This document discloses molecules having the following formula (Formula One):

##STR00001##

and processes associated therewith.

This document discloses molecules having the following formula (Formula One): ##STR00001##
and processes associated therewith.

This document discloses molecules having the following formula (Formula One): ##STR00001##
and processes associated therewith.

Disclosed are methods of extracting water from a composition of an organic liquid and water, using a polyol which causes a phase separation.

Disclosed are methods of extracting water from a composition of an organic liquid and water, using a polyol which causes a phase separation.

This document discloses molecules having the following formula (Formula One):

##STR00001##

and processes associated therewith.

Disclosed are methods of extracting water from a composition of an organic liquid and water, using a polyol.

The present invention relates to a shielding compound, a method of forming a thin film using the shielding compound, a semiconductor substrate fabricated using the method, and a semiconductor device including the semiconductor substrate. According to the present invention, by providing a compound having a predetermined structure as a shielding agent, by forming a deposition layer with a uniform thickness as a shielded area on a substrate due to the difference in adsorption distribution of the shielding agent, the deposition rate of the thin film may be reduced, and the thin film growth rate may be appropriately reduced. In addition, even when forming a thin film on a substrate with a complex structure, step coverage and the thickness uniformity of a thin film may be greatly improved, and impurities may be reduced.

The present invention relates to a shielding compound, a method of forming a thin film using the shielding compound, a semiconductor substrate fabricated using the method, and a semiconductor device including the semiconductor substrate. According to the present invention, by providing a compound having a predetermined structure as a shielding agent, by forming a deposition layer with a uniform thickness as a shielded area on a substrate due to the difference in adsorption distribution of the shielding agent, the deposition rate of the thin film may be reduced, and the thin film growth rate may be appropriately reduced. In addition, even when forming a thin film on a substrate with a complex structure, step coverage and the thickness uniformity of a thin film may be greatly improved, and impurities may be reduced.

The present invention relates to an improved, efficient, scalable process to prepare intermediate compounds, such as compound 5M, having the structure ##STR00001##
useful for the synthesis of compounds that target KRAS G12C mutations, such as ##STR00002##