To provide a fluorinated copolymer composition whereby a crosslinked rubber article which has a low compression set at high temperature and which is not broken after compression can be formed, and a crosslinked rubber article.

The fluorinated copolymer composition of the present invention comprises a fluorinated copolymer (A) having units having a nitrile group and units based on tetrafluoroethylene, a fluorinated copolymer (B) having units having at least one functional group selected from the group consisting of a group having a carbonyl group, a hydroxy group, an epoxy group and an isocyanate group and units based on tetrafluoroethylene, and a crosslinking agent.

To provide a fluorinated copolymer composition whereby a crosslinked rubber article which has a low compression set at high temperature and which is not broken after compression can be formed, and a crosslinked rubber article.

The fluorinated copolymer composition of the present invention comprises a fluorinated copolymer (A) having units having a nitrile group and units based on tetrafluoroethylene, a fluorinated copolymer (B) having units having at least one functional group selected from the group consisting of a group having a carbonyl group, a hydroxy group, an epoxy group and an isocyanate group and units based on tetrafluoroethylene, and a crosslinking agent.

The invention provides a fluoroelastomer composition that can be crosslinked at an industrially sufficient rate without the use of a graphene having specific surface properties and can provide a fluoroelastomer molded article having higher tensile strength and better abrasion resistance than conventional fluoroelastomer molded articles even though having a similar tensile modulus to conventional fluoroelastomer molded articles. The fluoroelastomer composition contains a fluoroelastomer that contains a crosslinkable group-containing monomer unit and an elongated sheet-shaped graphene. The graphene exhibits a ratio (L/W) of a maximum length (L) and a width (W) of 2 to 10.sup.5, and the graphene exhibits a ratio (L/T) of the maximum length (L) and a thickness (T) of 1×10.sup.1 to 1×10.sup.7.

The invention provides a fluoroelastomer composition that can be crosslinked at an industrially sufficient rate without the use of a graphene having specific surface properties and can provide a fluoroelastomer molded article having higher tensile strength and better abrasion resistance than conventional fluoroelastomer molded articles even though having a similar tensile modulus to conventional fluoroelastomer molded articles. The fluoroelastomer composition contains a fluoroelastomer that contains a crosslinkable group-containing monomer unit and an elongated sheet-shaped graphene. The graphene exhibits a ratio (L/W) of a maximum length (L) and a width (W) of 2 to 10.sup.5, and the graphene exhibits a ratio (L/T) of the maximum length (L) and a thickness (T) of 1×10.sup.1 to 1×10.sup.7.

This invention relates to a coating comprising prepolymer and monomers for application onto polyurethane for chemical resistance, abrasion resistance, water proof etc. Usually polyurethane is porous and does not have sufficient stain, abrasion and chemical resistance. The said coatings developed using technology of chemical grafting that involves the use of prepolymers, monomers, catalyst, graft initiator, wetting agents, fillers and other ingredients of the composition. The coating thus obtained when applied on the polyurethane allows obtaining graft polymerization, thereby forming a polymeric film chemically attached to the substrate. The polyurethane substrate is reacted with craft initiator which creates the reaction sites on the substrate via free radical mechanism. This in turn renders the substrate receptive to attachment of monomers/prepolymers forming polymeric film that is chemically bonded to the substrate which has then the desired property in terms of stain resistance, abrasion wear, crock, water, chemical resistance and other properties.

This invention relates to a coating comprising prepolymer and monomers for application onto polyurethane for chemical resistance, abrasion resistance, water proof etc. Usually polyurethane is porous and does not have sufficient stain, abrasion and chemical resistance. The said coatings developed using technology of chemical grafting that involves the use of prepolymers, monomers, catalyst, graft initiator, wetting agents, fillers and other ingredients of the composition. The coating thus obtained when applied on the polyurethane allows obtaining graft polymerization, thereby forming a polymeric film chemically attached to the substrate. The polyurethane substrate is reacted with craft initiator which creates the reaction sites on the substrate via free radical mechanism. This in turn renders the substrate receptive to attachment of monomers/prepolymers forming polymeric film that is chemically bonded to the substrate which has then the desired property in terms of stain resistance, abrasion wear, crock, water, chemical resistance and other properties.

The invention provides a method for polishing or planarizing a substrate. First, the method comprises attaching a polymer-polymer composite polishing pad to a polishing device. The polishing pad has a polymer matrix and fluoropolymer particles embedded in the polymeric matrix. The fluoropolymer particles have a zeta potential more negative than the polymeric matrix. Cationic particle-containing slurry is applied to the polishing pad. Conditioning the polymer-polymer composite polishing pad exposes the fluoropolymer particles to the polishing surface and creates fluoropolymer-containing debris particles in the slurry. Polishing or planarizing the substrate with the increased electronegativity from the fluoropolymer at the polishing surface and in the fluoropolymer-containing debris particles stabilizes the cationic particle-containing slurry to decreases the precipitation rate of the cationic particle-containing slurry.

The invention provides a method for polishing or planarizing a substrate. First, the method comprises attaching a polymer-polymer composite polishing pad to a polishing device. The polishing pad has a polymer matrix and fluoropolymer particles embedded in the polymeric matrix. The fluoropolymer particles have a zeta potential more negative than the polymeric matrix. Cationic particle-containing slurry is applied to the polishing pad. Conditioning the polymer-polymer composite polishing pad exposes the fluoropolymer particles to the polishing surface and creates fluoropolymer-containing debris particles in the slurry. Polishing or planarizing the substrate with the increased electronegativity from the fluoropolymer at the polishing surface and in the fluoropolymer-containing debris particles stabilizes the cationic particle-containing slurry to decreases the precipitation rate of the cationic particle-containing slurry.

The invention provides a method for polishing or planarizing a substrate. First, the method comprises attaching a polymer-polymer composite polishing pad to a polishing device. The polishing pad has a polymer matrix and fluoropolymer particles embedded in the polymeric matrix. The fluoropolymer particles have a zeta potential more negative than the polymeric matrix. Cationic particle-containing slurry is applied to the polishing pad. Conditioning the polymer-polymer composite polishing pad exposes the fluoropolymer particles to the polishing surface and creates fluoropolymer-containing debris particles in the slurry. Polishing or planarizing the substrate with the increased electronegativity from the fluoropolymer at the polishing surface and in the fluoropolymer-containing debris particles stabilizes the cationic particle-containing slurry to decreases the precipitation rate of the cationic particle-containing slurry.

A composition including a fluoropolymer and substantially free from a compound represented by the following formula (3): (H—(CF.sub.2).sub.8—SO.sub.3).sub.qM.sup.2, wherein M.sup.2 is H, a metal atom, NR.sup.5.sub.4, imidazolium optionally containing a substituent, pyridinium optionally containing a substituent, or phosphonium optionally containing a substituent; R.sup.5s are each H or an organic group and are the same as or different from each other; and q is 1 or 2.