A silicon-containing composition includes a polysiloxane compound and solvent. The polysiloxane compound includes a fluorine atom and a group including an ester bond. The polysiloxane compound preferably includes a first structural unit represented by formula (1), and a second structural unit represented by formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms and comprising a fluorine atom; R.sup.1 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; Y represents a monovalent organic group having 1 to 20 carbon atoms and comprising an ester bond; and R.sup.2 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms.

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A silicon-containing composition includes a polysiloxane compound and solvent. The polysiloxane compound includes a fluorine atom and a group including an ester bond. The polysiloxane compound preferably includes a first structural unit represented by formula (1), and a second structural unit represented by formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms and comprising a fluorine atom; R.sup.1 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; Y represents a monovalent organic group having 1 to 20 carbon atoms and comprising an ester bond; and R.sup.2 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms.

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Method for producing coating composition applied to patterned resist film in lithography process for solvent development to reverse pattern. The method including: step obtaining hydrolysis condensation product by hydrolyzing and condensing hydrolyzable silane in non-alcoholic hydrophilic solvent; step of solvent replacement wherein non-alcoholic hydrophilic solvent replaced with hydrophobic solvent for hydrolysis condensation product. Method for producing semiconductor device, including: step of applying resist composition to substrate and forming resist film; step of exposing and developing formed resist film; step applying composition obtained by above production method to patterned resist film obtained during or after development in step, forming coating film between patterns; step of removing patterned resist film by etching and reversing patterns. Production method that exposure is performed using ArF laser (with wavelength of 193 nm) or EUV (with wavelength of 13.5 nm). Production method that development is negative development with organic solvent.

Method for producing coating composition applied to patterned resist film in lithography process for solvent development to reverse pattern. The method including: step obtaining hydrolysis condensation product by hydrolyzing and condensing hydrolyzable silane in non-alcoholic hydrophilic solvent; step of solvent replacement wherein non-alcoholic hydrophilic solvent replaced with hydrophobic solvent for hydrolysis condensation product. Method for producing semiconductor device, including: step of applying resist composition to substrate and forming resist film; step of exposing and developing formed resist film; step applying composition obtained by above production method to patterned resist film obtained during or after development in step, forming coating film between patterns; step of removing patterned resist film by etching and reversing patterns. Production method that exposure is performed using ArF laser (with wavelength of 193 nm) or EUV (with wavelength of 13.5 nm). Production method that development is negative development with organic solvent.

Provided are a photocurable fluoropolyether-based elastomer composition having both a favorable preservation stability and fast curability, being bondable at a low temperature in a short period of time, and generating no air bubbles in the resin at the time of curing; and a bonding method thereof. The photocurable fluoropolyether-based elastomer composition contains: (A) a linear polyfluoro compound; (B) a fluorine-containing organohydrogenpolysiloxane; (C) a photoactive hydrosilylation reaction catalyst; and (D) a zeolite having an average primary particle size of not larger than 30 μm.

Provided are a photocurable fluoropolyether-based elastomer composition having both a favorable preservation stability and fast curability, being bondable at a low temperature in a short period of time, and generating no air bubbles in the resin at the time of curing; and a bonding method thereof. The photocurable fluoropolyether-based elastomer composition contains: (A) a linear polyfluoro compound; (B) a fluorine-containing organohydrogenpolysiloxane; (C) a photoactive hydrosilylation reaction catalyst; and (D) a zeolite having an average primary particle size of not larger than 30 μm.

Provided herein are coating formulations useful for endowing substrates with hydrophobic, superhydrophobic, and/or oleophobic properties and methods of use thereof. The coating formulation can include alkylalkoxysilane, 1H,1H,2H,2H-perfluorooctyltriethoxysilane, nano-SiO.sub.2, a crosslinking additive, and at least one solvent.

Provided herein are coating formulations useful for endowing substrates with hydrophobic, superhydrophobic, and/or oleophobic properties and methods of use thereof. The coating formulation can include alkylalkoxysilane, 1H,1H,2H,2H-perfluorooctyltriethoxysilane, nano-SiO.sub.2, a crosslinking additive, and at least one solvent.

Disclosed are a composition comprising a silane compound having a fluorine-containing (poly)ether group represented by Formula 1, a film formed from the composition, a display device including the film, and an article including a coating product of the composition:
Rf-(L.sup.1).sub.p1(L).sub.a-C(═O)NR-(L.sup.2).sub.p2-Si(R.sub.1)(R.sub.2)(R.sub.3)   Formula 1 wherein in Formula 1, R is -(L.sup.3).sub.p3-Si(R.sub.4)(R.sub.5)(R.sub.6), L is —CH.sub.2— or —CH.sub.2—O—CH.sub.2—, Rf is a fluorine-containing (poly)ether group, and L.sup.1 to L.sup.3, p1 to p3, and R.sub.1 to R.sub.6 are the same as defined in the detailed description.

Disclosed are a composition comprising a silane compound having a fluorine-containing (poly)ether group represented by Formula 1, a film formed from the composition, a display device including the film, and an article including a coating product of the composition:
Rf-(L.sup.1).sub.p1(L).sub.a-C(═O)NR-(L.sup.2).sub.p2-Si(R.sub.1)(R.sub.2)(R.sub.3)   Formula 1 wherein in Formula 1, R is -(L.sup.3).sub.p3-Si(R.sub.4)(R.sub.5)(R.sub.6), L is —CH.sub.2— or —CH.sub.2—O—CH.sub.2—, Rf is a fluorine-containing (poly)ether group, and L.sup.1 to L.sup.3, p1 to p3, and R.sub.1 to R.sub.6 are the same as defined in the detailed description.