The present invention provides an antimicrobial cleansing bar composition comprising 10 to 30 wt % soap, 20 to 45 wt % water soluble organic solvent, 20 to 40 wt % water, 3 to 20 wt % electrolyte other than soap and an antimicrobial agent.

The present invention provides a cleansing composition comprising 10 to 30 wt % soap, 20 to 45 wt % water soluble organic solvent, 20 to 40 wt % water, 3 to 20 wt % electrolyte other than soap and a benefit agent.

The present invention provides a cleansing bar composition comprising 10 to 30 wt % soap, 20 to 45 wt % water soluble organic solvent, 20 to 40 wt % water, 4 to 20 wt % electrolyte other than soap.

An acetone deficient composition including at least one polyol, at least one alkyl carbonate, at least one monoalcohol and optionally at least one hydrocarbon based non-volatile oil is provided.

A composition comprises from 0.1 to 30 wt-% of one or more amino acids, 0.1 to 30 wt-% of one or more surfactants, and optionally one or more hydrotropes. The amino acids may be selected from arginine (ARG), lysine (LYS), histidine (HIS), glycine (GLY), or combinations thereof. The composition can be formulated as a cleaning composition, such as a hard surface cleaner, a floor cleaner, or a degreaser. The composition can be used in a method for treating a surface, where the composition is applied to the surface and allowed to remain on the surface for a length of time, and the surface is then wiped.

Cleaning composition, which is a dry shampoo, comprising a base and propellant, wherein the base comprises sebum absorber which comprises magnetic particles, wherein the magnetic particles have a particle size in the range of from 4 nm to 50 nm, and wherein the magnetic particles are coated with a stabilizing dispersing agent, and wherein the magnetic particles are dispersed in a liquid carrier.

A composition, containing a carrier medium and particles based on a metal compound with a weight-average particle diameter of 1 nm to 10 m is useful to clean metal or ceramic surfaces which are part of a dental restoration or of an implant abutment.

A composition, containing a carrier medium and particles based on a metal compound with a weight-average particle diameter of 1 nm to 10 m is useful to clean metal or ceramic surfaces which are part of a dental restoration or of an implant abutment.

It is an object of the invention to provide a treatment liquid that, when used as a developer or a rinsing liquid for a metal resist film, exhibits a high ability to suppress the occurrence of pattern defects and also exhibits a high pattern resolution. The treatment liquid of the invention is a treatment liquid containing propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, and acetic acid. The content of propylene glycol monomethyl ether acetate is 60% by mass or more based on the total mass of the treatment liquid, and the content of propylene glycol monomethyl ether is 0.00010 to 0.1% by mass based on the total mass of the treatment liquid. The content of acetic acid is 1.0% by mass or more and less than 40.0% by mass based on the total mass of the treatment liquid.

A method of treating an elastane-containing fabric. The method including the steps of providing a fabric treatment composition having an antioxidant and a surfactant, and providing an elastane-containing fabric. The method further including the step of contacting the elastane-containing fabric with the fabric treatment composition in the presence of water, wherein the fabric treatment composition and the water form a treatment liquor having an antioxidant concentration of at least 25 ppb, a surfactant concentration of at least 10 ppm, and wherein the ratio of treatment liquor to elastane-containing fabric (w/w) is from 0.1:1 to 100:1. At least some portion of the antioxidant is deposited onto the elastane-containing fabric.