An underlayer film-forming composition which exhibits excellent solvent resistance, and which is capable of orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer formed on the substrate, said layer including a block copolymer. The underlayer film-forming composition includes a copolymer which includes: (A) unit structures derived from styrene compounds including tert-butyl groups; (B) unit structures, other than those in (A) above, which are derived from aromatic-containing vinyl compounds which do not include hydroxy groups; (C) unit structures derived from compounds which include (meth)acryloyl groups, and do not include hydroxy groups; and (D) unit structures derived from compounds including crosslink-forming groups. The copolymerization ratios with respect to the whole copolymer are: (A) 25-90 mol %; (B) 0-65 mol %; (C) 0-65 mol %; and (D) 10-20 mol %. Unit structures including aromatics account for 81-90 mol % of (A)+(B)+(C).

An underlayer film-forming composition which exhibits excellent solvent resistance, and which is capable of orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer formed on the substrate, said layer including a block copolymer. The underlayer film-forming composition includes a copolymer which includes: (A) unit structures derived from styrene compounds including tert-butyl groups; (B) unit structures, other than those in (A) above, which are derived from aromatic-containing vinyl compounds which do not include hydroxy groups; (C) unit structures derived from compounds which include (meth)acryloyl groups, and do not include hydroxy groups; and (D) unit structures derived from compounds including crosslink-forming groups. The copolymerization ratios with respect to the whole copolymer are: (A) 25-90 mol %; (B) 0-65 mol %; (C) 0-65 mol %; and (D) 10-20 mol %. Unit structures including aromatics account for 81-90 mol % of (A)+(B)+(C).

The present invention reduces inhibition of light sensitization of a photosensitive resin composition containing a black dye and increases sensitivity by improving pattern forming ability. The photosensitive resin composition according to one embodiment of the present invention contains a binder resin (A), a radiation-sensitive compound (B), and a dye (C), wherein the dye (C) contains a black dye (C1) and a dye (C2) other than (C1), the dye (C2) has an absorption maximum at a wavelength of 480-550 nm in an wavelength range of 300-800 nm, and, when the absorbance of the dye (C2) at the absorption maximum wavelength is defined as Abs1 and the average absorbance of the dye (C2) at wavelengths 560-600 nm is defined as Abs2, Abs2/Abs1 equals 0.1-1.0.

The present invention reduces inhibition of light sensitization of a photosensitive resin composition containing a black dye and increases sensitivity by improving pattern forming ability. The photosensitive resin composition according to one embodiment of the present invention contains a binder resin (A), a radiation-sensitive compound (B), and a dye (C), wherein the dye (C) contains a black dye (C1) and a dye (C2) other than (C1), the dye (C2) has an absorption maximum at a wavelength of 480-550 nm in an wavelength range of 300-800 nm, and, when the absorbance of the dye (C2) at the absorption maximum wavelength is defined as Abs1 and the average absorbance of the dye (C2) at wavelengths 560-600 nm is defined as Abs2, Abs2/Abs1 equals 0.1-1.0.

Provided is a method of preparing a maleimide-based copolymer, which comprises adding a monomer mixture including an aromatic vinyl-based monomer and a maleimide-based monomer to an aqueous solution consisting of an aqueous solvent and a first vinyl cyanide-based monomer and performing polymerization.

Provided is a method of preparing a maleimide-based copolymer, which comprises adding a monomer mixture including an aromatic vinyl-based monomer and a maleimide-based monomer to an aqueous solution consisting of an aqueous solvent and a first vinyl cyanide-based monomer and performing polymerization.

Provided is a method for manufacturing a methacrylic resin composition having excellent surface processability and displaying excellent preservability of formed surface processing. A method for manufacturing a methacrylic resin composition, wherein the methacrylic resin composition comprises two or more types of methacrylic resins that each have a structural unit (X) having the same type of cyclic structure-containing main chain, the methacrylic resin composition has a Vicat softening temperature of 120° C. to 160° C., methanol-soluble content is contained in an amount of 5 mass % or less relative to 100 mass %, in total, of the methanol-soluble content and methanol-insoluble content, comprising mixing a low molecular weight component and a high molecular weight component.

Provided is a method for manufacturing a methacrylic resin composition having excellent surface processability and displaying excellent preservability of formed surface processing. A method for manufacturing a methacrylic resin composition, wherein the methacrylic resin composition comprises two or more types of methacrylic resins that each have a structural unit (X) having the same type of cyclic structure-containing main chain, the methacrylic resin composition has a Vicat softening temperature of 120° C. to 160° C., methanol-soluble content is contained in an amount of 5 mass % or less relative to 100 mass %, in total, of the methanol-soluble content and methanol-insoluble content, comprising mixing a low molecular weight component and a high molecular weight component.

The present invention provides a methacrylic resin composition comprising 100 parts by mass of a methacrylic resin comprising 50 to 97% by mass of a methacrylic acid ester monomer unit (A), 3 to 30% by mass of a structural unit (B) having a ring structure in the backbone, and 0 to 20% by mass of an additional vinyl monomer unit (C) copolymerizable with a methacrylic acid ester monomer, and 0.001 to 0.2 parts by mass of a compound (D) having a predetermined structure, the methacrylic resin composition satisfying the following conditions (I) and (II):
(I): a weight-average molecular weight of the methacrylic resin composition as measured by gel permeation chromatography (GPC) is 65,000 to 300,000, and
(II): a mass ratio between the component (D) and the structural unit (B) having a ring structure in the backbone is 25≤(B)/(D)≤1000.

The present invention provides a methacrylic resin composition comprising 100 parts by mass of a methacrylic resin comprising 50 to 97% by mass of a methacrylic acid ester monomer unit (A), 3 to 30% by mass of a structural unit (B) having a ring structure in the backbone, and 0 to 20% by mass of an additional vinyl monomer unit (C) copolymerizable with a methacrylic acid ester monomer, and 0.001 to 0.2 parts by mass of a compound (D) having a predetermined structure, the methacrylic resin composition satisfying the following conditions (I) and (II):
(I): a weight-average molecular weight of the methacrylic resin composition as measured by gel permeation chromatography (GPC) is 65,000 to 300,000, and
(II): a mass ratio between the component (D) and the structural unit (B) having a ring structure in the backbone is 25≤(B)/(D)≤1000.