An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a composition formed of the compound, a cured product, an optically anisotropic body, and a reflective film.

The compound of the present invention is a compound represented by General Formula (1).

##STR00001##

An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a composition formed of the compound, a cured product, an optically anisotropic body, and a reflective film.

The compound of the present invention is a compound represented by General Formula (1).

##STR00001##

The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using it. [Means for Solution] A composition comprising a allyloxy derivative having a specific group and a solvent, and methods of manufacturing a resist underlayer and semiconductor device using it.

The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using it. [Means for Solution] A composition comprising a allyloxy derivative having a specific group and a solvent, and methods of manufacturing a resist underlayer and semiconductor device using it.

The present invention refers to a process for preparing a compound of formula (I) or a pharmaceutically acceptable salt thereof: wherein R is (C.sub.3-C.sub.10)alkyl, or ω-trifluoro(C.sub.3-C.sub.10)alkyl; R.sub.1 and R.sub.2 are, independently, hydrogen, hydroxy, (C.sub.1-C.sub.8) alkoxy, (C.sub.1-C.sub.8) alkylthio, halo, trifluoromethyl or 2,2,2-trifluoroethyl; or one of R.sub.1 and R.sub.2 is in ortho position to the R—O— group and, taken together with the same R—O—, represents a Formula (A) group where R.sub.0 is (C.sub.2-C.sub.9)alkyl; R.sub.3 and R.sub.4 are, independently, hydrogen, (C.sub.1-C.sub.4)alkyl; or R.sub.4 is hydrogen and R.sub.5 is a group selected from —CH.sub.2—OH, —CH.sub.2—O—(C.sub.1-C.sub.6)alkyl, —CH(CH.sub.3)—OH, —(CH.sub.2).sub.2—S—CH.sub.3, benzyl and 4-hydroxybenzyl; or R.sub.4 and R.sub.5, taken together with the adjacent carbon atom, form a (C.sub.3-C.sub.6)cycloalkyl residue; R.sub.5 and R.sub.6 are independently hydrogen or (C.sub.1-C.sub.6)alkyl; or taken together with the adjacent nitrogen atom form a 5-6 membered monocyclic saturated heterocycle, optionally containing one additional heteroatom chosen among —O—, —S— and —NR.sub.7— where R.sub.7 is hydrogen or (C.sub.1-C.sub.6) alkyl; and wherein optionally one or more hydrogen atom in the groups R, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, preferably in the R group, can be substituted by a deuterium atom.

##STR00001##

The present invention refers to a process for preparing a compound of formula (I) or a pharmaceutically acceptable salt thereof: wherein R is (C.sub.3-C.sub.10)alkyl, or ω-trifluoro(C.sub.3-C.sub.10)alkyl; R.sub.1 and R.sub.2 are, independently, hydrogen, hydroxy, (C.sub.1-C.sub.8) alkoxy, (C.sub.1-C.sub.8) alkylthio, halo, trifluoromethyl or 2,2,2-trifluoroethyl; or one of R.sub.1 and R.sub.2 is in ortho position to the R—O— group and, taken together with the same R—O—, represents a Formula (A) group where R.sub.0 is (C.sub.2-C.sub.9)alkyl; R.sub.3 and R.sub.4 are, independently, hydrogen, (C.sub.1-C.sub.4)alkyl; or R.sub.4 is hydrogen and R.sub.5 is a group selected from —CH.sub.2—OH, —CH.sub.2—O—(C.sub.1-C.sub.6)alkyl, —CH(CH.sub.3)—OH, —(CH.sub.2).sub.2—S—CH.sub.3, benzyl and 4-hydroxybenzyl; or R.sub.4 and R.sub.5, taken together with the adjacent carbon atom, form a (C.sub.3-C.sub.6)cycloalkyl residue; R.sub.5 and R.sub.6 are independently hydrogen or (C.sub.1-C.sub.6)alkyl; or taken together with the adjacent nitrogen atom form a 5-6 membered monocyclic saturated heterocycle, optionally containing one additional heteroatom chosen among —O—, —S— and —NR.sub.7— where R.sub.7 is hydrogen or (C.sub.1-C.sub.6) alkyl; and wherein optionally one or more hydrogen atom in the groups R, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, preferably in the R group, can be substituted by a deuterium atom.

