A process for producing an allylic alcohol functionalized butyl rubber involves contacting an epoxidized butyl rubber with benzoic acid, an analogue of benzoic acid or a C1-C7 alkanoic acid. The process and a polymer compound comprising the epoxidized butyl rubber and the benzoic acid, analogue of benzoic acid or a C1-C7 alkanoic acid provide a cost effective route to a polar functionalized butyl rubber, particularly to butyl rubber comprising allylic alcohol functional groups.

A process for producing an allylic alcohol functionalized butyl rubber involves contacting an epoxidized butyl rubber with benzoic acid, an analogue of benzoic acid or a C1-C7 alkanoic acid. The process and a polymer compound comprising the epoxidized butyl rubber and the benzoic acid, analogue of benzoic acid or a C1-C7 alkanoic acid provide a cost effective route to a polar functionalized butyl rubber, particularly to butyl rubber comprising allylic alcohol functional groups.

A process for producing an allylic alcohol functionalized butyl rubber involves contacting an epoxidized butyl rubber with benzoic acid, an analogue of benzoic acid or a C1-C7 alkanoic acid. The process and a polymer compound comprising the epoxidized butyl rubber and the benzoic acid, analogue of benzoic acid or a C1-C7 alkanoic acid provide a cost effective route to a polar functionalized butyl rubber, particularly to butyl rubber comprising allylic alcohol functional groups.

There is provided a curable composition for forming an anti-reflective film. The composition includes: (a) hollow silica nanoparticles; (b) a siloxane binder having reactive groups; (c) at least one additional material having reactive groups; (d) an initiator; and (e) solvent. The siloxane binder is present in an amount that is at least 50% by weight of the total weight of (siloxane binder+additional materials having reactive groups). The weight ratio of hollow silica nanoparticles to the total of (siloxane binder+additional materials having reactive groups) is no greater than 1.75 to 1.

There is provided a curable composition for forming an anti-reflective film. The composition includes: (a) hollow silica nanoparticles; (b) a siloxane binder having reactive groups; (c) at least one additional material having reactive groups; (d) an initiator; and (e) solvent. The siloxane binder is present in an amount that is at least 50% by weight of the total weight of (siloxane binder+additional materials having reactive groups). The weight ratio of hollow silica nanoparticles to the total of (siloxane binder+additional materials having reactive groups) is no greater than 1.75 to 1.

A method for producing an aqueous dispersion of purified polytetrafluoroethylene, the method including: removing or reducing a compound represented by Formula (1) or (2) below from an aqueous dispersion of polytetrafluoroethylene obtained using a hydrocarbon surfactant: Formula (1): (H(CF.sub.2).sub.mCOO).sub.pM.sup.1; or Formula (2): (H(CF.sub.2).sub.nSO.sub.3).sub.qM.sup.2.

Also disclosed is a composition containing polytetrafluoroethylene substantially free from a compound represented by Formula (3) below and a molded body including the composition: Formula (3): (H(CF.sub.2).sub.8SO.sub.3).sub.qM.sup.2.

A method for producing an aqueous dispersion of purified polytetrafluoroethylene, the method including: removing or reducing a compound represented by Formula (1) or (2) below from an aqueous dispersion of polytetrafluoroethylene obtained using a hydrocarbon surfactant: Formula (1): (H(CF.sub.2).sub.mCOO).sub.pM.sup.1; or Formula (2): (H(CF.sub.2).sub.nSO.sub.3).sub.qM.sup.2.

Also disclosed is a composition containing polytetrafluoroethylene substantially free from a compound represented by Formula (3) below and a molded body including the composition: Formula (3): (H(CF.sub.2).sub.8SO.sub.3).sub.qM.sup.2.

The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance.

##STR00001##

The present invention provides an amic acid ester oligomer having a structure of Formula (1) or (1): ##STR00001## wherein G, P, R, R.sub.x, D, E and m are as defined in the specification. The present invention also provides a polyimide precursor composition comprising the amic acid ester oligomer, as well as a polyimide prepared from the composition.

A member contains a fluorine-containing polymer and a fluorine-containing surfactant, in which provided that a mass-based content of the fluorine-containing surfactant in at least a surface of a portion of the member is M.sub.1, and a mass-based content of the surfactant in a position 10 nm below the surface in a thickness direction of the member is M.sub.2, M.sub.1/M.sub.2 is 0.50 to 0.90, and an atom number ratio X.sub.1 of the number of fluorine atoms contained in the surface to the number of carbon atoms contained in the surface is 0.50 to 3.0.