Provided are a photosensitive coloring composition including a coloring material, a photopolymerization initiator A1 having a light absorption coefficient of 1.010.sup.4 mL/g.Math.cm or more at a wavelength of 365 nm in methanol, a photopolymerization initiator A2 having a light absorption coefficient of 1.010.sup.2 mL/g.Math.cm or less at a wavelength of 365 nm in methanol and having a light absorption coefficient of 1.010.sup.3 mL/g.Math.cm or more at a wavelength of 254 nm in methanol, and a polymerizable monomer, in which a content of the polymerizable monomer in a total solid content of the photosensitive coloring composition is 15% by mass or more; a cured film, a method for forming a pattern, a color filter, a solid-state imaging element, and an image display device.

Provided are a photosensitive coloring composition including a coloring material, a photopolymerization initiator A1 having a light absorption coefficient of 1.010.sup.4 mL/g.Math.cm or more at a wavelength of 365 nm in methanol, a photopolymerization initiator A2 having a light absorption coefficient of 1.010.sup.2 mL/g.Math.cm or less at a wavelength of 365 nm in methanol and having a light absorption coefficient of 1.010.sup.3 mL/g.Math.cm or more at a wavelength of 254 nm in methanol, and a polymerizable monomer, in which a content of the polymerizable monomer in a total solid content of the photosensitive coloring composition is 15% by mass or more; a cured film, a method for forming a pattern, a color filter, a solid-state imaging element, and an image display device.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

Provided are a curable composition including a pigment, a resin having a structural unit represented by Formula 1, and a photopolymerization initiator; as well as a cured product obtained by curing the curable composition, a color filter including the cured product, a method for producing the color filter, and a solid-state imaging element or an image display device, each of which including the color filter. R.sup.1 to R.sup.3 each independently represent a hydrogen atom or an alkyl group, X.sup.1 represents COO, CONR, or an arylene group, R.sup.4 represents a divalent linking group, L.sup.1 represents a group represented by Formula 2 or 3, R.sup.5 represents an (n+1)-valent linking group, X.sup.2 represents an oxygen atom or NR.sup.A-, R.sup.A represents a hydrogen atom, an alkyl group, or an aryl group, and n represents an integer of 1 or more.

##STR00001##

Provided are a curable composition including a pigment, a resin having a structural unit represented by Formula 1, and a photopolymerization initiator; as well as a cured product obtained by curing the curable composition, a color filter including the cured product, a method for producing the color filter, and a solid-state imaging element or an image display device, each of which including the color filter. R.sup.1 to R.sup.3 each independently represent a hydrogen atom or an alkyl group, X.sup.1 represents COO, CONR, or an arylene group, R.sup.4 represents a divalent linking group, L.sup.1 represents a group represented by Formula 2 or 3, R.sup.5 represents an (n+1)-valent linking group, X.sup.2 represents an oxygen atom or NR.sup.A-, R.sup.A represents a hydrogen atom, an alkyl group, or an aryl group, and n represents an integer of 1 or more.

##STR00001##

An image display device which suppresses destruction of an image display panel due to static electricity carried by a phase difference film, and has excellent adhesiveness between the phase difference film and the image display panel even in a moisture-heat environment, and a circularly polarizing plate with a photosensitive adhesive. The image display device includes a circularly polarizing plate having a linear polarizer and a phase difference film, and an image display panel in this order from a viewing side, in which the phase difference film and the image display panel are bonded by a pressure-sensitive adhesive, the phase difference film has an optically anisotropic layer obtained by polymerizing a polymerizable liquid crystal composition containing at least one kind of polymerizable liquid crystal compound having a predetermined structure, and the pressure-sensitive adhesive contains a polymer having an acid value of 1 to 30 mgKOH/g and an antistatic agent.

A photosensitive resin composition containing a resin and a compound each having a structure specified by the present specification provides a cured film having excellent adhesiveness to copper wiring.

A resin composition including the following components (a) and (b). (a) A polyimide precursor having a structural unit represented by the following general formula (1); and (b) a compound represented by the following general formula (2): wherein in the formula R.sup.1 is a tetravalent organic group, R.sup.2 is a divalent organic group and R.sup.3 and R.sup.4 are independently a hydrogen atom, an alkyl group, a cycloalkyl group or a monovalent organic group having a carbon-carbon unsaturated double bond. R.sup.5 is an alkyl group having 1 to 4 carbon atoms, R.sup.6 is independently a hydroxyl group or an alkyl group having 1 to 4 carbon atoms, a is an integer of 0 to 3, n is an integer of 1 to 6, and R.sup.7 is a group represented by the following general formula (3) or (4): wherein in the formula (3) or (4), R.sup.8 is an alkyl group having 1 to 10 carbon atoms or a monovalent organic group derived from hydroxyalkylsilane and R.sup.9 is an alkyl group having 1 to 10 carbon atoms, a monovalent organic group derived from aminoalkylsilane or a heterocyclic group, and R.sup.8 and R.sup.9 may independently have a substituent. ##STR00001##

A resin composition including the following components (a) and (b). (a) A polyimide precursor having a structural unit represented by the following general formula (1); and (b) a compound represented by the following general formula (2): wherein in the formula R.sup.1 is a tetravalent organic group, R.sup.2 is a divalent organic group and R.sup.3 and R.sup.4 are independently a hydrogen atom, an alkyl group, a cycloalkyl group or a monovalent organic group having a carbon-carbon unsaturated double bond. R.sup.5 is an alkyl group having 1 to 4 carbon atoms, R.sup.6 is independently a hydroxyl group or an alkyl group having 1 to 4 carbon atoms, a is an integer of 0 to 3, n is an integer of 1 to 6, and R.sup.7 is a group represented by the following general formula (3) or (4): wherein in the formula (3) or (4), R.sup.8 is an alkyl group having 1 to 10 carbon atoms or a monovalent organic group derived from hydroxyalkylsilane and R.sup.9 is an alkyl group having 1 to 10 carbon atoms, a monovalent organic group derived from aminoalkylsilane or a heterocyclic group, and R.sup.8 and R.sup.9 may independently have a substituent. ##STR00001##