The present disclosure provides a light shielding material, a patterning method thereof, and a display panel. The light shielding material includes a light shielding composition and a transparent composition, the light shielding composition includes Ti.sub.7O.sub.4 and a dispersant, and the transparent composition includes a first compound, a photoactive compound, and a first solvent. Through dispersing Ti.sub.7O.sub.4 into the transparent composition, the light shielding material can be obtained in the present disclosure, which has an excellent light shielding effect, thereby preventing technical problems of scraps and scratches of the light shielding material caused by printing a black oil on the light shielding material using copper screen printing in current technology.

The present disclosure provides a light shielding material, a patterning method thereof, and a display panel. The light shielding material includes a light shielding composition and a transparent composition, the light shielding composition includes Ti.sub.7O.sub.4 and a dispersant, and the transparent composition includes a first compound, a photoactive compound, and a first solvent. Through dispersing Ti.sub.7O.sub.4 into the transparent composition, the light shielding material can be obtained in the present disclosure, which has an excellent light shielding effect, thereby preventing technical problems of scraps and scratches of the light shielding material caused by printing a black oil on the light shielding material using copper screen printing in current technology.

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##

Disclosed are thermoplastic vulcanizates comprising a plastic phase and a rubber phase and process for preparing such thermoplastic vulcanizates, wherein the plastic phase comprises a thermoplastic polymer and the rubber phase comprises an acrylate rubber.

Disclosed are thermoplastic vulcanizates comprising a plastic phase and a rubber phase and process for preparing such thermoplastic vulcanizates, wherein the plastic phase comprises a thermoplastic polymer and the rubber phase comprises an acrylate rubber.

An amphiphilic polymer comprising: at least 10 wt-% monomeric units comprising alkylene oxide moieties, wherein a majority of the alkylene oxide moieties are ethylene oxide moieties; monomeric units comprising hexafluoropropylene oxide oligomeric moieties having the formula C.sub.3F.sub.7O—(CF(CF.sub.3)CF.sub.2O).sub.aCF(CF.sub.3)—C(O)N(H)-Q-, wherein Q is a linking group with at least one carbon atom, and “a” is at least 5; and monomeric units comprising pendant groups selected from phosphate groups, phosphonate groups, sulfonate groups, and combinations thereof; wherein the amphiphilic polymer is water dispersible; aqueous coating compositions containing the amphiphilic polymer; and methods of treating a hard surface.

An amphiphilic polymer comprising: at least 10 wt-% monomeric units comprising alkylene oxide moieties, wherein a majority of the alkylene oxide moieties are ethylene oxide moieties; monomeric units comprising hexafluoropropylene oxide oligomeric moieties having the formula C.sub.3F.sub.7O—(CF(CF.sub.3)CF.sub.2O).sub.aCF(CF.sub.3)—C(O)N(H)-Q-, wherein Q is a linking group with at least one carbon atom, and “a” is at least 5; and monomeric units comprising pendant groups selected from phosphate groups, phosphonate groups, sulfonate groups, and combinations thereof; wherein the amphiphilic polymer is water dispersible; aqueous coating compositions containing the amphiphilic polymer; and methods of treating a hard surface.

A directed self-assembly composition for pattern formation, includes two or more kinds of polymers. The two or more kinds of polymers each do not have a silicon atom in a main chain thereof. At least one of the two or more kinds of polymers has a group binding to the polymerizing end of the main chain and having a hetero atom.

A durable coating which reduces ice adhesion and minimizes ice accumulation includes a polymeric binder and a film forming lubricant. The polymeric binder is selected from a fluoropolymer or silicone polymer having one or more reactive groups. The film forming lubricant is a lubricous fluoropolymer or silicone polymer. Methods of applying a durable coating are also disclosed.