C09D133/08

THERMOSETTING RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING MULTILAYER COATING FILM, ESTER COMPOUND, AND POLYMER

[Problem] To obtain a thermosetting resin composition that has curing performance at a lower temperature and uses transesterification capable of also suitably coping with conversion into an aqueous form as a curing reaction.

[Solution] A thermosetting resin composition containing a resin component (A), which includes a structure (a) represented by the following general formula (1) and a hydroxy group (b), and a transesterification catalyst (B).

##STR00001##

n=0 to 20

R.sub.1 is an alkyl group having 50 or less carbon atoms.

R.sub.3 is hydrogen or an alkyl group having 10 or less carbon atoms.

THERMOSETTING RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING MULTILAYER COATING FILM, ESTER COMPOUND, AND POLYMER

[Problem] To obtain a thermosetting resin composition that has curing performance at a lower temperature and uses transesterification capable of also suitably coping with conversion into an aqueous form as a curing reaction.

[Solution] A thermosetting resin composition containing a resin component (A), which includes a structure (a) represented by the following general formula (1) and a hydroxy group (b), and a transesterification catalyst (B).

##STR00001##

n=0 to 20

R.sub.1 is an alkyl group having 50 or less carbon atoms.

R.sub.3 is hydrogen or an alkyl group having 10 or less carbon atoms.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

ENGINEERED SELF-HEALING HYDRAULIC-CEMENT CONCRETE BY BIOMIMICRY
20230235216 · 2023-07-27 ·

Bioinspired chemical additives, coating, and chemical solution useful for enhancing the strength of self-healing hydraulic-cement concrete, comprising of micro/nano/textured dual phobic dot domains, hydrogel polymer, water, mineral oil, and surfactants assembled into micelle emulsion, mixed with cement, water, sand, and aggregates by weight percentage at a mix ratio of from 0.00001/99.9999 to 10.0/90, of which the ratio of water to cement from 0.10 to 0.80 (W/C), the volume fraction of cement for total volume of concrete from 5 to 50%, sand 40% to 90%, and aggregate 40% to 90%, a replacement of cement with cementitious materials from 0.01% to 75%, having an early age of compressive strength over more than 4000 (PSI) within 24 hour, ultimate compressive strength >7500 (PSI) after exposed over one year, gaining a self-healing efficiency over 80(%), contributed to dispersive, hydrogen, ionic chelating interactions, and activated with self-assembling thiol/disulfide plant-based protein fibril's crosslinking bonds.

Protective Varnish, in Particular for Security Documents
20230025929 · 2023-01-26 ·

The present invention mainly relates to a protective varnish hardenable by radiation comprising at least one compound hardenable by cationic or radical means and at least one metal selected from silver, copper, zinc and mixtures thereof, characterized in that said metal is in the zero oxidation state and in a supported particulate form.

Protective Varnish, in Particular for Security Documents
20230025929 · 2023-01-26 ·

The present invention mainly relates to a protective varnish hardenable by radiation comprising at least one compound hardenable by cationic or radical means and at least one metal selected from silver, copper, zinc and mixtures thereof, characterized in that said metal is in the zero oxidation state and in a supported particulate form.

Omniphobic Composiitons with Nanofiller Additives, Related Articles, and Related Methods
20230028815 · 2023-01-26 ·

The disclosure relates to a thermoset omniphobic composition with favorable dirt repellency and water resistance properties. The composition can be used as a protective coating on a substrate. Such coatings, when contacted with soil, dirt, dust, etc., remain clean and transparent. The omniphobic composition generally includes a thermoset polymer, an omniphobic polymer, and a filler or nanofiller. The thermoset polymer can be a crosslinked acrylate or other vinyl polymer. The omniphobic polymer can include fluorocarbon and/or siloxane groups for improving water resistance. The nanofiller can include nanosilica and/or nanoclay. The thermoset polymer and the omniphobic polymer together form a matrix for the filler as a dispersed phase throughout the matrix. A coated substrate with the thermoset omniphobic composition thereon exhibits favorable water contact and sliding angles as well as favorable transparency values in dirt accumulation tests.

Omniphobic Composiitons with Nanofiller Additives, Related Articles, and Related Methods
20230028815 · 2023-01-26 ·

The disclosure relates to a thermoset omniphobic composition with favorable dirt repellency and water resistance properties. The composition can be used as a protective coating on a substrate. Such coatings, when contacted with soil, dirt, dust, etc., remain clean and transparent. The omniphobic composition generally includes a thermoset polymer, an omniphobic polymer, and a filler or nanofiller. The thermoset polymer can be a crosslinked acrylate or other vinyl polymer. The omniphobic polymer can include fluorocarbon and/or siloxane groups for improving water resistance. The nanofiller can include nanosilica and/or nanoclay. The thermoset polymer and the omniphobic polymer together form a matrix for the filler as a dispersed phase throughout the matrix. A coated substrate with the thermoset omniphobic composition thereon exhibits favorable water contact and sliding angles as well as favorable transparency values in dirt accumulation tests.

Optical film

The present invention provides a method for producing an optical film excellent in anti-fouling properties and scratch resistance as well as anti-reflection properties. The method includes the steps of: (1) applying a lower layer resin and an upper layer resin; (2) forming a resin layer having the uneven structure on a surface thereof by pressing a mold against the lower layer resin and the upper layer resin from the upper layer resin side in the state where the applied lower layer resin and upper layer resin are stacked; and (3) curing the resin layer, the lower layer resin containing at least one kind of first monomer that contains no fluorine atoms, the upper layer resin containing a fluorine-containing monomer and at least one kind of second monomer that contains no fluorine atoms, at least one of the first monomer and the second monomer containing a compatible monomer that is compatible with the fluorine-containing monomer and being dissolved in the lower layer resin and the upper layer resin.