The direct-current cable includes a conductive portion; and an insulating layer covering an outer periphery of the conductive portion, the insulating layer containing cross-linked base resin and inorganic filler, the base resin containing polyethylene, a BET specific surface area of the inorganic filler being greater than or equal to 5 m.sup.2/g and less than or equal to 150 m.sup.2/g, and a mean volume diameter of the inorganic filler being less than or equal to 1.0 μm, the mass ratio of the inorganic filler with respect to the base resin being greater than or equal to 0.001 and less than or equal to 0.05, and the cross-linked base resin being cross-linked by a cross-linking agent containing organic peroxide.

A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R.sup.1, R.sup.2 and R.sup.3 are a C.sub.1-C.sub.20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.

##STR00001##

A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R.sup.1, R.sup.2 and R.sup.3 are a C.sub.1-C.sub.20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.

##STR00001##

A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R.sup.1, R.sup.2 and R.sup.3 are a C.sub.1-C.sub.20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.

##STR00001##

Described are hydrosilylation-curable polyorganosiloxane compositions containing sulfur, including hydrosilylation-curable polyorganosiloxane prepolymers and hydrosilylation-cured polyorganosiloxane polymer products made therefrom, as well as methods of preparing and using the same, devices comprising or prepared from the same, and sulfur-functional organosiloxanes useful therein.

A curable composition of the present invention includes a cationic polymerizable compound; a thermal polymerization initiator; and a storage stabilizer, in which the cationic polymerizable compound includes at least two selected from the group consisting of a glycidyl ether compound, an alicyclic epoxy compound, and an oxetane compound, a content of the thermal polymerization initiator is from 0.3 to 3 parts by mass with respect to 100 parts by mass of the cationic polymerizable compound, and chain curing is enabled by thermal energy generated by a polymerization reaction of the cationic polymerizable compound.

A curable composition of the present invention includes a cationic polymerizable compound; a thermal polymerization initiator; and a storage stabilizer, in which the cationic polymerizable compound includes at least two selected from the group consisting of a glycidyl ether compound, an alicyclic epoxy compound, and an oxetane compound, a content of the thermal polymerization initiator is from 0.3 to 3 parts by mass with respect to 100 parts by mass of the cationic polymerizable compound, and chain curing is enabled by thermal energy generated by a polymerization reaction of the cationic polymerizable compound.

An object of the present invention is to provide a photocurable resin composition having excellent thick-film curability and further excellent storage stability, and a cured product of the photocurable resin composition has a high concealing effect.

The present invention is a photocurable resin composition containing components (A) to (E): a component (A): a leuco dye; a component (B): a photoacid generator; a component (C): a radical polymerizable compound (except for a (meth)acrylate having a tertiary amine skeleton); a component (D): a photoradical polymerization initiator; and a component (E): a tertiary amine compound.

An object of the present invention is to provide a photocurable resin composition having excellent thick-film curability and further excellent storage stability, and a cured product of the photocurable resin composition has a high concealing effect.

The present invention is a photocurable resin composition containing components (A) to (E): a component (A): a leuco dye; a component (B): a photoacid generator; a component (C): a radical polymerizable compound (except for a (meth)acrylate having a tertiary amine skeleton); a component (D): a photoradical polymerization initiator; and a component (E): a tertiary amine compound.

A method for stabilizing a natural rubber such as guayule. The method includes the step of introducing at least one of an Extraction Curves for Guayule Rubber Samples amine and a phenolic anti-oxidant, such as MADA, to a latex form of the rubber under conditions such that the anti-oxidant becomes chemically bound to the rubber. The method includes the further step of subsequently treating the rubber to remove at least a substantial portion of entrained resins. The method can yield a rubber composition of, for example, guayule rubber and including an anti-oxidant chemically bound thereto. The resultant rubber can be suitable for use in tire construction.