The invention relates to highly effective disinfecting or sterilising cloths with chlorine dioxide as the main active ingredient. For this, the chlorine dioxide is only generated shortly before use by bringing a cloth impregnated with a chlorite or chlorate salt in contact with a clearly defined amount of a suitable activation agent that is fluid or dissolved or admixed in a fluid, and prepackaged as a single dose, for the generation of chlorine dioxide. In a preferred embodiment, the impregnated cloth and the activation fluid are packaged in a common packaging unit and the activation occurs by breaking through a barrier separating the cloth or the cloths and the activation fluid. In a further preferred embodiment, the packaging is a moulded part having two packaging spaces separated from one another by removable barriers, which can be converted into a moulded part with only one chamber via simple pressure in one direction. The activation fluid or the disinfecting cloth can contain further substances, such as the pH-value-controlling substances, surfactants, guanidine derivatives, aldehydes, phenoxyethanols, phosphate esters, alcohols, sulfoxides, etc. Preferably, the disinfecting cloth according to the invention is used for disinfecting and/or sterilising medical instruments and/or medical products and/or surfaces.

A cleaning solution including: a primary solvent; a secondary solvent, wherein the secondary solvent is at least partially miscible with the primary solvent; an oxidizing agent, wherein the oxidizing agent includes a peroxide; a chelating agent, wherein the chelating agent includes the structure of formula I: ##STR00001##
wherein R.sub.1-R.sub.4 are each independently selected from the group consisting of H; OH; and an alkyl, cycloalkyl, polycycloalkyl, heterocycloalkyl, aryl, alkaryl, aralkyl, alkoxy, alkanoyl, aroyl, alkenyl, alkyl-alkenyl, alcohol, ether, ketone, carboxylic acid, acid halide, acid anhydride, ester, and/or amide group containing approximately 1 to approximately 25 carbon atom(s); and wherein X.sub.1-X.sub.3 are each independently selected from the group consisting of O; S; and Se; a surfactant system, wherein the surfactant system includes a first anionic surfactant, a second anionic surfactant, a third anionic surfactant, and a fourth anionic surfactant; a pH modifier; and an optional amino acid.

A non-oxidizing, buffered disinfectant concentrate is provided to be included in a solution used to disinfect a membrane. The solution applied to the membrane is configured to have a pH that is compatible with the membrane. The disinfectant concentrate includes an aqueous solvent; a hydrotrope; a strong acid surface cleanser; a biocidal active, preferably, at least two biocidal actives; a buffer agent; and, optionally, an anionic surfactant. The biodical active may be selected to function both as a biocide and as a weak acid/buffer combination. A disinfectant solution applied to the membrane includes from about 0.1 wt % to about 3.5 wt % of this disinfectant concentrate.

The disclosure is directed to cleaning compositions, methods of making the cleaning compositions, and methods of using the cleaning compositions. The cleaning compositions comprise an enzyme composition, a nonionic surfactant, and a quaternary amine. Preferably, the enzyme compositions included in the cleaning compositions comprise a cellulase, an AA9 polypeptide having cellulolytic enhancing activity, a hemicellulase, an esterase, an expansin, a laccase, a ligninolytic enzyme, a pectinase, a peroxidase, a protease, a swollenin, or a combination or mixture thereof. The compositions are useful for degradation of bacterial cellulose.

A substrate processing apparatus includes a first cleaning solution supply part for supplying a main surface of a substrate with an alkaline or acid first cleaning solution and a second cleaning solution supply part for supplying the main surface with a second cleaning solution containing a thickener and having a viscosity higher than that of the first cleaning solution. In a state where one cleaning solution out of the first cleaning solution and the second cleaning solution is present on the main surface, the other cleaning solution is supplied onto the main surface. It is thereby possible to more reliably remove unnecessary substances on the main surface of the substrate.

A treatment liquid is a treatment liquid including water; a cationic compound; an anionic compound selected from the group consisting of a resin having a carboxy group or a salt thereof, a resin having a sulfo group or a salt thereof, a resin having a phosphorous acid group or a salt thereof, and a resin having a phosphoric acid group or a salt thereof; and an oxidizing agent, in which the treatment liquid has a pH of 7.0 or less, and the treatment liquid is substantially free of abrasive grains.

Cleaning solution for cleaning and/or wetting metal surfaces, comprising at least one acid, a first surfactant, which is an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≤25° C., a second surfactant, which is selected from the group consisting of i) an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≥30° C., ii) an alkyl-polyethyleneglycol-ether having a cloud point of ≥45° C.
wherein the cloud points are determined according to European Standard EN 1890:2006, item 8.2 of German Version, with the modification that 10 wt % H.sub.2SO.sub.4 is used as solvent and that the concentration of the surfactant is 1000 mg/L.

The present invention is related to sanitizing compositions, kits and to methods for using thereof such as for reducing pathogen load on a substrate.

A transport medium is disclosed that can be utilized for both sample collection and molecular diagnostic applications. The transport medium can be utilized with multiple types of biological samples and maintains the stability of nucleic acid present in the biological samples so that one or more nucleic acid assay target(s) present in the biological sample is not substantially degraded during storage and shipping. Also disclosed are kits containing the transport medium, mixtures that include a biological sample disposed in the transport medium, and methods of producing and using the medium.

An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a method for cleaning a semiconductor substrate.

The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a component A having two or more onium structures in a molecule, and water, and has a pH of 7.0 to 11.8 at 25° C.