Patent classifications
C11D1/06
Treatment compositions comprising a surfactant system and an oligoamine
Treatment compositions that include a surfactant system and an oligoamine, the surfactant system including linear alkyl benzene sulfonate. Related methods of use and preparation of such compositions.
EFFICIENT POST-CMP DEFECT REDUCTION USING CLEANERS CONTAINING OXIDIZING AGENTS
The present technology generally relates to liquid compositions for cleaning post-CMP semiconductor surfaces, and methods of cleaning a semiconductor surface having ceria (CeO.sub.2) particles thereon.
EFFICIENT POST-CMP DEFECT REDUCTION USING CLEANERS CONTAINING OXIDIZING AGENTS
The present technology generally relates to liquid compositions for cleaning post-CMP semiconductor surfaces, and methods of cleaning a semiconductor surface having ceria (CeO.sub.2) particles thereon.
CLEANING COMPOSITIONS AND METHODS OF USE THEREOF
The present disclosure relates to cleaning compositions that are used to clean semiconductor substrates. These cleaning compositions can remove the defects/contaminants arising from previous processing on the semiconductor substrates and thereby make the substrates appropriate for further processing. The cleaning compositions described herein primarily contain at least one pH adjusting agent and at least one biosurfactant.
Cleaning liquid, cleaning method, and method for producing semiconductor wafer
A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.
Cleaning liquid, cleaning method, and method for producing semiconductor wafer
A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.
DETERGENT COMPOSITION COMPRISING RHAMNOLIPIDS AND/OR MANNOSYLERYTHRITOL LIPIDS
The present invention refers to the use of a composition comprising (a) at least one rhamnolipid of the general formula (I) and/or (b) at least one mannosylerythritollipid according to formulae (b1), (b2) and/or (b3) for degreasing greasy and/or oily deposits at temperatures of 40° C. or lower, the use of a dry or liquid formulation comprising said composition as well as the use of said composition as emulsifying agent at temperatures of 40° C. or lower.
Emulsion, method for the production thereof and use thereof
The invention relates to an emulsion containing or consisting of (A) 40.00 to 97.98 wt. % of at least one hydrocarbon, (B) 2.00 to 59.98 wt. % of water or an aqueous solution of a salt which does not fall under the following definition according to (C) and (C) 0.02 to 8.00 wt. % of a salt of an amino amide of a fatty acid, containing at least one primary, secondary or tertiary amino group, and an acid component of general formula (I) ##STR00001## in which R.sup.1 is a linear or branched, saturated or mono-unsaturated or poly-unsaturated hydrocarbon radical with 1 to 40 C atoms, R.sup.2 is an alkylene radical or arylalkylene radical with 2 to 20 C atoms and X is a radical which contains at least one acid group, m=0 or 1, n=1 to 30, wherein the weight proportions of components (A), (B) and (C) relate to the sum of the masses of these components and this is 100 wt. %. The invention also relates to a method for the production of the emulsion, to an oil-based drilling mud and to a method for creating and stabilizing a drill hole.
Composition containing peptidase and biosurfactant
The invention relates to compositions comprising at least one protease and at least one biosurfactant, particularly selected from rhamnolipids and sophorolipids. In particular, the present invention is directed to a composition including A) at least one peptidase, B) at least one biosurfactant, and optionally C) at least one anionic surfactant. The peptidase may be selected from the group of the proteases, particularly from the group of the serine proteases of EC 3.4.21 and the metalloproteases of EC 3.4.24 and the biosurfactant may be selected from the group comprising rhamnolipids and sophorolipids.
Composition containing peptidase and biosurfactant
The invention relates to compositions comprising at least one protease and at least one biosurfactant, particularly selected from rhamnolipids and sophorolipids. In particular, the present invention is directed to a composition including A) at least one peptidase, B) at least one biosurfactant, and optionally C) at least one anionic surfactant. The peptidase may be selected from the group of the proteases, particularly from the group of the serine proteases of EC 3.4.21 and the metalloproteases of EC 3.4.24 and the biosurfactant may be selected from the group comprising rhamnolipids and sophorolipids.