A compound of formula (Ie′): ##STR00001##
wherein Ar′, R.sub.1, R.sub.4e and Y are as defined herein and a method of controlling pests using the compound.

A compound of formula (Ie′): ##STR00001##
wherein Ar′, R.sub.1, R.sub.4e and Y are as defined herein and a method of controlling pests using the compound.

The preparation is described of a compound of formula (I) comprising an —SO.sub.2F function by reacting a compound of formula (II) with a fluorinating agent selected from hydrofluoric acid and an ionic fluoride of a monovalent or divalent cation:
R—SO.sub.2F  (I)
R′—SO.sub.2X  (II)
where R is selected from the groups R1, R2 and R3: R1=—C.sub.nH.sub.aF.sub.b with n=1-10, a+b=2n+1, b≧1; R2=—C.sub.xH.sub.yF.sub.z—SO.sub.2F with x=1-10, y+z=2x and z≧1; R3=φ-C.sub.cH.sub.hF.sub.f with c=1-10; h+f=2c and f≧1;
where R′ is selected from the following groups R′1, R′2 and R′3: R′1=—C.sub.nH.sub.aX.sub.b with n=1-10, a+b=2n+1, b≧1; R′2=—C.sub.xH.sub.yX.sub.z—SO.sub.2X with x=1-10, y+z=2x and z≧1; R′3=φ-C.sub.cH.sub.hX.sub.f with c=1-10; h+f=2c and f≧1; φ denoting a phenyl group; X═Cl, Br.

The preparation is described of a compound of formula (I) comprising an —SO.sub.2F function by reacting a compound of formula (II) with a fluorinating agent selected from hydrofluoric acid and an ionic fluoride of a monovalent or divalent cation:
R—SO.sub.2F  (I)
R′—SO.sub.2X  (II)
where R is selected from the groups R1, R2 and R3: R1=—C.sub.nH.sub.aF.sub.b with n=1-10, a+b=2n+1, b≧1; R2=—C.sub.xH.sub.yF.sub.z—SO.sub.2F with x=1-10, y+z=2x and z≧1; R3=φ-C.sub.cH.sub.hF.sub.f with c=1-10; h+f=2c and f≧1;
where R′ is selected from the following groups R′1, R′2 and R′3: R′1=—C.sub.nH.sub.aX.sub.b with n=1-10, a+b=2n+1, b≧1; R′2=—C.sub.xH.sub.yX.sub.z—SO.sub.2X with x=1-10, y+z=2x and z≧1; R′3=φ-C.sub.cH.sub.hX.sub.f with c=1-10; h+f=2c and f≧1; φ denoting a phenyl group; X═Cl, Br.

There are disclosed compounds of formula (I) that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or inflammatory disorders utilizing the compounds of the invention. ##STR00001##

There are disclosed compounds of formula (I) that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or inflammatory disorders utilizing the compounds of the invention. ##STR00001##

There are disclosed compounds that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or autoimmune diseases utilizing the compounds of the invention.

There are disclosed compounds that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or autoimmune diseases utilizing the compounds of the invention.

Compositions including one or more fluorochemical surfactants of the formula: (I) where R.sub.f is a perfluoroalkyl group, each of R.sup.1, R.sup.2 and R.sup.3 are C.sub.1-C.sub.20 alkyl, alkoxy, or aryl; and R.sup.4 is alkylene, arylene of a combination thereof. R.sup.4 is preferably an alkylene of 1-20 carbons that may be cyclic or acyclic, may optionally contain catenated or terminal heteroatoms selected from the group consisting of N, O, and S. Most preferably R.sup.4 is an alkylene of 2-10 carbon atoms. Described are anionic N-substituted fluorinated amine oxide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

##STR00001##

Compositions including one or more fluorochemical surfactants of the formula: (I) where R.sub.f is a perfluoroalkyl group, each of R.sup.1, R.sup.2 and R.sup.3 are C.sub.1-C.sub.20 alkyl, alkoxy, or aryl; and R.sup.4 is alkylene, arylene of a combination thereof. R.sup.4 is preferably an alkylene of 1-20 carbons that may be cyclic or acyclic, may optionally contain catenated or terminal heteroatoms selected from the group consisting of N, O, and S. Most preferably R.sup.4 is an alkylene of 2-10 carbon atoms. Described are anionic N-substituted fluorinated amine oxide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

##STR00001##