Patent classifications
C08K5/378
LATEX COMPOSITION, MOLDED BODY, AND METHOD FOR PRODUCING MOLDED BODY
The present invention relates to a latex composition, a molded body, and a method for producing a molded body, and the latex composition includes a chloroprene polymer (A), and a thiol compound (B) having 2 or more mercapto groups in a molecule.
SUBSTITUTED THIOLATE SALT MELT ADDITIVES
Charged polymeric webs, such as electret webs, include a thermoplastic resin and a charge-enhancing additive. The additives are substituted heterocyclic thiolate salts. The heterocyclic thiolate salt has 2 nitrogen groups and a third group that may be an NH, N—NH.sub.2, O, or S group. The substituent group is an aromatic or heterocyclic aromatic group. The electret webs may be a non-woven fibrous web or a film. The electret webs are suitable for use as filter media.
SUBSTITUTED THIOLATE SALT MELT ADDITIVES
Charged polymeric webs, such as electret webs, include a thermoplastic resin and a charge-enhancing additive. The additives are substituted heterocyclic thiolate salts. The heterocyclic thiolate salt has 2 nitrogen groups and a third group that may be an NH, N—NH.sub.2, O, or S group. The substituent group is an aromatic or heterocyclic aromatic group. The electret webs may be a non-woven fibrous web or a film. The electret webs are suitable for use as filter media.
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
A resist underlayer composition including a polymer including a main chain, a side chain, or a main chain and a side chain including a heterocycle including two or more nitrogen atoms in the ring of the heterocycle, a compound including a moiety represented by Chemical Formula 1, and a solvent is provided. A method of forming patterns using the resist underlayer composition is also provided
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RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
A resist underlayer composition including a polymer including a main chain, a side chain, or a main chain and a side chain including a heterocycle including two or more nitrogen atoms in the ring of the heterocycle, a compound including a moiety represented by Chemical Formula 1, and a solvent is provided. A method of forming patterns using the resist underlayer composition is also provided
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POST-TREATMENT METHOD OF VINYL CHLORIDE-BASED POLYMER AND CLOSED POST-TREATMENT SYSTEM FOR THE SAME
The present invention provides a post-treatment method of a vinyl chloride-based polymer including: (a) preparing a stream containing vinyl chloride-based polymer powder and unreacted vinyl chloride-based monomers by drying a vinyl chloride-based polymer latex in a drying unit; (b) filtering the stream containing the vinyl chloride-based polymer powder and the unreacted vinyl chloride-based monomers in a filtering unit; and (c) recirculating a gas containing the unreacted vinyl chloride-based monomers discharged from the filtering unit to a latex storage unit.
POST-TREATMENT METHOD OF VINYL CHLORIDE-BASED POLYMER AND CLOSED POST-TREATMENT SYSTEM FOR THE SAME
The present invention provides a post-treatment method of a vinyl chloride-based polymer including: (a) preparing a stream containing vinyl chloride-based polymer powder and unreacted vinyl chloride-based monomers by drying a vinyl chloride-based polymer latex in a drying unit; (b) filtering the stream containing the vinyl chloride-based polymer powder and the unreacted vinyl chloride-based monomers in a filtering unit; and (c) recirculating a gas containing the unreacted vinyl chloride-based monomers discharged from the filtering unit to a latex storage unit.
METHOD FOR PRODUCING RESIN COMPOSITION AND METHOD FOR PRODUCING MOLDED ARTICLE
A method for producing a resin composition of the present invention is a method for producing a resin composition, the method including a step of obtaining a resin composition by heating and melt-kneading a mixture containing a particulate nucleating agent in which D.sub.50 is equal to or more than 0.1 μm and equal to or less than 300 μm and a thermoplastic resin using a twin screw extruder (100) including, inside a cylinder (10), a screw (50) having kneading discs (60), in which the step of obtaining a resin composition includes an extrusion step of extruding the mixture supplied into the twin screw extruder (100) in an ejection direction under kneading conditions in which X and Y satisfy 4.0≤X in a range of 6.0×10.sup.3≤Y≤7.0×10.sup.4 when a volume-based ejection amount is denoted by X (10.sup.−6.Math.kg.Math.h.sup.−1.Math.mm.sup.−3), and a strain rate is denoted by Y (min.sup.−1).
METHOD FOR PRODUCING RESIN COMPOSITION AND METHOD FOR PRODUCING MOLDED ARTICLE
A method for producing a resin composition of the present invention is a method for producing a resin composition, the method including a step of obtaining a resin composition by heating and melt-kneading a mixture containing a particulate nucleating agent in which D.sub.50 is equal to or more than 0.1 μm and equal to or less than 300 μm and a thermoplastic resin using a twin screw extruder (100) including, inside a cylinder (10), a screw (50) having kneading discs (60), in which the step of obtaining a resin composition includes an extrusion step of extruding the mixture supplied into the twin screw extruder (100) in an ejection direction under kneading conditions in which X and Y satisfy 4.0≤X in a range of 6.0×10.sup.3≤Y≤7.0×10.sup.4 when a volume-based ejection amount is denoted by X (10.sup.−6.Math.kg.Math.h.sup.−1.Math.mm.sup.−3), and a strain rate is denoted by Y (min.sup.−1).
THERMOFORMING LAMINATE AND METHOD FOR MOLDING LAMINATE
Provided is a thermoforming laminate, etc., having good thermoforming properties as well as excellent chemical resistance and abrasion resistance. Examples of solutions to the problem include a thermoformable laminate, including: (a) a substrate layer containing a thermoplastic resin; (b) a post-cure type hard coat layer containing an active-energy-ray-curable resin having a (meth)acryloyl group, the hard coat layer also containing a polymerization inhibitor; and (c) a protective film, wherein: (a) the substrate layer, (b) the hard coat layer, and (c) the protective film are layered in this order; and the polymerization inhibitor includes at least one among a quinone-based compound, a sulfur-containing compound, and a nitrogen-containing compound.