Patent classifications
C08K5/33
COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.
METHOD FOR PREPARATION OF 5-ALKYLSALICYLALDOXIMES AND APPLICATION THEREOF
Method for preparation of 5-alkylsalicylaldoximes with formula 1, where R is a C6-C16 alkyl group, consisting in that into a water-alcohol solvent system, p-alkylphenol, sodium hydroxide, chloroform and hydroxylamine are introduced, while in relation to the alkylphenol used, sodium hydroxide and chloroform are used in amounts from the stoichiometric amount to a 100% excess, and hydroxylamine is used in amounts from the stoichiometric amount to a 60% excess, and the reaction is carried out at a temperature of 60-75° C. for 1.5-4 h, and then, at a temperature of 20-30° C., the post-reaction mixture is acidified till the pH of the aqueous phase <7.0 is obtained, and next, an alcohol-water azeotrope is distilled off with an admixture of unreacted chloroform, the residue is mixed with a neutral C5-C10 hydrocarbon solvent, the layers are separated, and the solvent is distilled off from the organic phase.
LOW-TEMPERATURE CURABLE NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
To provide a negative type photosensitive composition having excellent chemical resistance and capable of being cured at a low temperature. A negative type photosensitive composition comprising (I) a polysiloxane having a specific structure, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent.
LOW-TEMPERATURE CURABLE NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
To provide a negative type photosensitive composition having excellent chemical resistance and capable of being cured at a low temperature. A negative type photosensitive composition comprising (I) a polysiloxane having a specific structure, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent.
Coating Composition Comprising Anti-Skinning Agent
The invention relates to a coating composition comprising an oxidatively drying binder and an anti-skinning agent, the anti-skinning agent comprising: a) a diketone of formula (I) (b) an aldoxime or ketoxime of formula (II) wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and n have the same meaning as that defined by the present application.
##STR00001##
CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Provided are a curable composition including a pigment, a curable compound, and a resin A having a constitutional unit represented by Formula (1), a constitutional unit represented by Formula (2), and a constitutional unit having a molecular weight of 1,000 or less and represented by Formula (3); a cured product of the curable composition; a color filter including the cured product; and a solid-state imaging element and an image display device including the color filter. X.sup.1 represents an (m+2)-valent organic group, X.sup.2 and X.sup.3 represent a trivalent organic group, m represents an integer of 1 to 4, L.sup.2's each independently represent O or NR, L.sup.3's each independently represent a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P.sup.1 represents a group having a polymer chain, R.sup.1's each independently represent a substituent, and R.sup.3 represents a group having a polymerizable group.
##STR00001##
CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Provided are a curable composition including a pigment, a curable compound, and a resin A having a constitutional unit represented by Formula (1), a constitutional unit represented by Formula (2), and a constitutional unit having a molecular weight of 1,000 or less and represented by Formula (3); a cured product of the curable composition; a color filter including the cured product; and a solid-state imaging element and an image display device including the color filter. X.sup.1 represents an (m+2)-valent organic group, X.sup.2 and X.sup.3 represent a trivalent organic group, m represents an integer of 1 to 4, L.sup.2's each independently represent O or NR, L.sup.3's each independently represent a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P.sup.1 represents a group having a polymer chain, R.sup.1's each independently represent a substituent, and R.sup.3 represents a group having a polymerizable group.
##STR00001##
CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Provided are a curable composition including a pigment, a curable compound, and a resin A having a constitutional unit represented by Formula (1), a constitutional unit represented by Formula (2), and a constitutional unit having a molecular weight of 1,000 or less and represented by Formula (3); a cured product of the curable composition; a color filter including the cured product; and a solid-state imaging element and an image display device including the color filter. X.sup.1 represents an (m+2)-valent organic group, X.sup.2 and X.sup.3 represent a trivalent organic group, m represents an integer of 1 to 4, L.sup.2's each independently represent O or NR, L.sup.3's each independently represent a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P.sup.1 represents a group having a polymer chain, R.sup.1's each independently represent a substituent, and R.sup.3 represents a group having a polymerizable group.
##STR00001##
COATING COMPOSITION INCLUDING ALKYL OXIMES
A coating composition including at least one solvent, at least one resin, at least one drier, and an anti-skinning agent is provided, an anti-skinning composition, wherein the anti-skinning composition comprises at least 92 wt. %, or more particularly at least 98 wt. %, of an alkyl oxime having five carbon atoms selected from 2-pentanone oxime and 3-methyl-2-butanone oxime. In some embodiments, the high-purity 2-pentanone oxime includes less than 0.5 wt. % methyl isobutyl ketoxime. In some embodiments, the composition includes less than 0.006 wt. % methyl isobutyl ketoxime. A method for the preparation of a purified 2-pentanone stream suitable for oximation to a high-purity 2-pentanone oxime is also provided.
COATING COMPOSITION INCLUDING ALKYL OXIMES
A coating composition including at least one solvent, at least one resin, at least one drier, and an anti-skinning agent is provided, an anti-skinning composition, wherein the anti-skinning composition comprises at least 92 wt. %, or more particularly at least 98 wt. %, of an alkyl oxime having five carbon atoms selected from 2-pentanone oxime and 3-methyl-2-butanone oxime. In some embodiments, the high-purity 2-pentanone oxime includes less than 0.5 wt. % methyl isobutyl ketoxime. In some embodiments, the composition includes less than 0.006 wt. % methyl isobutyl ketoxime. A method for the preparation of a purified 2-pentanone stream suitable for oximation to a high-purity 2-pentanone oxime is also provided.