C08F222/18

Resist composition and method of forming resist pattern

A resist composition including a base component and a fluorine additive component (F), the component (F) including a copolymer having a structural unit (f1) represented by general formula (f1-1) or (f1-2), and a structural unit (f2) represented by general formula (f2-1) (in formula (f1-1) and (f2-1), R represents a hydrogen atom or the like; at least one of Raf.sup.11 and Raf.sup.12, and at least one of Raf.sup.13 and Raf.sup.14 represents a hydrocarbon group substituted with a fluorine atom, and the total number of carbon atoms is 3 or more, provided that a hydrocarbon group forming a bridge structure is excluded; and the structural unit (f2) has a specific acid dissociable group containing an aliphatic cyclic group having no bridge structure ##STR00001##

PHOTOPOLYMER COMPOSITION
20210301055 · 2021-09-30 ·

The present disclosure relates to a photopolymer composition for hologram production comprising a polymer matrix or a precursor thereof having a glass transition temperature of 80° C. or less; a photoreactive monomer; a low refractive index fluorine-based compound; and a photoinitiator, a hologram recording medium produced from the photopolymer composition, an optical element comprising the hologram recording medium, and a holographic recording method using the hologram recording medium.

PHOTOPOLYMER COMPOSITION
20210301055 · 2021-09-30 ·

The present disclosure relates to a photopolymer composition for hologram production comprising a polymer matrix or a precursor thereof having a glass transition temperature of 80° C. or less; a photoreactive monomer; a low refractive index fluorine-based compound; and a photoinitiator, a hologram recording medium produced from the photopolymer composition, an optical element comprising the hologram recording medium, and a holographic recording method using the hologram recording medium.

Anti-reflective film and preparation method of the same

The present invention relates to an anti-reflective film including: a hard coating layer; and a low refractive layer that is formed on one side of the hard coating layer, and includes porous inorganic nanoparticles with a diameter of 5 nm to 70 nm including micropores with a diameter of 0.5 nm to 10 nm, and a binder resin, and a method for preparing an anti-reflective film.

Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same

The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.

HARD COATING FILM AND WINDOW AND IMAGE DISPLAY DEVICE USING SAME
20210139735 · 2021-05-13 ·

The present invention relates to a hard coating film including a substrate and a hard coating layer provided on at least one surface of the substrate, in which the hard coating layer includes a fluorine-based UV-curable-functional-group-containing compound, a conductive polymer, and a solvent, the conductive polymer being included in a specific amount, and the surface roughness (Ra) value of the hard coating layer is 1 nm or less, whereby the hard coating film can simultaneously exhibit hard coating performance and antifouling performance even in the form of a single layer not including a separate antifouling layer, and is remarkably improved in an antifouling effect based on the low surface roughness thereof due to the absence of inorganic fine particles, and the improved antifouling effect can be effectively maintained even in the presence of variously changing environmental conditions, and to a window and an image display device using the same.

HARD COATING FILM AND WINDOW AND IMAGE DISPLAY DEVICE USING SAME
20210139735 · 2021-05-13 ·

The present invention relates to a hard coating film including a substrate and a hard coating layer provided on at least one surface of the substrate, in which the hard coating layer includes a fluorine-based UV-curable-functional-group-containing compound, a conductive polymer, and a solvent, the conductive polymer being included in a specific amount, and the surface roughness (Ra) value of the hard coating layer is 1 nm or less, whereby the hard coating film can simultaneously exhibit hard coating performance and antifouling performance even in the form of a single layer not including a separate antifouling layer, and is remarkably improved in an antifouling effect based on the low surface roughness thereof due to the absence of inorganic fine particles, and the improved antifouling effect can be effectively maintained even in the presence of variously changing environmental conditions, and to a window and an image display device using the same.

COMPOUND, POLYMER, AND ORGANIC MATERIAL
20210040061 · 2021-02-11 ·

Providing a compound that can realize an organic material with an enhanced function.

