The present invention provides a black photosensitive composition which has excellent residue suppressibility in a case where a pattern is formed and which makes it possible to form a pattern having excellent adhesiveness with a smaller exposure amount, a production method for a black photosensitive composition, a cured film, a color filter, a light shielding film, an optical element, a solid-state imaging element, and a headlight unit. The black photosensitive composition according to the present invention is a black photosensitive composition containing a black pigment, a resin, a carboxylic acid anhydride, and a polymerizable compound, in which the carboxylic acid anhydride has a molecular weight of 50 to 550, the carboxylic acid anhydride has a content of 0.30% to 10.0% by mass with respect to a total solid content of the black photosensitive composition, and the black pigment has an average particle diameter of 250 nm or less.

[Problem] To provide: a photosensitive resin composition which is cured by radiation and exhibits excellent wear resistance, antifouling properties, marker pen ink wiping-off properties, fingerprint wiping-off properties and low refractive index, and which provides low reflectance in cases where the photosensitive resin composition is used for an antireflection film; and an antireflection film which has a cured coating film of this photosensitive resin composition. [Solution] A photosensitive resin composition for an antireflection film that is characterized in that a low refractive index layer contains an acrylate, a colloidal silica, and an organic modified dimethyl polysiloxane having an acryloyl group and an acrylate-modified perfluoropolyether that serve as surface modification agents; and an antireflection film which is obtained by curing the photosensitive resin composition.

An aspect of the present invention relates to method of manufacturing a hard coat film, wherein the hard coat film comprises a plastic substrate and a hard coat layer, the method comprises forming the hard coat layer by subjecting a photopolymerizable hard coating composition to photopolymerization processing, and the photopolymerizable hard coating composition comprises a radical polymerizable compound having two or more radical polymerizable groups selected from the group consisting of acryloyloxy groups, acryloyl groups, methacryloyloxy groups, and methacryloyl groups per molecule, a cationic polymerizable compound, a radical photopolymerization initiator, and a cationic photopolymerization initiator.

Photosensitive compositions containing nanosized light emitting materials and (meth)acrylic polymer are suitable for use in a variety of optical applications, for example the preparation of quantum material doped photoresist films, especially for optical devices. Optical films can be prepared be by: a) providing the photosensitive composition onto a substrate, and b) polymerizing the photosensitive composition by exposing the photosensitive composition to radiation.

Photosensitive compositions containing nanosized light emitting materials and (meth)acrylic polymer are suitable for use in a variety of optical applications, for example the preparation of quantum material doped photoresist films, especially for optical devices. Optical films can be prepared be by: a) providing the photosensitive composition onto a substrate, and b) polymerizing the photosensitive composition by exposing the photosensitive composition to radiation.

The present invention is a substrate for a display, the substrate having a film B including a polysiloxane resin on at least one surface of a film A including a polyimide resin, wherein the film B contains inorganic oxide particles therein, and the present invention has an object to provide a substrate for a display: being able to be applied to a color filter, an organic EL element, or the like without the need to carry out any complex operations; allowing high-definition displays to be manufactured; and being provided with a low CTE, a low birefringence, and flexibility.

The present invention is a substrate for a display, the substrate having a film B including a polysiloxane resin on at least one surface of a film A including a polyimide resin, wherein the film B contains inorganic oxide particles therein, and the present invention has an object to provide a substrate for a display: being able to be applied to a color filter, an organic EL element, or the like without the need to carry out any complex operations; allowing high-definition displays to be manufactured; and being provided with a low CTE, a low birefringence, and flexibility.

A polymer resin compound, a photosensitive resin composition for a black bank comprising the polymer resin compound, and a method for manufacturing a black bank. The method comprises coating the photosensitive resin composition on a substrate to form a photosensitive resin film; exposing and developing the photosensitive resin film to pattern the coated photosensitive resin film; and curing the patterned photosensitive resin film.

A polymer resin compound, a photosensitive resin composition for a black bank comprising the polymer resin compound, and a method for manufacturing a black bank. The method comprises coating the photosensitive resin composition on a substrate to form a photosensitive resin film; exposing and developing the photosensitive resin film to pattern the coated photosensitive resin film; and curing the patterned photosensitive resin film.

An alkylene oxide-modified polyfunctional (meth)acrylate is provided wherein the problems according to high crystallinity or high viscosity are improved, and the photosensitivity, etc. is enhanced. The compound has a structure represented by the following formula (I), provided that in the formula (I), R represents a substituent represented by the formula (II); AO represents one member or two or more members selected from alkylene oxide units represented by CH.sub.2CH.sub.2O, CH.sub.2CH(CH.sub.3)O, CH.sub.2CH.sub.2CH.sub.2CH.sub.2O and CH.sub.2CH(C.sub.2H.sub.5)O; l indicating the average polymerization degree of the added alkylene oxide is 0<l5; the average value of m is more than 0 and 6 or less; each of the average values of n and o is from 0 to 6, the total value of m, n and o is 6, and in the formula (II), R.sup.2 represents a hydrogen atom or a methyl group. ##STR00001##