Polymer obtainable by radical emulsion polymerization of (A) at least one acidic vinyl monomer or salt thereof; (B) at least one nonionic vinyl monomer, particularly preferably a hydrophobic nonionic vinyl monomer; (C) at least one monomer containing an unsaturated end group and a polyoxyalkylene part; (D) at least one crosslinking monomer; and (E) optionally, a protective colloid, characterized in that the polymerization is controlled such that (F) the gel effect occurs, at least at times, achieved by adding monomers of type (A), (B), and (C) (dosing time) during 120 minutes; and such that (G) the crosslinking monomer (D) is added, at the very earliest, 10 minutes after the first addition of the monomers (A), (B), and (C).

Polymer obtainable by radical emulsion polymerization of (A) at least one acidic vinyl monomer or salt thereof; (B) at least one nonionic vinyl monomer, particularly preferably a hydrophobic nonionic vinyl monomer; (C) at least one monomer containing an unsaturated end group and a polyoxyalkylene part; (D) at least one crosslinking monomer; and (E) optionally, a protective colloid, characterized in that the polymerization is controlled such that (F) the gel effect occurs, at least at times, achieved by adding monomers of type (A), (B), and (C) (dosing time) during 120 minutes; and such that (G) the crosslinking monomer (D) is added, at the very earliest, 10 minutes after the first addition of the monomers (A), (B), and (C).

A photo-curable coating composition comprising (1) a polyfunctional (meth)acrylic monomer, (2) a photopolymerization initiator, and (3) a specific hydroxyphenyltriazine base UV absorber has high mar resistance and long-term weather resistance.

A photo-curable coating composition comprising (1) a polyfunctional (meth)acrylic monomer, (2) a photopolymerization initiator, and (3) a specific hydroxyphenyltriazine base UV absorber has high mar resistance and long-term weather resistance.

A radiation-sensitive resin composition comprises: a polymer, and a radiation-sensitive acid generator. The polymer comprises a structural unit comprising: an acid-labile group; and an oxoacid group or phenolic hydroxyl group protected by the acid-labile group. The acid-labile group is represented by formula (1). R.sup.1 and R.sup.2 each independently represent a divalent organic group having 1 to 20 carbon atoms. R.sup.3 represents a monovalent group having 1 to 40 atoms and having at least one selected from the group consisting of an oxygen atom, a sulfur atom and a nitrogen atom. * denotes a binding site to the oxy group in the oxoacid group or phenolic hydroxyl group protected.

##STR00001##

A radiation-sensitive resin composition comprises: a polymer, and a radiation-sensitive acid generator. The polymer comprises a structural unit comprising: an acid-labile group; and an oxoacid group or phenolic hydroxyl group protected by the acid-labile group. The acid-labile group is represented by formula (1). R.sup.1 and R.sup.2 each independently represent a divalent organic group having 1 to 20 carbon atoms. R.sup.3 represents a monovalent group having 1 to 40 atoms and having at least one selected from the group consisting of an oxygen atom, a sulfur atom and a nitrogen atom. * denotes a binding site to the oxy group in the oxoacid group or phenolic hydroxyl group protected.

##STR00001##

Various compositions encompassing polymers containing acidic pendent groups in combination with one or more reactive olefinic compounds and a photoacid generators form self-imageable negative tone films. Examples of such polymers include polymers and copolymers containing norbornene-type repeating units having acidic pendent groups, ring opened maleic anhydride polymers, polyacrylic acid, polyhydroxystyrene polymers, and the like. The films formed from such compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices, among other applications.

Various compositions encompassing polymers containing acidic pendent groups in combination with one or more reactive olefinic compounds and a photoacid generators form self-imageable negative tone films. Examples of such polymers include polymers and copolymers containing norbornene-type repeating units having acidic pendent groups, ring opened maleic anhydride polymers, polyacrylic acid, polyhydroxystyrene polymers, and the like. The films formed from such compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices, among other applications.

The invention molecularly equips polyester or polyolefin molding compositions in situ with zinc ions before extrusion, enabling direct processing of the molding compositions from the melt even at high temperatures and ensuring a long-term antibacterial action. The inventive molding compositions include at least one polyester polymer or polyolefin polymer and at least one zinc salt-organoligand complex.

The invention molecularly equips polyester or polyolefin molding compositions in situ with zinc ions before extrusion, enabling direct processing of the molding compositions from the melt even at high temperatures and ensuring a long-term antibacterial action. The inventive molding compositions include at least one polyester polymer or polyolefin polymer and at least one zinc salt-organoligand complex.