radiator made of a silicon-containing material. The infrared light radiator is heated through thermal conduction from the infrared light absorber. At least part of a surface of the converter facing the heating object includes at least part of a surface of the infrared light radiator.

A coated glass pane and a method of preparing same comprising at least the following layers in sequence: a glass substrate; a lower anti-reflection layer, a silver-based functional layer; a barrier layer; an upper dielectric layer; and a topmost dielectric layer which comprises an oxide of zinc (Zn), tin (Sn) and zirconium (Zr); and wherein the amount of zirconium in the topmost dielectric layer comprises at least 10 atomic percent zirconium.

Disclosed are a method for producing an optical thin film having a low refractive index, a thin film forming material, an optical thin film, and an optical member. The method for producing an optical thin film includes forming a vapor deposition film by depositing a thin film forming material on an object in a non-oxidizing atmosphere by a physical vapor deposition method; and bringing the vapor deposition film into contact with a first acidic solution comprising an acidic substance in a range of pH 2.5 or more and pH 3.5 or less to obtain a first thin film having voids, wherein the thin film forming material is a mixture comprising indium oxide and silicon oxide, in which the indium oxide is in a range of 0.230 mol or more and 0.270 mol or less with respect to 1 mol of the silicon oxide.