Patent classifications
C08K5/134
High temperature melting
The present invention relates to methods for making wear and oxidation resistant polymeric materials by high temperature melting. The invention also provides methods of making medical implants containing cross-linked antioxidant-containing tough and ductile polymers and materials used therewith also are provided.
High temperature melting
The present invention relates to methods for making wear and oxidation resistant polymeric materials by high temperature melting. The invention also provides methods of making medical implants containing cross-linked antioxidant-containing tough and ductile polymers and materials used therewith also are provided.
High temperature melting
The present invention relates to methods for making wear and oxidation resistant polymeric materials by high temperature melting. The invention also provides methods of making medical implants containing cross-linked antioxidant-containing tough and ductile polymers and materials used therewith also are provided.
Process for Preparing a Halogenated Elastomer with Improved Mooney Viscosity Stability
This invention relates to a method of preparing a brominated elastomer having a stabilized Mooney viscosity. The method includes polymerizing isomonoolefins and at least one polymerizable unit to obtain an elastomer/polymer; brominating the elastomer/polymer to form a brominated elastomer effluent; neutralizing the brominated elastomer effluent to form a neutralized effluent; volatizing off the hydrocarbon solvent; and recovering a brominated elastomer. In at least one point of the process, preferably prior to any significant temperature change in the brominated polymer, a Mooney stabilizer is added into the system. Portions of the Mooney stabilizer may be added at multiple points into the process.
Process for Preparing a Halogenated Elastomer with Improved Mooney Viscosity Stability
This invention relates to a method of preparing a brominated elastomer having a stabilized Mooney viscosity. The method includes polymerizing isomonoolefins and at least one polymerizable unit to obtain an elastomer/polymer; brominating the elastomer/polymer to form a brominated elastomer effluent; neutralizing the brominated elastomer effluent to form a neutralized effluent; volatizing off the hydrocarbon solvent; and recovering a brominated elastomer. In at least one point of the process, preferably prior to any significant temperature change in the brominated polymer, a Mooney stabilizer is added into the system. Portions of the Mooney stabilizer may be added at multiple points into the process.
CONDUCTIVE MEMBER FOR ELECTROPHOTOGRAPHIC MACHINE
To provide a conductive member for an electrophotographic machine that is capable of preventing hardening degradation of a surface layer that is caused by an ionic conductive agent contained in a conductive rubber elastic body layer, allowing the surface layer to be improved in durability.
A conductive member 10 for an electrophotographic machine includes a conductive rubber elastic body layer 14 containing crossiinked rubber and an ionic conductive agent, and a surface layer 16 provided on an outer periphery of the conductive rubber elastic body layer 14, wherein the surface layer 16 contains a polymer and polyphenol. Examples of the polyphenol include a tannin, gallic acid, ellagic acid, pyrogallol, catechin, and chlorogenic acid.
CONDUCTIVE MEMBER FOR ELECTROPHOTOGRAPHIC MACHINE
To provide a conductive member for an electrophotographic machine that is capable of preventing hardening degradation of a surface layer that is caused by an ionic conductive agent contained in a conductive rubber elastic body layer, allowing the surface layer to be improved in durability.
A conductive member 10 for an electrophotographic machine includes a conductive rubber elastic body layer 14 containing crossiinked rubber and an ionic conductive agent, and a surface layer 16 provided on an outer periphery of the conductive rubber elastic body layer 14, wherein the surface layer 16 contains a polymer and polyphenol. Examples of the polyphenol include a tannin, gallic acid, ellagic acid, pyrogallol, catechin, and chlorogenic acid.
Stabilizing compositions for stabilizing materials against ultraviolet light and thermal degradation
Stabilizer compositions for stabilizing materials against degradation due to thermal and ultraviolet light exposure are disclosed herein. In some instances, the stabilizer compositions include an ortho-hydroxyl tris-aryl-s-triazine compound; a hindered amine light stabilizer compound; a hindered hydroxybenzoate compound; a phosphite compound, an acid scavenger and/or thioester; and a hindered phenol antioxidant compound.
STABILIZED COMPOSITIONS OF POLYCARBONATES AND VINYLIDENE SUBSTITUTED AROMATIC COMPOUNDS
A composition comprising: one or more polycarbonates; one or more vinylidene aromatic substituted polymers; and a buffer system that controls the pH in water at 25° C. at a value of about 6.0 to about 8.0. The composition may comprise the buffer system that has a pKa between about 4 and about 10. The composition may comprise: from about 10 or 50 to about 95 percent by weight of the one or more polycarbonates; from about 0.5 or about 10 to about 50 or about 90 percent by weight of the one or more vinylidene aromatic substituted monomers; and from about 0.005 percent to about 0.050 percent by weight of the buffer system; wherein weight is based on the total weight of the composition. The buffer system may be present in an amount from about 0.010 percent to about 0.040 percent by weight.
STABILIZED COMPOSITIONS OF POLYCARBONATES AND VINYLIDENE SUBSTITUTED AROMATIC COMPOUNDS
A composition comprising: one or more polycarbonates; one or more vinylidene aromatic substituted polymers; and a buffer system that controls the pH in water at 25° C. at a value of about 6.0 to about 8.0. The composition may comprise the buffer system that has a pKa between about 4 and about 10. The composition may comprise: from about 10 or 50 to about 95 percent by weight of the one or more polycarbonates; from about 0.5 or about 10 to about 50 or about 90 percent by weight of the one or more vinylidene aromatic substituted monomers; and from about 0.005 percent to about 0.050 percent by weight of the buffer system; wherein weight is based on the total weight of the composition. The buffer system may be present in an amount from about 0.010 percent to about 0.040 percent by weight.