C08F222/408

METHOD FOR PREPARING POROUS HYDROGEL THROUGH FREEZING-ILLUMINATION
20170210864 · 2017-07-27 ·

The present invention discloses a freezing-illumination method for preparing porous gels, comprising the steps of: (a) synthesizing the gels containing dynamic exchangeable bonds; (b) illuminating the gels under frozen state by certain wavelength light source; (c) elevating the temperature and melt the ice crystals within the gels to get the porous structure. The dynamic exchangeable bonds existing in the gels include double/multi-sulfur bond, hydrazine bond, boronic ester bond. Catalyst is also included in the gel composition to activate the bond exchange reactions under illumination. This new method for preparing porous gels is easy to operate and suitable for most kinds of gels. Meanwhile, it can spatially control the pore structure within the gels by local illumination.

POLYMER PARTICLES
20170081450 · 2017-03-23 ·

Biodegradable, cross-linked polymer particle embolics and methods of making the same are described. The particle embolics can be used as embolization agents.

RESIST COMPOSITION AND PATTERN FORMING PROCESS
20170031243 · 2017-02-02 · ·

A resist composition is provided comprising a polymer comprising recurring units (a) having an oxazolidinedione, thioxooxazolidinone, thiazolidinedione or thioxothiazolidinone structure and recurring unit (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.

Remoldable bismaleimide resin and application thereof
12275821 · 2025-04-15 · ·

A remoldable bismaleimide resin and application thereof. The preparation method includes blending 2-allylphenyl glycidyl ether and terephthalic acid in acetonitrile, carrying out an esterification reaction under the condition of quaternary ammonium salt as a catalyst to obtain bis(3-(2-allylphenoxy)-2-hydroxypropyl) terephthalate containing a reversible dynamic group; then uniformly mixing bis(3-(2-allylphenoxy)-2-hydroxypropyl) terephthalate and bismaleimide, curing to obtain the re-moldable bismaleimide resin. The prepared re-moldable bismaleimide resin not only has excellent heat resistance and mechanical properties, but also can be remolded under hot pressing conditions. The preparation method of the re-moldable bismaleimide resin has the advantages of wide raw material sources and simple process, and has a wide application prospect in the fields of aerospace, transportation, electronic information, new energy, insulated electrical industry and the like.

Polymer particles

Biodegradable, cross-linked polymer particle embolics and methods of making the same are described. The particle embolics can be used as embolization agents.

METHOD FOR PREPARING A FUNCTIONALISED LITHIUM SALT
20250282718 · 2025-09-11 ·

The present invention relates to a process for preparing a lithium salt A, comprising step a) of placing in contact a lithium salt B comprising at least one S(O).sub.2F group with a compound C of formula (I) ROSiR.sup.1R.sup.2R.sup.3 in the presence of a catalyst D to form a mixture of products comprising said lithium salt A comprising at least one group S(O).sub.2OR; said catalyst D being a compound with a pKa of greater than 11 measured at 25 C. The present invention also relates to a lithium salt of formula (IIIa), (IIIb), (IIIc), (IIId), (IIIe), (IIIf), (IIIg), (IIIh), (IIIi), (IIIj), (IVa), (IVb), (IVc) or (IVd).

Resist compound, method for forming pattern using same, and method for manufacturing semiconductor device using same

Provided are a resist compound, a method of forming a pattern by using the same, and a method of manufacturing a semiconductor device using the same. According to the present disclosure, the compound may be represented by Formula 1: ##STR00001##

Resist compound, method for forming pattern using same, and method for manufacturing semiconductor device using same

Provided are a resist compound, a method of forming a pattern by using the same, and a method of manufacturing a semiconductor device using the same. According to the present disclosure, the compound may be represented by Formula 1: ##STR00001##