A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Provided is a compound with which a lubricant having excellent adhesion to a magnetic disk, particularly to a protective layer can be provided. A perfluoropolyether compound in accordance with one aspect of this invention has a structure in which two perfluoropolyethers are bonded to each other through an aliphatic ether, the aliphatic ether including a carbon atom to which a primary alcohol is bonded.

The present invention relates to a process for the purification of crude eugenol by distillation in the presence of at least one stabilizing compound. The process of the present invention may be operated industrially, exhibits improved properties, in particular in terms of process safety, and makes possible efficient separation of ortho-eugenol. The present invention also relates to compositions comprising eugenol.

The present invention relates to a process for the purification of crude eugenol by distillation in the presence of at least one stabilizing compound. The process of the present invention may be operated industrially, exhibits improved properties, in particular in terms of process safety, and makes possible efficient separation of ortho-eugenol. The present invention also relates to compositions comprising eugenol.

The invention discloses functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers containing dicyclopentadiene, a method of producing the same and use thereof. The cured products of the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention exhibit low dielectric constant, low dissipation, and high glass transition temperature. As the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention have number-average molecular weight ranging from 2500 to 6000 g/mol, the substrate made of theses functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers can pass the pressure cook test. Besides, the low dissipation factor characteristic the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention can only be demonstrated at number-average molecular weight higher than 2500 g/mol.

The invention discloses functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers containing dicyclopentadiene, a method of producing the same and use thereof. The cured products of the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention exhibit low dielectric constant, low dissipation, and high glass transition temperature. As the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention have number-average molecular weight ranging from 2500 to 6000 g/mol, the substrate made of theses functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers can pass the pressure cook test. Besides, the low dissipation factor characteristic the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention can only be demonstrated at number-average molecular weight higher than 2500 g/mol.

A salt represented by formula (I), a generator and a resist composition:

##STR00001##

wherein R.sup.1 and R.sup.2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH.sub.2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO.sub.2−; X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5; and AI.sup.− represents an organic anion.

The present disclosure provides certain indane compounds that are Hypoxia Inducible Factor 2α (HIF-2α) inhibitors and are therefore useful for the treatment of diseases treatable by inhibition of HIF-2α. Also provided are pharmaceutical compositions containing such compounds and processes for preparing such compounds.

The present disclosure provides certain indane compounds that are Hypoxia Inducible Factor 2α (HIF-2α) inhibitors and are therefore useful for the treatment of diseases treatable by inhibition of HIF-2α. Also provided are pharmaceutical compositions containing such compounds and processes for preparing such compounds.

The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R.sup.1, R.sup.2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X.sup.1, X.sup.2, X.sup.3, X.sup.4 are CH, C—R.sup.x or N, provided that in each ring at most two of X.sup.1, X.sup.2, X.sup.3, X.sup.4 are N; R.sup.x is e.g. halogen, CN or CH═CH.sub.2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).

##STR00001##