A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R.sup.1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; L.sup.a1 is a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and R.sup.P is a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.

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An object of the present invention is to provide a liquid crystal composition capable of forming an optically anisotropic layer with suppressed cissing during formation of an optically anisotropic layer and an excellent alignment degree, a fluorine-containing polymer, an optically anisotropic layer, a laminate, and an image display device. The liquid crystal composition of the present invention is a liquid crystal composition including a liquid crystal compound and an interface improver, in which the interface improver is a fluorine-containing polymer having a repeating unit B1 represented by Formula (B-1) and a repeating unit B2 having a fluorine atom.

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An object of the present invention is to provide a liquid crystal composition capable of forming an optically anisotropic layer with suppressed cissing during formation of an optically anisotropic layer and an excellent alignment degree, a fluorine-containing polymer, an optically anisotropic layer, a laminate, and an image display device. The liquid crystal composition of the present invention is a liquid crystal composition including a liquid crystal compound and an interface improver, in which the interface improver is a fluorine-containing polymer having a repeating unit B1 represented by Formula (B-1) and a repeating unit B2 having a fluorine atom.

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The present invention relates to a new photo-initiating composition for red and near infrared-induced photopolymerization, method of using same in photopolymerization reactions and polymers obtained by such method.

First embodiment of a (meth)acrylic copolymer in the present invention includes following: a (meth)acrylic copolymer having at least one kind of constitutional unit selected from the group consisting of a constitutional unit (A1) having at least one kind of structure (I) selected from the group consisting of structures represented by the following formula (1), formula (2), or formula (3) and a constitutional unit (A2) having a triorganosilyloxycarbonyl group and a constitutional unit (B) derived from a macromonomer (b): ##STR00001## (where, X represents —O—, —S—, or —NR.sup.14—, R.sup.14 represents a hydrogen atom or an alkyl group, R.sup.1 and R.sup.2 each represent a hydrogen atom or an alkyl group having from 1 to 10 carbon atoms, R.sup.3 and R.sup.5 each represent an alkyl group having from 1 to 20 carbon atoms, a cycloalkyl group, or an aryl group, and R.sup.4 and R.sup.6 each represent an alkylene group having from 1 to 10 carbon atoms).

Provided is a method for manufacturing a conductive pattern forming member that is formed on a substrate and that has excellent resistance to ion migration between a conductive pattern and a photosensitive resin layer, while suppressing generation of residues in the dissolution and removal of unexposed portions. This method for manufacturing a conductive pattern forming member includes: a coating step of applying, onto surfaces of a layer A formed of a resin (a) having a carboxyl group, and a transparent electrode layer B, the layers A and B being formed over a substrate, a composition C containing conductive particles and a resin (c) having a double bond and a carboxyl group to obtain a coating film C; a drying step of drying the coating film C to obtain a dry film C; an exposure step of exposing the dry film C to light to obtain an exposed film C; a developing step of developing the exposed film C to obtain a pattern C; and a curing step of curing the pattern C to obtain a conductive pattern C, wherein particles having a particle diameter of 0.3 to 2.0 μm account for 80% or more of the conductive particles.

A radiation curable secondary coating composition for optical fiber is described and claimed. This radiation curable secondary coating composition includes component (A) which is a urethane (meth)acrylate and component (B) which is a (meth)acrylate compound with two or more ethylenically unsaturated groups and one or more bisphenol structures; wherein the content of component (B) in the composition is 60-300 mass parts per 100 mass parts of component (A). The liquid secondary coating has a viscosity at 25° C. of from about 0.1 Pa.Math.s to about 15 Pa.Math.s. Films obtained by curing the liquid radiation curable secondary coating composition of the present invention have a Young's modulus of from about 600 MPa to about 500 MPa and the breaking elongation of the cured film is from about to 5% to about 50%.

A curable resin composition which provides a cured product excellent in impact resistance and flexural modulus and has a low viscosity comprising a component (A), a component (B) and a component (C). The component (A) is a compound represented by formula (1), ##STR00001##
In formula (1), R is hydrogen or a hydrocarbon group having 1 to 4 carbon atoms. The hydrocarbon group optionally has a substituent. The component (B) is a compound having one or more caprolactone modified structures and two or more radically polymerizable groups per molecule, and the component (C) is a radical polymerization initiator.

A curable resin composition which provides a cured product excellent in impact resistance and flexural modulus and has a low viscosity comprising a component (A), a component (B) and a component (C). The component (A) is a compound represented by formula (1), ##STR00001##
In formula (1), R is hydrogen or a hydrocarbon group having 1 to 4 carbon atoms. The hydrocarbon group optionally has a substituent. The component (B) is a compound having one or more caprolactone modified structures and two or more radically polymerizable groups per molecule, and the component (C) is a radical polymerization initiator.

A composition for an electrode protective film of an electrostatic capacitance-type input device including (a) a binder polymer, (b) a photopolymerizable compound having an ethylenic unsaturated group, (c) a photopolymerization initiator, and (d) a compound capable of reacting with acidic groups or alcoholic hydroxy groups by heating, in which (b) the photopolymerizable compound having an ethylenic unsaturated group includes (b1) a photopolymerizable compound in which a value obtained by dividing a weight-average molecular weight by an average number of polymerizable groups is 270 or more can be used to form electrode protective films of electrostatic capacitance-type input devices having favorable bending resistance; an electrode protective film of an electrostatic capacitance-type input device; a transfer film; a laminate; an electrostatic capacitance-type input device; and an image display device.