The present invention is directed to benzoquinazilinone compounds of formula (I) ##STR00001##
which are M1 receptor positive allosteric modulators and that are useful in the treatment of diseases in which the M1 receptor is involved, such as Alzheimer's disease, schizophrenia, pain or sleep disorders. The invention is also directed to pharmaceutical compositions comprising the compounds, and to the use of the compounds and compositions in the treatment of diseases mediated by the M1 receptor.

The present invention is directed to benzoquinazilinone compounds of formula (I) ##STR00001##
which are M1 receptor positive allosteric modulators and that are useful in the treatment of diseases in which the M1 receptor is involved, such as Alzheimer's disease, schizophrenia, pain or sleep disorders. The invention is also directed to pharmaceutical compositions comprising the compounds, and to the use of the compounds and compositions in the treatment of diseases mediated by the M1 receptor.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Ra.sup.1 represents an aromatic ring; Ra.sup.01 represents an alkyl group of 5 or more carbon atoms optionally having a substituent; Ra.sup.02 and Ra.sup.03 each independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and X.sup. represents a counteranion. ##STR00001##

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Ra.sup.1 represents an aromatic ring; Ra.sup.01 represents an alkyl group of 5 or more carbon atoms optionally having a substituent; Ra.sup.02 and Ra.sup.03 each independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and X.sup. represents a counteranion. ##STR00001##

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: ##STR00001##
in which Ra.sup.1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra.sup.2 and Ra.sup.3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X.sup. represents a counter anion.

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: ##STR00001##
in which Ra.sup.1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra.sup.2 and Ra.sup.3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X.sup. represents a counter anion.

The present invention generally relates to processes for converting acrylate esters or a derivative thereof to difluoropropionic acid or a derivative thereof. This process is generally performed using fluorine gas in a hydrofluorocarbon solvent.

The present invention generally relates to processes for converting acrylate esters or a derivative thereof to difluoropropionic acid or a derivative thereof. This process is generally performed using fluorine gas in a hydrofluorocarbon solvent.

A compound represented by general formula: R.sup.1R.sup.2X, wherein R.sup.1 is CH.sub.3, CH.sub.2F, CHF.sub.2, CH.sub.2I, CHFI, or an anionic group, R.sup.2 is an alkylene group consisting of unit represented by CFH, or an alkylene group consisting of unit represented by CFH and a unit represented by CH.sub.2, provided that these alkylene groups optionally contain epoxy group, CH(OH), CHI, or a divalent cycloalkylene group, X is OH, CH(R.sup.21)OH (wherein R.sup.21 is H, a non-fluorinated alkyl group, or a fluorinated alkyl group), I, CFHI, CH.sub.2I, an anionic group, or COOR.sup.22 (wherein R.sup.22 is a non-fluorinated alkyl group having 1 to 8 carbon atoms, and the total number of carbon atoms of R.sup.1, R.sup.2, and X is 2 to 50).

A compound represented by general formula: R.sup.1R.sup.2X, wherein R.sup.1 is CH.sub.3, CH.sub.2F, CHF.sub.2, CH.sub.2I, CHFI, or an anionic group, R.sup.2 is an alkylene group consisting of unit represented by CFH, or an alkylene group consisting of unit represented by CFH and a unit represented by CH.sub.2, provided that these alkylene groups optionally contain epoxy group, CH(OH), CHI, or a divalent cycloalkylene group, X is OH, CH(R.sup.21)OH (wherein R.sup.21 is H, a non-fluorinated alkyl group, or a fluorinated alkyl group), I, CFHI, CH.sub.2I, an anionic group, or COOR.sup.22 (wherein R.sup.22 is a non-fluorinated alkyl group having 1 to 8 carbon atoms, and the total number of carbon atoms of R.sup.1, R.sup.2, and X is 2 to 50).