Patent classifications
C07C69/635
HALOGENATED ESTERS OF CYCLOPROPANATED UNSATURATED FATTY ACIDS FOR USE IN THE TREATMENT OF NEURODEGENERATIVE DISEASES
The present disclosure describes novel PKC-? activators chosen from halogenated esters of unsaturated fatty acids and derivatives thereof, including halogenated esters of both polyunsaturated and monounsaturated fatty acids and derivatives thereof. The disclosure further relates to compositions, kits, and methods for treatment using the halogenated esters.
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt capable of generating fluorobenzoic acid bonded to iodized benzene offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
Halogenated esters of cyclopropanated unsaturated fatty acids for use in the treatment of neurodegenerative diseases
The present disclosure describes novel PKC-? activators chosen from halogenated esters of unsaturated fatty acids derivatives thereof, including halogenated esters of both polyunsaturated and monunsaturated fatty acids and derivatives thereof. The disclosure further relates to compositions, kits, and methods for treatment using the halogenated esters.
Halogenated esters of cyclopropanated unsaturated fatty acids for use in the treatment of neurodegenerative diseases
The present disclosure describes novel PKC-? activators chosen from halogenated esters of unsaturated fatty acids derivatives thereof, including halogenated esters of both polyunsaturated and monunsaturated fatty acids and derivatives thereof. The disclosure further relates to compositions, kits, and methods for treatment using the halogenated esters.
Resist composition and patterning process
A resist composition comprising a base polymer and a sulfonium salt capable of generating fluorinated aminobenzoic acid offers a satisfactory dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
Resist composition and patterning process
A resist composition comprising a base polymer and a sulfonium salt capable of generating fluorinated aminobenzoic acid offers a satisfactory dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
INSECT REPELLENT COMPOUNDS AND COMPOSITIONS, AND METHODS THEREOF
The present invention relates to monoterpenoid and phenylpropanoid containing derivative compounds, methods of making the compounds, compositions comprising the compounds, and methods of repelling pests using the compounds and/or compositions.
INSECT REPELLENT COMPOUNDS AND COMPOSITIONS, AND METHODS THEREOF
The present invention relates to monoterpenoid and phenylpropanoid containing derivative compounds, methods of making the compounds, compositions comprising the compounds, and methods of repelling pests using the compounds and/or compositions.