A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C.sub.1-C.sub.20 hydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C.sub.1-C.sub.20 hydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Provided is a laminate having a good whiteness and a high infrared-shielding property. Provided are also a kit forming the above-mentioned laminate, a method for producing a laminate, and an optical sensor. The laminate includes an infrared-shielding layer and a white layer, in which the infrared-shielding layer is a layer that shields at least a part of a wavelength range at 800 to 1,500 nm, and the white layer has a value of L* of 35 to 100, a value of a* of −20 to 20, and a value of b* of −40 to 30 in a L*a*b* color coordinate system of CIE 1976.

Provided is a laminate having a good whiteness and a high infrared-shielding property. Provided are also a kit forming the above-mentioned laminate, a method for producing a laminate, and an optical sensor. The laminate includes an infrared-shielding layer and a white layer, in which the infrared-shielding layer is a layer that shields at least a part of a wavelength range at 800 to 1,500 nm, and the white layer has a value of L* of 35 to 100, a value of a* of −20 to 20, and a value of b* of −40 to 30 in a L*a*b* color coordinate system of CIE 1976.

An optical polymer material includes an alternating copolymer made of a monomer of a styrene derivative and a monomer of a maleimide derivative, and has a nonlinear property in which the photoelastic coefficient of the optical polymer material decreases to a predetermined value with increase in composition ratio of the styrene derivative, and rises above the predetermined value with further increase in composition ratio of the styrene derivative. A composition ratio of the styrene derivative is within a predetermined range. An absolute value of the photoelastic coefficient is equal to or smaller than a first absolute value within the predetermined range of the composition ratio, and an absolute value of the intrinsic birefringence is equal to or smaller than a second absolute value of the optical polymer material within the predetermined range of the composition ratio.

An optical polymer material includes an alternating copolymer made of a monomer of a styrene derivative and a monomer of a maleimide derivative, and has a nonlinear property in which the photoelastic coefficient of the optical polymer material decreases to a predetermined value with increase in composition ratio of the styrene derivative, and rises above the predetermined value with further increase in composition ratio of the styrene derivative. A composition ratio of the styrene derivative is within a predetermined range. An absolute value of the photoelastic coefficient is equal to or smaller than a first absolute value within the predetermined range of the composition ratio, and an absolute value of the intrinsic birefringence is equal to or smaller than a second absolute value of the optical polymer material within the predetermined range of the composition ratio.

Provided is a copolymer that can be favorably used as a main chain scission-type positive resist having excellent dry etching resistance. The copolymer includes a monomer unit (A) represented by formula (I), shown below, and a monomer unit (B) represented by formula (II), shown below, and has a weight-average molecular weight of 80,000 or more. In the formulae, L is a single bond or a divalent linking group, Ar is an optionally substituted aromatic ring group, R.sup.1 is an alkyl group, R.sup.2 is an alkyl group, a halogen atom, or a haloalkyl group, p is an integer of not less than 0 and not more than 5, and in a case in which more than one R.sup.2 is present, each R.sup.2 may be the same or different.

##STR00001##

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a fluorinated 1,3-diketone compound, fluorinated p-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a fluorinated 1,3-diketone compound, fluorinated p-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

An organic polymeric particle including an optional first monomer comprising a hydrophobic monomer; a second monomer comprising two or more vinyl groups; an optional third monomer comprising an amine; and a vinyl siloxane polymerizable monomer.