Disclosed is a fluorine-containing oligomer comprising a copolymer of a fluoroalkyl alcohol (meth)acrylic acid derivative represented by the general formula:

C.sub.nF.sub.2n+1(CH.sub.2CF.sub.2).sub.a(CF.sub.2CF.sub.2).sub.b(CH.sub.2CH.sub.2).sub.cOCOCR═CH.sub.2  [I]

wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, a is an integer of 1 to 4; b is an integer of 0 to 3; and c is an integer of 1 to 3; and a (meth)acrylic acid derivative represented by the general formula:

(CH.sub.2═CRCO).sub.mR′  [II]

wherein R is a hydrogen atom or a methyl group, m is 1, 2, or 3; and when m is 1, R′ is OH group, NH.sub.2 group that is unsubstituted or mono- or di-substituted with an alkyl group having 1 to 6 carbon atoms, or a monovalent group derived from an alkylene glycol or polyalkylene glycol group containing an alkylene group having 2 or 3 carbon atoms; when m is 2 or 3, R′ is a divalent or trivalent organic group derived from a diol or triol. The copolymerization reaction is performed using a hydrocarbon-based peroxide or azo compound polymerization initiator. Also disclosed are nano-silica composite particles formed as a condensate of the fluorine-containing oligomer and an alkoxysilane with nano-silica particles.

Provided are a polymer that can be favorably used as a positive resist having a high γ value and a positive resist composition that can favorably form a high-resolution pattern. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. The positive resist composition contains the aforementioned polymer and a solvent.

Provided are a polymer that can be favorably used as a positive resist having a high γ value and a positive resist composition that can favorably form a high-resolution pattern. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. The positive resist composition contains the aforementioned polymer and a solvent.

A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.

A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.

To provide a water/oil repellent composition whereby it is possible to obtain an article which is excellent in each of water-repellency, oil-repellency, washing durability, heavy rain durability and texture, a method for producing said composition, and an article which is excellent in each of water-repellency, oil-repellency, washing durability, heavy rain durability and texture. The water/oil repellent composition comprises a copolymer having units based on a monomer (a), units based on a monomer (b) and units based on a monomer (c), and a liquid medium. Monomer (a): a compound represented by (Z—Y).sub.nX (Z: a C.sub.1-6 perfluoroalkyl group, etc.; Y: a divalent organic group, etc.; n: 1 or 2; X: a polymerizable unsaturated group). Monomer (b): a (meth)acrylate having no polyfluoroalkyl group and having an alkyl group with at least 20 carbon atoms. Monomer (c): a compound represented by CH.sub.2═CR.sup.1C(O)O—[(C.sub.2H.sub.4O).sub.a(C.sub.4H.sub.8O).sub.b]—H (R.sup.1: a hydrogen atom or a methyl group, and a/b=1 to 3).

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

A process is provided that results in an alkyl haloacrylate that is produced by reaction of a dialkyl or diaryl halomalonate with an aldehyde, preferably formalin or paraformaldehyde, and a base catalyst to produce an intermediate that is not isolated and is heated to produce the alkyl haloacrylate. This synthesis can be one pot, meaning it reacts in the same vessel and/or reaction mixture and does not require isolation of the intermediate, and provides an improved yield. In particular, a process is provided that results in an alkyl 2-fluoroacrylate.

A process is provided that results in an alkyl haloacrylate that is produced by reaction of a dialkyl or diaryl halomalonate with an aldehyde, preferably formalin or paraformaldehyde, and a base catalyst to produce an intermediate that is not isolated and is heated to produce the alkyl haloacrylate. This synthesis can be one pot, meaning it reacts in the same vessel and/or reaction mixture and does not require isolation of the intermediate, and provides an improved yield. In particular, a process is provided that results in an alkyl 2-fluoroacrylate.