C11D1/06

Laundry detergent composition

The present invention provides a domestic laundry cleaning composition, said composition comprising an anionic charged surfactant, an alkyl ether carboxylic acid dispersant, a lipase enzyme; and a protease enzyme.

SURFACTANTS HAVING NON-CONVENTIONAL HYDROPHOBES

The present invention is directed to surfactants with small hydrophobes, which are of non-conventional hydrophobe size. The surfactants of the present invention utilize a small hydrophobic moiety with a polvalkoxylate chain comprising PO, BO and/or EO groups, with optional ionic groups, such as anionic, cationic and zwitterionic, to achieve the desired hydrophilic-lipophilic balance (HLB). The present invention is further directed to formulations comprising the surfactants of the invention, and methods of using the surfactants of the invention, including in enhanced oil recovery applications.

SURFACTANTS HAVING NON-CONVENTIONAL HYDROPHOBES

The present invention is directed to surfactants with small hydrophobes, which are of non-conventional hydrophobe size. The surfactants of the present invention utilize a small hydrophobic moiety with a polvalkoxylate chain comprising PO, BO and/or EO groups, with optional ionic groups, such as anionic, cationic and zwitterionic, to achieve the desired hydrophilic-lipophilic balance (HLB). The present invention is further directed to formulations comprising the surfactants of the invention, and methods of using the surfactants of the invention, including in enhanced oil recovery applications.

3D PRINTED PARTS MADE BY ADDITIVE MANUFACTURING USING POST PROCESSING CLEANERS
20210214652 · 2021-07-15 ·

Provided herein are methods for making 3D printed parts by additive manufacturing using post processing cleaners.

3D PRINTED PARTS MADE BY ADDITIVE MANUFACTURING USING POST PROCESSING CLEANERS
20210214652 · 2021-07-15 ·

Provided herein are methods for making 3D printed parts by additive manufacturing using post processing cleaners.

Composition for rinsing or cleaning a surface with ceria particles adhered

To provide a composition for rinsing or cleaning a surface to which ceria particles are attached and a surface treatment method for removing ceria particles from the surface using the same. The composition according to the present invention contains an anionic surfactant, an organic amine compound, and a protic organic acid molecule and has a pH of less than 6.

Composition for rinsing or cleaning a surface with ceria particles adhered

To provide a composition for rinsing or cleaning a surface to which ceria particles are attached and a surface treatment method for removing ceria particles from the surface using the same. The composition according to the present invention contains an anionic surfactant, an organic amine compound, and a protic organic acid molecule and has a pH of less than 6.

CONTACT LENS SOLUTION FOR ENHANCING MOIST SENSATION AND CONTACT LENS PRODUCT
20200393698 · 2020-12-17 ·

A contact lens solution for enhancing moist sensation and a contact lens product are provided. The contact lens solution includes a comfort enhancing ingredient. The content of the comfort enhancing ingredient is between 0.01 wt % and 3 wt % based on 100 wt % of the contact lens solution. The comfort enhancing ingredient has one or more glutamic acid monomers, and has a number average molecular weight between 3,000 Daltons and 1,500,000 Daltons to allow the contact lens solution to have a viscosity between 1 cPs and 3 cPs.

CLEANING LIQUID, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER

A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

CLEANING LIQUID, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER

A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.