Embodiments in accordance with the present invention encompass compositions encompassing a latent organo-ruthenium compound, a pyridine compound, a photosensitizer and an ultra violet light blocking compound along with one or more monomers which undergo ring open metathesis polymerization (ROMP) when said composition is exposed to suitable actinic radiation to form a substantially transparent film or a three dimensional object. Surprisingly, the compositions are very stable at ambient conditions to temperatures up to 80° C. for several days and undergo mass polymerization only when subjected to actinic radiation under inert atmosphere such as for example a blanket of nitrogen. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as 3D printing materials, coatings, encapsulants, fillers, leveling agents, among others.

A material for forming an underlayer film used in a multi-layer resist process satisfies: (i) an elemental composition ratio Re defined by the following mathematical formula (1) is 1.5 to 2.8; (ii) a glass transition temperature is 30° C. to 250° C.; and (iii) the material contains at least one (preferably two or more) resin having a specific structural unit. In the mathematical formula (1), N.sub.H is the number of hydrogen atoms in the solid content of the material for forming an underlayer film, N.sub.C is the number of carbon atoms in the solid content of the material for forming an underlayer film, and N.sub.O is the number of oxygen atoms in the solid content of the material for forming an underlayer film.

[00001]$\begin{array}{cc}\mathrm{Re}=\frac{N_H+N_C+N_O}{N_C-N_O}& \left(1\right)\end{array}$

A material for forming an underlayer film used in a multi-layer resist process satisfies: (i) an elemental composition ratio Re defined by the following mathematical formula (1) is 1.5 to 2.8; (ii) a glass transition temperature is 30° C. to 250° C.; and (iii) the material contains at least one (preferably two or more) resin having a specific structural unit. In the mathematical formula (1), N.sub.H is the number of hydrogen atoms in the solid content of the material for forming an underlayer film, N.sub.C is the number of carbon atoms in the solid content of the material for forming an underlayer film, and N.sub.O is the number of oxygen atoms in the solid content of the material for forming an underlayer film.

[00001]$\begin{array}{cc}\mathrm{Re}=\frac{N_H+N_C+N_O}{N_C-N_O}& \left(1\right)\end{array}$

The invention provides: imidazole and imidazolium compounds of formulas (I) and (II): ##STR00001##
polymers containing a plurality of imidazolium-containing repeating units of formula (III′): ##STR00002##
and membranes and devices comprising the polymers. Also provided are methods of making the inventive compounds and polymers.

The invention provides: imidazole and imidazolium compounds of formulas (I) and (II): ##STR00001##
polymers containing a plurality of imidazolium-containing repeating units of formula (III′): ##STR00002##
and membranes and devices comprising the polymers. Also provided are methods of making the inventive compounds and polymers.

Disclosed are new polymeric materials that respond to a mechanical force. The novel polymeric compounds contain an isomer of aziridine, a three-membered N-heterocyclic compound. Also disclosed are methods for preparing the polymeric compounds. Mechanical force-induced cycloaddition of aziridines as mechanophores yields stereospecific products without covalent bond cleavage of aziridines. That is, a mechanical force makes the mechanochemical products stereospecific. The stereospecific products prepared from the isomeric mechanophores by a mechanical force can be widely used in various industrial fields, including new materials.

A photoresist underlayer composition comprising a poly(arylene ether); an additive of formula (14):

D-(L.sup.1-Ar—[X].sub.n).sub.m  (14); and

a solvent, wherein, in formula (14), D is a substituted or unsubstituted C.sub.1-60 organic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted C.sub.1-60 organic group; each L.sup.1 is independently a single bond or a divalent linking group, when L.sup.1 is a single bond, D may be a substituted or unsubstituted C.sub.3-30 cycloalkyl or substituted or unsubstituted C.sub.1-20 heterocycloalkyl that is optionally fused with Ar, each Ar is independently a monocyclic or polycyclic C.sub.5-60 aromatic group, each X is independently —OR.sup.30, —SR.sup.31, or —NR.sup.32R.sup.33, m is an integer of 1 to 6, each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater, and R.sup.30 to R.sup.33 are as provided herein.

A prepolymer is prepared by subjecting a compound of Formula (I) and a vinyl-containing compound to a prepolymerization reaction, and a resin composition includes the prepolymer. The vinyl-containing compound includes bis(vinylphenyl) ethane, divinylbenzene, modification of divinylbenzene or a combination thereof. A ratio in part by weight of the compound of Formula (I) to the vinyl-containing compound in the prepolymerization reaction is 8:2 to 6:4. The resin composition includes the prepolymer and an additive, and an article made from the resin composition may include a resin film, a prepreg, a laminate or a printed circuit board.

Embodiments in accordance with the present invention encompass compositions comprising an organoruthenium compound, a photoacid generator, a photosensitizer, one or more epoxy group containing olefinic monomers. The compositions of this invention may additionally contain one or more olefinic monomers. The compositions undergo simultaneous ring open metathesis polymerization (ROMP) and cationic polymerization when exposed to a suitable actinic radiation to form a substantially transparent film. The compositions of this invention are stable at room temperature for several days to several months and undergo mass polymerization only when subjected to suitable actinic radiation. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films having various opto-electronic properties. More specifically, the compositions of this invention undergo much faster mass polymerization and exhibit superior thermo-mechanical properties when compared with the compositions containing only the olefinic monomers. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, sealants, adhesives, among others.

Embodiments in accordance with the present invention encompass compositions comprising an organoruthenium compound, a photoacid generator, a photosensitizer, one or more epoxy group containing olefinic monomers. The compositions of this invention may additionally contain one or more olefinic monomers. The compositions undergo simultaneous ring open metathesis polymerization (ROMP) and cationic polymerization when exposed to a suitable actinic radiation to form a substantially transparent film. The compositions of this invention are stable at room temperature for several days to several months and undergo mass polymerization only when subjected to suitable actinic radiation. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films having various opto-electronic properties. More specifically, the compositions of this invention undergo much faster mass polymerization and exhibit superior thermo-mechanical properties when compared with the compositions containing only the olefinic monomers. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, sealants, adhesives, among others.