##STR00001##

A compound having end groups each having a reactive group that are disposed at both ends respectively, and between the end groups, either or both of a first structure in which an aromatic cyclic group, an ether oxygen, a methylene group, an aromatic cyclic group, a methylene group, an ether oxygen and an aromatic cyclic group are bonded together in this order and a second structure in which an aromatic cyclic group, a methylene group, an ether oxygen, an aromatic cyclic group, an ether oxygen, a methylene group and an aromatic cyclic group are bonded together in this order.

A complex of formula (I) ##STR00001## wherein M is zirconium or hafnium; each X independently is a sigma ligand; L is a divalent bridge selected from —R′.sub.2C—, —R′.sub.2C—CR′.sub.2—, —R′.sub.2Si—, —R′.sub.2Si—SiR′.sub.2—, —R′.sub.2Ge—, wherein each R′ is independently a hydrogen atom or a C.sub.1-C.sub.20-hydrocarbyl .group optionally containing one or more silicon atoms or heteroatoms of Group 14-16 of the periodic table or fluorine atoms, and optionally two R′ groups taken together can form a ring; R.sup.2 and R.sup.2′ are each independently a C.sub.1-C.sub.20 hydrocarbyl group, —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group; R.sup.5 is a —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group, said R.sup.5 group being optionally substituted by one or more halo groups; R.sup.5′ is hydrogen or a C.sub.1-20 hydrocarbyl group; —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group; said C.sub.1-20 hydrocarbyl group being optionally substituted by one or more halo groups; R.sup.6 and R.sup.6′ are each independently a C.sub.1-20 hydrocarbyl group; —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group; each R.sup.1 and R.sup.1′ are independently —CH.sub.2R.sup.x wherein R.sup.x are each independently H, or a C.sub.1-20 hydrocarbyl group, optionally containing heteroatoms.

A complex of formula (I) ##STR00001## wherein M is zirconium or hafnium; each X independently is a sigma ligand; L is a divalent bridge selected from —R′.sub.2C—, —R′.sub.2C—CR′.sub.2—, —R′.sub.2Si—, —R′.sub.2Si—SiR′.sub.2—, —R′.sub.2Ge—, wherein each R′ is independently a hydrogen atom or a C.sub.1-C.sub.20-hydrocarbyl .group optionally containing one or more silicon atoms or heteroatoms of Group 14-16 of the periodic table or fluorine atoms, and optionally two R′ groups taken together can form a ring; R.sup.2 and R.sup.2′ are each independently a C.sub.1-C.sub.20 hydrocarbyl group, —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group; R.sup.5 is a —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group, said R.sup.5 group being optionally substituted by one or more halo groups; R.sup.5′ is hydrogen or a C.sub.1-20 hydrocarbyl group; —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group; said C.sub.1-20 hydrocarbyl group being optionally substituted by one or more halo groups; R.sup.6 and R.sup.6′ are each independently a C.sub.1-20 hydrocarbyl group; —OC.sub.1-20 hydrocarbyl group or —SC.sub.1-20 hydrocarbyl group; each R.sup.1 and R.sup.1′ are independently —CH.sub.2R.sup.x wherein R.sup.x are each independently H, or a C.sub.1-20 hydrocarbyl group, optionally containing heteroatoms.

A solid-supported Pd catalyst is suitable for C—C bond formation, e.g., via Suzuki-Miyaura and Mizoroki-Heck cross-coupling reactions, with a support that is reusable, cost-efficient, regioselective, and naturally available. Such catalysts may contain Pd nanoparticles on jute plant sticks (GS), i.e., Pd@GS, and may be formed by reducing, e.g., K.sub.2PdCl.sub.4 with NaBH.sub.4 in water, and then used this as a “dip catalyst.” The dip catalyst can catalyze Suzuki-Miyaura and Mizoroki-Heck cross coupling-reactions in water. The catalysts may have a homogeneous distribution of Pd nanoparticles with average dimensions, e.g., within a range of 7 to 10 nm on the solid support. Suzuki-Miyaura cross-coupling reactions may achieve conversions of, e.g., 97% with TOFs around 4692 h.sup.−1, Mizoroki-Heck reactions with conversions of, e.g., a 98% and TOFs of 237 h.sup.−1, while the same catalyst sample may be used for 7 consecutive cycles, i.e., without addition of any fresh catalyst.