Modelling material which includes (a) at least one radically polymerizable monomer, (b) at least one initiator for the radical polymerization and (c) at least one inert component. The inert component (c) is soluble in the polymer formed by polymerization of the monomer (a), wherein the solubility of component (c) decreases as the temperature increases, with the result that a phase separation takes place above a particular temperature. The material is suitable in particular for the production of models of dental restorations for investment casting processes.

An identification medium comprising a first resin layer and a second resin layer in this order from a viewing side, wherein the first resin layer contains a first cholesteric liquid crystal resin that is a cured product of a first liquid crystal composition, and the first cholesteric liquid crystal resin selectively reflects light at a wavelength of 700 nm or longer and 900 nm or shorter, the second resin layer contains a second cholesteric liquid crystal resin that is a cured product of a second liquid crystal composition, and the second cholesteric liquid crystal resin selectively reflects light at a wavelength of 400 nm or longer and 500 nm or shorter, and the first resin layer has an average value of light transmittance at a wavelength of 400 nm or longer and 425 nm or shorter of 50% or more and 90% or less.

An identification medium comprising a first resin layer and a second resin layer in this order from a viewing side, wherein the first resin layer contains a first cholesteric liquid crystal resin that is a cured product of a first liquid crystal composition, and the first cholesteric liquid crystal resin selectively reflects light at a wavelength of 700 nm or longer and 900 nm or shorter, the second resin layer contains a second cholesteric liquid crystal resin that is a cured product of a second liquid crystal composition, and the second cholesteric liquid crystal resin selectively reflects light at a wavelength of 400 nm or longer and 500 nm or shorter, and the first resin layer has an average value of light transmittance at a wavelength of 400 nm or longer and 425 nm or shorter of 50% or more and 90% or less.

The present invention relates to novel compositions of therapeutic cyclodextrin containing polymeric compounds designed as a carrier for small molecule therapeutics delivery and pharmaceutical compositions thereof. These cyclodextrin-containing polymers improve drug stability and solubility, and reduce toxicity of the small molecule therapeutic when used in vivo. Furthermore, by selecting from a variety of linker groups and targeting ligands the polymers present methods for controlled delivery of the therapeutic agents. The invention also relates to methods of treating subjects with the therapeutic compositions described herein. The invention further relates to methods for conducting pharmaceutical business comprising manufacturing, licensing, or distributing kits containing or relating to the polymeric compounds described herein.

Curable formulations which form cured materials that are breakable upon immersion in water are disclosed. The cured materials break into a plurality of particles being a few millimeters or less in size. Methods of fabricating three-dimensional objects utilizing the curable formulations are also disclosed, as well as model objects fabricated thereby. The curable formulations include at least a mono-functional curable material and a multi-functional curable material, as described in the specification.

Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

The present invention provides a curable composition containing a compound represented by General Formula A and a compound represented by General Formula B.

ArL-Sp-Pol).sub.n  (General Formula A)

In General Formula A, Ar represents an n-valent group containing a nitrogen-containing fused aromatic ring as a partial structure; L represents a linking group such as —O— and —C(═O)O—; Sp represents a single bond or a divalent linking group; Pol represents a hydrogen atom or a polymerizable group; n represents 1 or 2; and the compound represented by General Formula A has at least one polymerizable group.

##STR00001##

In General Formula B, R′, R″, and R′″ are each independently a hydrogen atom or a substituent; R′ and R″ or R″ and R′″ may be bonded to each other to form a ring that may have a substituent; and W is a hydrogen atom or a substituent. Using the curable composition of the present invention, it is possible to form a cured product having a small Abbe number, a large partial dispersion ratio, and high light stability.

The present invention provides a curable composition containing a compound represented by General Formula A and a compound represented by General Formula B.

ArL-Sp-Pol).sub.n  (General Formula A)

In General Formula A, Ar represents an n-valent group containing a nitrogen-containing fused aromatic ring as a partial structure; L represents a linking group such as —O— and —C(═O)O—; Sp represents a single bond or a divalent linking group; Pol represents a hydrogen atom or a polymerizable group; n represents 1 or 2; and the compound represented by General Formula A has at least one polymerizable group.

##STR00001##

In General Formula B, R′, R″, and R′″ are each independently a hydrogen atom or a substituent; R′ and R″ or R″ and R′″ may be bonded to each other to form a ring that may have a substituent; and W is a hydrogen atom or a substituent. Using the curable composition of the present invention, it is possible to form a cured product having a small Abbe number, a large partial dispersion ratio, and high light stability.

The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.

Described herein are thermoset compositions and kits of compositions suitable for use in additive fabrication processes including specified concentrations of reactive compounds including urethane-(meth)acrylate compounds, monofunctional diluent monomers, and methacrylate-functional compounds having 1.5 polymerizable groups or more. Also described and claimed are methods of creating three-dimensional parts via additive fabrication processes utilizing the compositions elsewhere herein described and claimed, as well as the articles cured therefrom.