Provided is a compound represented by the following general formula (1).

##STR00001##

(In the general formula (1), R.sup.101 to R.sup.104 are each independently a univalent substituent group represented by the following general formula (2-1), i to 1 are each independently an integer of 0 or 1, provided that i to 1 are not simultaneously 0.)

##STR00002##

(In the general formula (2-1), R.sup.203 and R.sup.204 are each independently a single bond or a straight chain or branched substituted or unsubstituted alkylene group represented by C.sub.nH.sub.2n (n is an integer of equal to or greater than 1), R.sup.205 is hydrogen or a straight chain or branched substituted or unsubstituted alkyl group represented by C.sub.nH.sub.2n+1 (n is an integer of equal to or greater than 1). Represented by k is an integer of equal to or greater than 1, and X is a bivalent or more-valent aromatic group. If carbon not bonded to R.sup.203 and R.sup.204 is present in the bivalent or more-valent aromatic group, the carbon is unsubstituted or has at least one substituent group. In addition, a part for bonding to R.sup.203 and at least one part for bonding to R.sup.204, possessed by the bivalent or more-valent aromatic group, may be any bondable carbon in the aromatic group. Represented by * in R.sup.101 to R.sup.102 is a part for bonding with carbon that is bondable in a benzene ring condensed with a thiophene ring in the general formula (1). Represented by * in R.sup.103 to R.sup.104 is a part for bonding with carbon that is bondable in the benzene ring not condensed with the thiophene ring in the general formula (1).)

COMPOUND, POLYMER, AND ORGANIC MATERIAL
20210040061 · 2021-02-11 ·

Providing a compound that can realize an organic material with an enhanced function.

Provided is a compound represented by the following general formula (1).

##STR00001##

(In the general formula (1), R.sup.101 to R.sup.104 are each independently a univalent substituent group represented by the following general formula (2-1), i to 1 are each independently an integer of 0 or 1, provided that i to 1 are not simultaneously 0.)

##STR00002##

(In the general formula (2-1), R.sup.203 and R.sup.204 are each independently a single bond or a straight chain or branched substituted or unsubstituted alkylene group represented by C.sub.nH.sub.2n (n is an integer of equal to or greater than 1), R.sup.205 is hydrogen or a straight chain or branched substituted or unsubstituted alkyl group represented by C.sub.nH.sub.2n+1 (n is an integer of equal to or greater than 1). Represented by k is an integer of equal to or greater than 1, and X is a bivalent or more-valent aromatic group. If carbon not bonded to R.sup.203 and R.sup.204 is present in the bivalent or more-valent aromatic group, the carbon is unsubstituted or has at least one substituent group. In addition, a part for bonding to R.sup.203 and at least one part for bonding to R.sup.204, possessed by the bivalent or more-valent aromatic group, may be any bondable carbon in the aromatic group. Represented by * in R.sup.101 to R.sup.102 is a part for bonding with carbon that is bondable in a benzene ring condensed with a thiophene ring in the general formula (1). Represented by * in R.sup.103 to R.sup.104 is a part for bonding with carbon that is bondable in the benzene ring not condensed with the thiophene ring in the general formula (1).)

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
20200409262 · 2020-12-31 ·

A resist composition including a base component and a fluorine additive component (F), the component (F) including a copolymer having a structural unit (f1) represented by general formula (f1-1) or (f1-2), and a structural unit (f2) represented by general formula (f2-1) (in formula (f1-1) and (f2-1), R represents a hydrogen atom or the like; at least one of Raf.sup.11 and Raf.sup.12, and at least one of Raf.sup.13 and Raf.sup.14 represents a hydrocarbon group substituted with a fluorine atom, and the total number of carbon atoms is 3 or more, provided that a hydrocarbon group forming a bridge structure is excluded; and the structural unit (f2) has a specific acid dissociable group containing an aliphatic cyclic group having no bridge structure

##STR00001##