The present disclosure relates to PEG-lipids, cationic and/or ionizable lipids and nucleic acid-lipid particle compositions comprising the same. The present disclosure also relates to methods of making, using and delivering the described lipids and lipid-containing particles.

Compounds represented by formulae I, II, III, and IV including pro-drugs for treprostinil and prostacyclin analogs. Uses include treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH). The structures of the compounds can be adapted to the particular application for a suitable treatment dosage. Transdermal applications can be used.

Compounds represented by formulae I, II, III, and IV including pro-drugs for treprostinil and prostacyclin analogs. Uses include treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH). The structures of the compounds can be adapted to the particular application for a suitable treatment dosage. Transdermal applications can be used.

The present invention provides a compound represented by the formula (Ia) as a novel cationic lipid that forms a lipid particle and also provides a lipid particle comprising the compound. The present invention further provides a nucleic acid lipid particle containing the lipid particle, and a pharmaceutical composition containing the nucleic acid lipid particle as an active ingredient.

The present invention provides a compound represented by the formula (Ia) as a novel cationic lipid that forms a lipid particle and also provides a lipid particle comprising the compound. The present invention further provides a nucleic acid lipid particle containing the lipid particle, and a pharmaceutical composition containing the nucleic acid lipid particle as an active ingredient.

The present invention provides a method for producing a high quality cationic surfactant, which is prevented from smelling and coloring, and has favorable storage stability. The production method includes the following step 1, step 2, step 3, and step 4: step 1: a step of obtaining an alkanolamine ester by reacting an alkanolamine with a fatty acid or a fatty acid alkyl ester without using hypophosphoric acid or a salt thereof; step 2: a step of obtaining a cationic surfactant by quaternizing the alkanolamine ester obtained in the step 1 with a dialkyl sulfate; step 3: a step of performing an oxidation treatment of the cationic surfactant obtained in the step 2; and step 4: a step of performing a reduction treatment of the cationic surfactant subjected to the oxidation treatment obtained in the step 3.

The present invention provides a method for producing a high quality cationic surfactant, which is prevented from smelling and coloring, and has favorable storage stability. The production method includes the following step 1, step 2, step 3, and step 4: step 1: a step of obtaining an alkanolamine ester by reacting an alkanolamine with a fatty acid or a fatty acid alkyl ester without using hypophosphoric acid or a salt thereof; step 2: a step of obtaining a cationic surfactant by quaternizing the alkanolamine ester obtained in the step 1 with a dialkyl sulfate; step 3: a step of performing an oxidation treatment of the cationic surfactant obtained in the step 2; and step 4: a step of performing a reduction treatment of the cationic surfactant subjected to the oxidation treatment obtained in the step 3.

Compounds represented by formulae I, II, III, and IV including pro-drugs for treprostinil and prostacyclin analogs. Uses include treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH). The structures of the compounds can be adapted to the particular application for a suitable dosage. Transdermal applications can be used.

Compounds represented by formulae I, II, III, and IV including pro-drugs for treprostinil and prostacyclin analogs. Uses include treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH). The structures of the compounds can be adapted to the particular application for a suitable dosage. Transdermal applications can be used.

The present invention provides a developer for a photosensitive resist composition, comprising a compound represented by the general formula (1) ##STR00001##
wherein R.sup.1 to R.sup.6 represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms; and X represents a linear or branched alkylene group having 6 to 16 carbon atoms and optionally having an ester group. There can be provided a developer that can prevent the occurrence of pattern collapse and connection between patterns, i.e. bridge defect after development and can provide a resist pattern with small edge roughness.