Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2):
80≦X≦560  (1)
Y≦(0.00022X−0.01)×100  (2).

This invention relates to a photo-alignment copolymer which enables the formation of an optical anisotropic film that exhibits superior optical anisotropy, an optical anisotropic film using the photo-alignment copolymer and a method of manufacturing the optical anisotropic film. The photo-alignment copolymer includes both of a photo-alignment repeating unit having a photo-reactive functional group such as a cinnamate-based functional group, a chalcone-based functional group, an azo-based functional group or a coumarin-based functional group, and a repeating unit having a specific structure able to increase optical anisotropy.

The invention relates to a polymerisable LC medium with flat optical dispersion, a polymer film with flat optical dispersion obtainable from such a medium, and the use of the polymerisable LC medium and polymer film in optical, electro optical, electronic, semiconducting or luminescent components or devices.

The invention relates to a polymerisable LC medium with flat optical dispersion, a polymer film with flat optical dispersion obtainable from such a medium, and the use of the polymerisable LC medium and polymer film in optical, electro optical, electronic, semiconducting or luminescent components or devices.

Provided are: a polymerizable monomer excellent in mechanical strength of its cured product and excellent also in handling property with low viscosity even under a room temperature environment, specifically, a polymerizable monomer, which is represented by the following general formula (1):

##STR00001##

in the general formula (1), Ar.sup.1 and Ar.sup.2 each represent an aromatic group having a valence selected from divalence to tetravalence, L.sup.1 and L.sup.2 each represent a divalent hydrocarbon group having a main chain with a number of atoms within a range of from 2 to 10 and containing at least one hydroxy group, and may be identical to or different from each other, R.sup.1 and R.sup.2 each represent hydrogen or a methyl group, q represents 0 or 1, and m1 and m2 each represent 1 or 2; and a method of producing the polymerizable monomer, a curable composition and a resin member each using the polymerizable monomer.

Radically polymerizable composition which contains at least one vinyl ether according to general formula I: ##STR00001##

Radically polymerizable composition which contains at least one vinyl ether according to general formula I: ##STR00001##

The presently disclosed subject matter is directed to a method of making a foam, specifically, the development of isocyanate-free foams using at least one unsaturated polyester. The at least one unsaturated polyester is a reaction product of at least one unsaturated cyclic anhydride, dicyclopentadiene, and at least one polyol. The disclosed formulation further comprises at least one reactive diluent and at least one initiator. The disclosed formulations are cured by a free radical mechanism.

The presently disclosed subject matter is directed to a method of making a foam, specifically, the development of isocyanate-free foams using at least one unsaturated polyester. The at least one unsaturated polyester is a reaction product of at least one unsaturated cyclic anhydride, dicyclopentadiene, and at least one polyol. The disclosed formulation further comprises at least one reactive diluent and at least one initiator. The disclosed formulations are cured by a free radical mechanism.

A composition of matter including two optionally substituted phenol or optionally substituted aniline units separated by a furan spacer has been prepared. In particular, the chemical structure has a novolac bridge between the central furan ring and the two attached optionally substituted phenol and/or optionally substituted aniline units. These compounds can be modified to be used in various polymer resins. This new structure reduces toxicity relative to BPA/F, makes use of renewable chemicals, and produces certain beneficial polymer properties.