Patent classifications
C04B2235/668
Oxide sintered body, production method therefor, target, and transparent conductive film
A target for sputtering which enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell. A oxide sintered body includes an indium oxide and a cerium oxide, and one or more oxide of titanium, zirconium, hafnium, molybdenum and tungsten. The cerium content is 0.3 to 9% by atom, as an atomicity ratio of Ce/(In+Ce), and the content of cerium is equal to or lower than 9% by atom, as an atomicity ratio of Ce/(In+Ce). The oxide sintered body has an In.sub.2O.sub.3 phase of a bixbyite structure has a CeO.sub.2 phase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm.
CERAMIC AND METAL BORON NITRIDE NANOTUBE COMPOSITES
The present invention provides for materials and methods of making metal and ceramic matrix composites reinforced with boron nitride nanomaterials for improved physical properties such as hardness, fracture toughness, and bend strength.
MULTI-PHASIC CERAMIC COMPOSITE
A ceramic composite can include a first ceramic phase and a second ceramic phase. The first ceramic phase can include a silicon carbide. The second phase can include a boron carbide. In an embodiment, the silicon carbide in the first ceramic phase can have a grain size in a range of 0.8 to 200 microns. The first phase, the second phase, or both can further include a carbon. In another embodiment, at least one of the first ceramic phase and the second ceramic phase can have a median minimum width of at least 5 microns.
TUNGSTEN OXIDE SPUTTERING TARGET
A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.38 or less, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.55 or more, and an area ratio of W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.
ZIRCONIA SINTERED BODY AND METHOD FOR PRODUCING THE SAME
A complex sintered body includes a lamination of a layer composed of a zirconia sintered body containing 0.5% or more by mole and less than 4% by mole of an oxide of cerium in terms of CeO.sub.2, 2% or more by mole and less than 6% by mole of yttria and 0.1% or more by mass and less than 2% by mass of an oxide of aluminum; and at least one of a layer composed of a zirconia-based sintered body containing 2.0% or more by mass and 20.0% or less by mass of an oxide of aluminum, and a layer composed of a zirconia-based sintered body containing 2% or more by mole and less than 6% by mole of yttria and a coloring agent.
SINTERED BODY, METHOD OF FABRICATING THE SAME, SEMICONDUCTOR FABRICATING DEVICE, AND METHOD OF FABRICATING SEMICONDUCTOR FABRICATING DEVICE
A sintered body, a method of fabricating the sintered body, a semiconductor fabricating device, and a method of fabricating the semiconductor fabricating device, the sintered body including 50 mass % or more of Y.sub.5O.sub.4F.sub.7, wherein the sintered body has a relative density of 97.0% or more and a Vickers hardness of 2.4 GPa or more.
Ceramic material with high thermal shock resistance and high erosion resistance
Certain embodiments of the present disclosure relate to ceramic materials with high thermal shock resistance and high erosion resistance. In one embodiment, a ceramic material is formed from a composition comprising Al.sub.2O.sub.3, MgO, SiO.sub.2.
ZIRCONIA MOLDED BODY AND PRE-SINTERED BODY CAPABLE OF BEING SINTERED IN SHORT TIME
A zirconia sintered body may excel in translucency, strength, in linear light transmittance, and can be produced by short-time sintering without an HIP device, and be used in zirconia molded bodies and pre-sintered bodies from which such a zirconia sintered body can be obtained. A zirconia molded body with zirconia particles and 2.0 to 9.0 mol % yttria, having an average primary particle diameter less than 60 nm, and a monoclinic crystal system in a fraction of ≥55%. The zirconia molded body may have ≥1% undissolved yttria. A zirconia pre-sintered body may have such zirconia particles, wherein the zirconia pre-sintered body has ΔL*(W−B) of ≥5 through a thickness of 1.5 mm. A zirconia sintered body may have a fluorescent agent and 2.0 to 9.0 mol % yttria, and a crystal grain size of ≤180 nm.
Method for process for producing fully ceramic microencapsulated fuels containing tristructural-isotropic particles with a coating layer having higher shrinkage than matrix
The present invention relates to a method for preparing a fully ceramic capsulated nuclear fuel material containing three-layer-structured isotropic nuclear fuel particles coated with a ceramic having a composition which has a higher shrinkage than a matrix in order to prevent cracking of ceramic nuclear fuel, wherein the three-layer-structured nuclear fuel particles before coating is included in the range of between 5 and 40 fractions by volume based on after sintering. More specifically, the present invention provides a composition for preparing a fully ceramic capsulated nuclear fuel containing three-layer-structured isotropic particles coated with the substance which includes, as a main ingredient, a silicon carbine derived from a precursor of the silicon carbide wherein a condition of ΔL.sub.c>ΔL.sub.m at normal pressure sintering is created, where the sintering shrinkage of the coating layer of the three-layer-structured isotropic nuclear fuel particles is ΔL.sub.c and the sintering shrinkage of the silicon carbide matrix is ΔL.sub.m; material produced therefrom; and a method for manufacturing the material. The residual porosity of the fully ceramic capsulated nuclear fuel material is 4% or less.
TUNGSTEN OXIDE SPUTTERING TARGET
A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.57 or more, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.38 or less, and an area ratio of the W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.