Polishing compositions are disclosed for simultaneously removing particles from a surface that has been polished using a CMP slurry comprising a polishing rate accelerator and removing a pad stain from a polishing pad that has been contacted with a CMP slurry comprising a polishing rate accelerator.

Cleaning compositions for post-CMP cleaning of semiconductor surfaces, comprise one or more reducing agents, a particle removal agent, a surfactant, and a base. When one or more reducing agents yields a standard reduction potential of less than 1.224 V, the cleaning composition of the present disclosure is able to remove a MnO.sub.2 pad stain from a polishing pad and reduce defects on a polished surface (by removing particles).

An example composition according to the present disclosure includes, among other possible things, water and an active product including ethoxylated castor oil, wherein the ethoxylated castor oil has a degree of ethoxylation defined as CO—X, where the ethoxylated castor oil is a reaction product of castor oil and X moles of ethylene oxide. The active product comprises between about 20 percent and about 50 percent by weight of the composition. The ethoxylated castor oil is dispersible or soluble in the water such that the composition is homogenous, and the composition has a viscosity of about 10,000 cps or less.

An example composition according to the present disclosure includes, among other possible things, water and an active product including ethoxylated castor oil, wherein the ethoxylated castor oil has a degree of ethoxylation defined as CO—X, where the ethoxylated castor oil is a reaction product of castor oil and X moles of ethylene oxide. The active product comprises between about 20 percent and about 50 percent by weight of the composition. The ethoxylated castor oil is dispersible or soluble in the water such that the composition is homogenous, and the composition has a viscosity of about 10,000 cps or less.

An object of the present invention is to provide a method for producing a treatment liquid, having excellent filterability.

The method for producing a treatment liquid of an embodiment of the present invention is a method for producing a treatment liquid, the method including filtering an object to be purified including a surfactant, using a first filter having a first filter medium, to produce a treatment liquid for a semiconductor substrate, in which the first filter medium includes at least one selected from the group consisting of a nylon, a polyallyl sulfonic acid, a perfluoroalkoxy alkane which has been subjected to a hydrophilization treatment, a polytetrafluoroethylene which has been subjected to a hydrophilization treatment, a polyolefin which has been subjected to a hydrophilization treatment, and a polyvinylidene fluoride which has been subjected to a hydrophilization treatment, and the surfactant includes at least one selected from the group consisting of a nonionic surfactant including a group represented by Formula (1) and an anionic surfactant including a group represented by Formula (1).

Formula (1) (LO).sub.n

L represents an alkylene group, and n represents 3 to 55.

The present invention is directed to biodegradable cleaning compositions, in particular hard surface cleaning compositions, and their use. The compositions according to the invention comprise one or more biosurfactants(s), one or more sorbitan ester(s) and one or more further surfactant(s), which is/are neither a biosurfactant nor a sorbitan ester.

The present invention is directed to biodegradable cleaning compositions, in particular hard surface cleaning compositions, and their use. The compositions according to the invention comprise one or more biosurfactants(s), one or more sorbitan ester(s) and one or more further surfactant(s), which is/are neither a biosurfactant nor a sorbitan ester.

The invention discloses synergistic combinations of surfactant blends and cleaning compositions employing the same. In certain embodiments a surfactant system is disclosed which includes an extended anionic surfactant with novel co-surfactants including one or more of an alkyl glycerol ether, an ethoxylated alkyl glycerol ether, an alcohol ethoxylate and/or a gemini surfactant. This system forms emulsions with, and can remove greasy and oily stains, even those comprised of non-trans fats. The compositions may be used alone, as a pre-spotter or other pre-treatment or as a part of a soft surface or hard surface cleaning composition.

A rhamnolipid composition including 30% by weight to 70% by weight, of at least one rhamnolipid and 30% by weight to 70% by weight of water, where the percentages by weight refer to the total composition, wherein the pH of the composition at 25° C. is from 5.5 to 7.0. In addition to the foregoing rhamnolipid composition, also set forth is a method to make a solution of rhamnolipids; and a salt of at least one rhamnolipid.

A rhamnolipid composition including 30% by weight to 70% by weight, of at least one rhamnolipid and 30% by weight to 70% by weight of water, where the percentages by weight refer to the total composition, wherein the pH of the composition at 25° C. is from 5.5 to 7.0. In addition to the foregoing rhamnolipid composition, also set forth is a method to make a solution of rhamnolipids; and a salt of at least one rhamnolipid.

The present invention further relates to a biosurfactant-containing formulation including A) at least one biosurfactant, and B) at least one additional surfactant selected from the group of betaines, alkoxylated fatty alcohol sulphates and alkylamine oxides, wherein the biosurfactant-containing formulation may be used on hard surfaces.