The present disclosure relates generally to cleaning compositions and, more specifically, to cleaning compositions containing an etheramine that is suitable for removal of stains from soiled materials.

The present disclosure relates generally to cleaning compositions and, more specifically, to cleaning compositions containing an etheramine that is suitable for removal of stains from soiled materials.

To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities. The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B): Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; and Component (B): water. It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3).
R.sup.a1O—(C.sub.3H.sub.6O.sub.2).sub.n—H  (a-1)
R.sup.a2O—(R.sup.a3O).sub.n′—H  (a-2)
(R.sup.a4).sub.3-s—N—[(R.sup.a5O).sub.n″—H].sub.s  (a-3)

Provided are a liquid detergent composition for hard surfaces which is excellent in detergency against oil spots including a degenerated oil such as a thermally degenerated oil; and a method for cleaning a hard surface using the liquid detergent composition. The liquid detergent composition for hard surfaces contains (a) an alkyl or alkenyl amine oxide in which the alkyl group or the alkenyl group has a predetermined number of carbons; a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has 8 or more and 24 or less carbons and the number of added moles of the oxyethylene group is 1 or more and 8 or less; and water, wherein in the amine, the content of (b) a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has a predetermined number of carbons and the number of added moles of the oxyethylene group is 1 or more and 3 or less is 50% by mass or more.

The present disclosure relates generally to cleaning compositions and, more specifically, to cleaning compositions containing an etheramine that is suitable for removal of stains from soiled materials.

Single compartment water-soluble refill dose articles having a water-soluble film enclosing a liquid concentrated cleanser composition, methods of making the same, and kits are disclosed. The liquid concentrated cleanser composition includes a mixture of a rheology modifier, a first surfactant, a stabilizing amount of a first alkaline substance, a viscosity increasing amount of an additional alkaline substance that interacts with the rheology modifier, when diluted with water to form a cleanser, to increase the viscosity, and about 10% or less wt/wt water and about 20% or less by wt/wt glycol. The first alkaline substance is an ethoxylated amine and prevents the viscosity increasing amount of additional alkaline substance from reacting with the rheology modifier before water dissolves the water-soluble film. When dissolved in water at a 1:1 to 1:20 ratio, a cleanser has a viscosity within a range of 2000 cps to 50,000 cps is formed.

The present disclosure provides a method for killing pathogens on a surface, the method comprising applying a composition to the surface, the composition comprising: at least one quaternary ammonium compound; a polymer comprising one or more types of monomer units selected from cationic monomer units, anionic monomer units, amphoteric monomer units, non-ionic monomer units, and combinations thereof, wherein at least one cationic monomer unit, amphoteric monomer unit or at least one anionic monomer unit is present when the polymer comprises one or more non-ionic monomer units; a surfactant selected from cationic surfactants, amphoteric surfactants, non-ionic surfactants, and combinations thereof; and, optionally, an organic acid, wherein the pH of the composition is less than 5; and the composition achieves at least 0.5 log reduction in the amount of live pathogens on the surface, wherein the pathogens are selected from bacterial spores, fungal spores, non-enveloped viruses and combinations thereof within about 60 minutes, under conditions of standard temperature and pressure.

The need for an antimicrobial hard surface cleaning composition providing good antimicrobial efficacy, even at low levels of the antimicrobial agent, while also providing improved surface shine, is met by formulating the composition with an antimicrobial active and an amine.

The need for an antimicrobial hard surface cleaning composition providing good antimicrobial efficacy, even at low levels of the antimicrobial agent, while also providing improved surface shine, is met by formulating the composition with an antimicrobial active and an amine.

A surfactant composition includes a surfactant component including an alcohol ethoxy sulfate having a C.sub.8-C.sub.20 backbone ethoxylated with from about 1 to about 10 moles of ethylene oxide and is present in an amount of from about 20 to about 80 weight percent actives. The surfactant composition also includes water present in a total amount of about 10 to about 35 weight percent. The surfactant composition further includes an alkyl alcohol present in an amount of from about 3 to about 10 weight percent. The surfactant composition also includes a tertiary amine present in an amount of about 5 to about 30 weight percent actives based on a total weight of the surfactant composition and having three arms wherein each arm includes from about 1 to about 25 moles of ethylene oxide functionality. The surfactant composition has a viscosity of less than about 10,000 cps measured at 20° C.