The disclosure provides recording materials including mono- or poly-phenyl-core derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed for mono- or poly-phenyl-core derivatized monomers and polymers for use in Bragg gratings applications, leading to materials with higher refractive index, low birefringence, and high transparency. The disclosed mono- or poly-phenyl-core derivatized monomers and polymers thereof can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

Provided are a carboxylate capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. Disclosed are a carboxylate represented by formula (I) and a resist composition:

##STR00001##

wherein Ar represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, X.sup.1 represents an oxygen atom or a sulfur atom, R.sup.1 represents a halogen atom or a haloalkyl group having 1 to 12 carbon atoms, R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH.sub.2— included in the haloalkyl group and the alkyl group may be replaced by —O— or —CO—, m1 represents an integer of 1 to 6, m2 represents an integer of 0 to 4, and Z.sup.+ represents an organic cation.

Polymerizable compounds, processes and intermediates for their preparation, compositions containing them, polymers made from the compounds or compositions, and uses of the polymerizable compounds, compositions and polymers.

Polymerizable compounds, processes and intermediates for their preparation, compositions containing them, polymers made from the compounds or compositions, and uses of the polymerizable compounds, compositions and polymers.

According to the present invention, there is provided a method of producing a salt, including reacting M.sup.+X.sup.− with YH to generate XH and M.sup.+Y.sup.− and subsequently removing the generated XH to obtain the M.sup.+Y.sup.−.

In the method of producing a salt, M.sup.+X.sup.− is a salt of a cation represented by M.sup.+ and an anion represented by X.sup.−, M.sup.+Y.sup.− is a salt of the cation represented by M.sup.+ and an anion represented by Y.sup.−, XH is a conjugate acid of X.sup.−, YH is a conjugate acid of Y.sup.−, M.sup.+Y.sup.− is a compound that generates an acid upon irradiation with an active ray or a radioactive ray, a pKa of XH is larger than a pKa of YH, and a ClogP value of XH is larger than 2.

According to the present invention, there is provided a method of producing a salt, including reacting M.sup.+X.sup.− with YH to generate XH and M.sup.+Y.sup.− and subsequently removing the generated XH to obtain the M.sup.+Y.sup.−.

In the method of producing a salt, M.sup.+X.sup.− is a salt of a cation represented by M.sup.+ and an anion represented by X.sup.−, M.sup.+Y.sup.− is a salt of the cation represented by M.sup.+ and an anion represented by Y.sup.−, XH is a conjugate acid of X.sup.−, YH is a conjugate acid of Y.sup.−, M.sup.+Y.sup.− is a compound that generates an acid upon irradiation with an active ray or a radioactive ray, a pKa of XH is larger than a pKa of YH, and a ClogP value of XH is larger than 2.

A salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10 or —O-L.sup.1-CO—O—R.sup.10, L.sup.1 represents an alkanediyl group, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R.sup.10 represents an acid-labile group, X.sup.1, X.sup.2 and X.sup.3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

There are disclosed deuterated 2C—X phenethylamine compounds, the use of such compounds in the treatment of diseases associated with a serotonin 5-HT.sub.2 receptor, pharmaceutical compositions such as tablet compositions and kits containing the compounds, methods of delivering the compounds in a mist via inhalation, and methods of treating diseases or disorders associated with a serotonin 5-HT.sub.2 receptor, such as central nervous system (CNS) disorders or psychological disorders with the compounds of the invention.

There are disclosed deuterated 2C—X phenethylamine compounds, the use of such compounds in the treatment of diseases associated with a serotonin 5-HT.sub.2 receptor, pharmaceutical compositions such as tablet compositions and kits containing the compounds, methods of delivering the compounds in a mist via inhalation, and methods of treating diseases or disorders associated with a serotonin 5-HT.sub.2 receptor, such as central nervous system (CNS) disorders or psychological disorders with the compounds of the invention.

A carboxylate represented by formula (I), a carboxylic acid generator, a resin, and a resist composition including same.

##STR00001## wherein R.sup.1 to R.sup.3 each represent a hydroxy group, —O—R.sup.10, etc.; R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; R.sup.10 represents an acid-labile group; A.sup.1 to A.sup.3 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; X.sup.0 represents a single bond or a hydrocarbon group which may have a substituent; R.sup.bb1 represents a hydrogen atom, a halogen atom, etc.; X.sup.10 represents a single bond, *—O—**, etc.; and L.sup.10 represents a single bond or a hydrocarbon group which may have a substituent.