Cleaning compositions that include a non-functionalized alkyl polyglycoside, a nonionic surfactant system, and water. In certain embodiments, the cleaning compositions are substantially free of alkyl phenol ethoxylates. Additionally, some embodiments of the invention are substantially free of butyl cellosolve. The cleaning composition is capable of removing both proteinaceous food soils and hydrocarbon-based oily soils. The cleaning compositions include a biorenewable, environmentally friendly alternative to nonyl phenol ethoxylates and exhibit superior cleaning of food soils.

Compositions for cleaning equipment, preferably paper or carpet making equipment, and methods of cleaning equipment, preferably paper or carpet making equipment using the said composition. The cleaning composition comprises of one or more fatty acid methyl esters, preferably vegetable oil methyl ester, more preferably soybean oil methyl ester, one or more alkene carbonate, preferably propylene carbonate; one of more surfactants, preferably nonionic surfactants; and one or more glycol ether and/or dibasic ester containing solvents.

Concentrated nitric acid cleaners employing the use of ethoxylated fatty alcohols, including a blend of polyethoxylated fatty alcohols, provide enhanced cleaning on metal and other surfaces, particularly stainless steel. Methods of use, including enhanced fatty soil removal and organic soil removal (such as soap scum) are also disclosed.

An automatic dishwashing composition having a ternary mixture of non-ionic surfactants comprising: i) a non-ionic surfactant having a high cloud point of 50° C. or above; ii) a non-ionic surfactant having a low cloud point below 50° C.; and iii) an ethylene oxide- propylene oxide block copolymer having a cloud point below 50° C.

High active, high caustic liquid laundry detergent compositions which provide excellent stability are disclosed, including methods of making and using the same. The compositions generally comprise a source of alkalinity, a rheology modifier, one or more sequestering agents, one or more low mole ethoxylated nonionic surfactants, and an alkylpolysaccharide surfactant. The liquid detergent emulsions, provided as a concentrate, water-in-oil use solution emulsion, or oil-in-water use solution emulsion beneficially demonstrate improved stability even under high pH and high temperature conditions.

The present disclosure relates to a semiconductor wafer cleaning composition for used in a semiconductor device manufacturing process and to a method of cleaning a semiconductor wafer using the cleaning composition. The cleaning composition includes surfactants represented by Formula 1 and Formula 2, respectively, an organic or inorganic acid, and water occupying for the remaining proportion. The cleaning method is a method of immersing a semiconductor wafer in the cleaning composition for 100 to 500 seconds. The cleaning composition and the cleaning method according to the present disclosure provide an incredibility improved removal rate and an effective cleaning power for contaminants, especially organic wax, during a process of polishing the surface of a wafer used to manufacture semiconductor devices, thereby providing a super-cleaned wafer surface, resulting in production of reliable semiconductor devices.

A composition comprising a surfactant blend, comprising: a polyethylene glycol, wherein the polyethylene glycol has an average molecular weight of from 5,000 g/mol to 9,000 g/mol; a first ethoxylated alcohol comprising the formula R—O(EO).sub.n—H, where R is an alkyl, alkenyl, aryl, aralkyl, or heterocyclic group having 7-25 carbons, where (EO) is a polyoxyethylene chain and where n is from 3 to 9, wherein the first ethoxylated alcohol has a Pour Point below 23° C.; and a second ethoxylated alcohol comprising the formula R—O(EO).sub.m—H, where R is an alkyl, alkenyl, aryl, aralkyl, or heterocyclic group having 7-25 carbons, where (EO) is a polyoxyethylene chain and where m is from 12 to 20, wherein the second ethoxylated alcohol has a Pour Point at or above 23° C., further wherein the first ethoxylated alcohol is from 20 wt % to 80 wt % of a total weight of the surfactant blend.

The invention relates to novel concentrates containing polysiloxanes having improved stability and improved performance properties and to the use thereof in laundry and cleaning formulations, preferably in fabric care compositions.

Cleaning compositions that include a non-functionalized alkyl polyglycoside, a nonionic surfactant system, and water. In certain embodiments, the cleaning compositions are substantially free of alkyl phenol ethoxylates. Additionally, some embodiments of the invention are substantially free of butyl cellosolve. The cleaning composition is capable of removing both proteinaceous food soils and hydrocarbon-based oily soils. The cleaning compositions include a biorenewable, environmentally friendly alternative to nonyl phenol ethoxylates and exhibit superior cleaning of food soils.

Hard surface rinse aid compositions incorporating surfactant systems compatible with plastics and plastics containing metals, such as aluminum, are disclosed. The hard surface rinse aid compositions are particularly well suited for use in high concentrations at low temperatures without causing foaming and/or debris or film on the treated surface. In particular, the plastic and aluminum-compatible hard surface rinse aid compositions containing a surfactant system combining nonionic alcohol alkoxylates and a polymer surfactant can be used in treating hard surfaces requiring good sheeting, wetting and drying properties. The methods are particularly well suited for rinsing automotive parts, including those needing painting.