C08K5/136

Fluoroelastomer composition

The invention pertains to a composition based on a fluoroelastomer comprising nitrile or carboxylate-type cure sites and including a curing agent and a Br-containing marker having reactivity towards the said cure-sites, which can be cured so as to deliver cured parts maintaining chemically bound bromine atoms; this material, when submitted to wear/damage would hence release Br-containing contaminants, which can easily spotted via notably an on-line mass spectrometer, so as to monitor and anticipate critical failures of sealing materials based there upon.

Flame-retarded styrene-containing formulations
11111376 · 2021-09-07 ·

A composition comprising: an impact modified styrene-containing polymer; at least one bromine-containing flame retardant; at least one dialkyl phosphinic acid metal salt M.sub.1.sup.n+(R.sup.1R.sup.2PO.sub.2).sub.n wherein M.sub.1 is a metal cation with valence n and R.sup.1, R.sup.2 are alkyl groups which may be the same or different; at least one anti-dripping agent, wherein the total concentration of the bromine-containing flame retardant and the dialkyl phosphinic acid metal salt is less than 28% by weight based on the sum of all components in the composition, wherein said composition is free of antimony and meets UL-94 V-1/1.6 mm or UL-94 V-0/1.6 mm test requirements.

Flame-retarded styrene-containing formulations
11111376 · 2021-09-07 ·

A composition comprising: an impact modified styrene-containing polymer; at least one bromine-containing flame retardant; at least one dialkyl phosphinic acid metal salt M.sub.1.sup.n+(R.sup.1R.sup.2PO.sub.2).sub.n wherein M.sub.1 is a metal cation with valence n and R.sup.1, R.sup.2 are alkyl groups which may be the same or different; at least one anti-dripping agent, wherein the total concentration of the bromine-containing flame retardant and the dialkyl phosphinic acid metal salt is less than 28% by weight based on the sum of all components in the composition, wherein said composition is free of antimony and meets UL-94 V-1/1.6 mm or UL-94 V-0/1.6 mm test requirements.

Brominated epoxy polymers as wood coating flame retardant formulations

The present invention discloses novel flame retardant aqueous formulations comprising micronized particles of brominated epoxy polymers having a predetermined molecular weight, their use as flame retardant coating of wood-based substrates, their preparation and flame-retarded wood-based substrates prepared by using them.

Brominated epoxy polymers as wood coating flame retardant formulations

The present invention discloses novel flame retardant aqueous formulations comprising micronized particles of brominated epoxy polymers having a predetermined molecular weight, their use as flame retardant coating of wood-based substrates, their preparation and flame-retarded wood-based substrates prepared by using them.

PHOTORESIST COMPOSITION, PHOTOLITHOGRAPHY METHOD USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

A photolithography method and a method of manufacturing a semiconductor device, the photolithography method including applying a composition on a substrate to form a photoresist layer; performing an exposing process using extreme ultraviolet radiation (EUV) on the photoresist layer; and developing the photoresist layer to form photoresist patterns, wherein the composition includes a photosensitive resin, a photo-acid generator, a photo decomposable quencher, an additive, and a solvent, and the additive is a compound represented by the following Formula 4A:

##STR00001## in Formula 4A, R.sub.1 to R.sub.5 are each independently hydrogen or iodine, at least one of R.sub.1 to R.sub.5 being iodine.

PHOTORESIST COMPOSITION, PHOTOLITHOGRAPHY METHOD USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

A photolithography method and a method of manufacturing a semiconductor device, the photolithography method including applying a composition on a substrate to form a photoresist layer; performing an exposing process using extreme ultraviolet radiation (EUV) on the photoresist layer; and developing the photoresist layer to form photoresist patterns, wherein the composition includes a photosensitive resin, a photo-acid generator, a photo decomposable quencher, an additive, and a solvent, and the additive is a compound represented by the following Formula 4A:

##STR00001## in Formula 4A, R.sub.1 to R.sub.5 are each independently hydrogen or iodine, at least one of R.sub.1 to R.sub.5 being iodine.

POLY (ARYL ETHERKETONE) BASED VARNISH FOR WIRE COATING AND METHOD COATING A WIRE FROM A SOLUTION
20210202134 · 2021-07-01 ·

A method of manufacturing a coated metallic wire having a polymeric coating, the method includes: dissolving at least one polymer including a poly(aryl etherketone) in at least one phenolic solvent to form a solution; contacting the surface of a metallic wire with the solution to form a coated wire having at least one layer of coating; and drying the coated wire to evaporate residual solvent.

POLY (ARYL ETHERKETONE) BASED VARNISH FOR WIRE COATING AND METHOD COATING A WIRE FROM A SOLUTION
20210202134 · 2021-07-01 ·

A method of manufacturing a coated metallic wire having a polymeric coating, the method includes: dissolving at least one polymer including a poly(aryl etherketone) in at least one phenolic solvent to form a solution; contacting the surface of a metallic wire with the solution to form a coated wire having at least one layer of coating; and drying the coated wire to evaporate residual solvent.

COMPOSITION USEFUL FOR PRODUCTION OF ACIDIC GAS SEPARATION MEMBRANE

The present invention provides a composition comprising an organic compound having an acid dissociation constant in a 25° C. aqueous solution of 5.0 to 15.0, a hydrophilic resin, and a basic compound, wherein a content of the organic compound is 30 to 1,000 parts by weight per 100 parts by weight of the hydrophilic resin.