C08G8/20

Method for increasing the reactivity of lignin

The present invention relates to a method for increasing the reactivity of lignin, wherein the method comprises the following steps: a) forming, under heating at a temperature of 71-94 C., an aqueous dispersion comprising alkali and lignin, wherein the alkali comprises a hydroxide of an alkali metal; and b) heating the dispersion formed in step a) at a temperature of 50-95 C. for producing alkalated lignin.

Halogen and polyhalide mediated phenolic polymerization

A catalyst for use with a phenolic resins which imparts accelerated curing at reduced temperatures. The catalyst is selected from elemental halogen or opium polyhalide compounds of the general formula:
O.sup.+X.sub.(2n+1).sup.,
where 1n4, Q is onium group, preferably selected from ammonium, sulfonium and phosphonium; and X is a halide. Each X may be the same or different and may include mixed halides such a XBr.sub.2Cl or Cl.sub.2Br.

Halogen and polyhalide mediated phenolic polymerization

A catalyst for use with a phenolic resins which imparts accelerated curing at reduced temperatures. The catalyst is selected from elemental halogen or opium polyhalide compounds of the general formula:
O.sup.+X.sub.(2n+1).sup.,
where 1n4, Q is onium group, preferably selected from ammonium, sulfonium and phosphonium; and X is a halide. Each X may be the same or different and may include mixed halides such a XBr.sub.2Cl or Cl.sub.2Br.

AROMATIC ALCOHOL-LIGNIN-ALDEHYDE RESINS AND PROCESSES FOR MAKING AND USING SAME
20210009764 · 2021-01-14 ·

Aromatic alcohol-lignin-aldehyde resins and process for making and using same. In some examples, a process for making a resin can include heating a first mixture that includes a lignin, an aromatic alcohol, and a base compound to produce a second mixture that can include an activated lignin, the aromatic alcohol, and the base compound. The second mixture can be heated with an aldehyde to produce a third mixture that can include an aromatic alcohol-lignin-aldehyde resin and unreacted free aldehyde. In some examples, an aromatic alcohol-lignin-aldehyde resin can be or include a co-polymer of an activated lignin, an aromatic alcohol, and an aldehyde. A weight ratio of the activated lignin to the aromatic alcohol can be about 20:80 to about 95:5.

AROMATIC ALCOHOL-LIGNIN-ALDEHYDE RESINS AND PROCESSES FOR MAKING AND USING SAME
20210009764 · 2021-01-14 ·

Aromatic alcohol-lignin-aldehyde resins and process for making and using same. In some examples, a process for making a resin can include heating a first mixture that includes a lignin, an aromatic alcohol, and a base compound to produce a second mixture that can include an activated lignin, the aromatic alcohol, and the base compound. The second mixture can be heated with an aldehyde to produce a third mixture that can include an aromatic alcohol-lignin-aldehyde resin and unreacted free aldehyde. In some examples, an aromatic alcohol-lignin-aldehyde resin can be or include a co-polymer of an activated lignin, an aromatic alcohol, and an aldehyde. A weight ratio of the activated lignin to the aromatic alcohol can be about 20:80 to about 95:5.

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.

High-strength rubber composition comprising an aromatic polyphenol derivative

A rubber composition comprises at least one phenol-aldehyde resin based: on at least one derivative of an aromatic polyphenol comprising at least one aromatic ring bearing at least two OZ groups in the meta position relative to one another, the two positions ortho to at least one of the OZ groups being unsubstituted, Z being other than hydrogen, and on at least one aldehyde.

High-strength rubber composition comprising an aromatic polyphenol derivative

A rubber composition comprises at least one phenol-aldehyde resin based: on at least one derivative of an aromatic polyphenol comprising at least one aromatic ring bearing at least two OZ groups in the meta position relative to one another, the two positions ortho to at least one of the OZ groups being unsubstituted, Z being other than hydrogen, and on at least one aldehyde.

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

A resist underlayer film forming composition characterized by containing (A) a compound represented by formula (1) (in formula (1), independently, R.sup.1 represents a C1 to C30 divalent group; each of R.sup.2 to R.sup.7 represents a C1 to C10 linear, branched, or cyclic alkyl group, a C6 to C10 aryl group, a C2 to C10 alkenyl group, a thiol group, or a hydroxyl group; at least one R.sup.5 is a hydroxyl group or a thiol group; each of m.sup.2, m.sup.3, and m.sup.6 is an integer of 0 to 9; each of m.sup.4 and m.sup.7 is an integer of 0 to 8; m.sup.5 is an integer of 1 to 9; n is an integer of 0 to 4; and each of p.sup.2 to p.sup.7 is an integer of 0 to 2) and a cross-linkable compound represented by formula (2-1) or (2-2) (in formula (2), Q.sup.1 represents a single bond or an m.sup.12-valent organic group; each of R.sup.12 and R.sup.15 independently represents a C2 to C10 alkyl group or a C2 to C10 alkyl group having a C1 to C10 alkoxy group; each of R.sup.13 and R.sup.16 represents a hydrogen atom or a methyl group; each of R.sup.14 and R.sup.17 represents a C1 to C10 alkyl group or a C6 to C40 aryl group; n.sup.12 is an integer of 1 to 3; n.sup.13 is an integer of 2 to 5; n.sup.14 is an integer of 0 to 3; n.sup.15 is an integer of 0 to 3, with these ns having a relationship of 3(n.sup.12+n.sup.13+n.sup.14+n.sup.15)6; n.sup.16 is an integer of 1 to 3; n.sup.17 is an integer of 1 to 4; n.sup.18 is an integer of 0 to 3; n.sup.19 is an integer of 0 to 3, with these ns having a relationship of 2(n.sup.16+n.sup.17+n.sup.18+n.sup.19)5; and m.sup.12 is an integer of 2 to 10).