A method and compounds for enhanced oil recovery (EOR) including flooding of a mixture of water and one or more of the compounds in a geological formation. The compounds have a fluoroalkyl group.

A method and compounds for enhanced oil recovery (EOR) including flooding of a mixture of water and one or more of the compounds in a geological formation. The compounds have a fluoroalkyl group.

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y.sup.1 is a single bond, —CO—NR.sup.2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR.sup.2—. A.sup.1 is a single bond, —O—, —S—, or —NR.sup.3—. R.sup.1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

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A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y.sup.1 is a single bond, —CO—NR.sup.2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR.sup.2—. A.sup.1 is a single bond, —O—, —S—, or —NR.sup.3—. R.sup.1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

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Copolymers of one or more halogenated olefins and one or more halogenated co-monomers selected from the group consisting of halogenated alkenyl ethers, halogenated alkenyl esters, and halogenated (meth)acrylates are useful in various end-use applications wherein the presence of halogen (e.g., fluorine) in the copolymer imparts one or more desirable properties, as compared to analogous copolymers not containing halogen.

Copolymers of one or more halogenated olefins and one or more halogenated co-monomers selected from the group consisting of halogenated alkenyl ethers, halogenated alkenyl esters, and halogenated (meth)acrylates are useful in various end-use applications wherein the presence of halogen (e.g., fluorine) in the copolymer imparts one or more desirable properties, as compared to analogous copolymers not containing halogen.

A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##

A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##